公开(公告)号：US4491560A

公开(公告)日：1985-01-01

申请号：US575935

申请日：1984-01-31

Applicant: Tadayuki Fujii ,  Yutaka Hiraoka ,  Ryoji Watanabe

Inventor： Tadayuki Fujii ,  Yutaka Hiraoka ,  Ryoji Watanabe

IPC: B22F1/00 ,  B22F9/04 ,  C22C1/04 ,  C30B1/02 ,  C30B1/12 ,  C30B29/02 ,  C22C27/04 ,  C22F1/18

CPC classification number: C30B1/02 ,  B22F1/0085 ,  C22C1/045 ,  C30B1/12 ,  C30B29/02

Abstract: Large crystal grains or a single crystal of molybdenum composed of molybdenum and at least one trace element selected from the group consisting of calcium and magnesium, the amount of the trace element being 0.003 to 0.12 atomic percent based on the total amount of the components of the large crystal grains or single crystal, and a process for producing large crystal grains or a single crystal of molybdenum, which comprises working at a temperature of 900.degree. to 1500.degree. C. a polycrystalline material composed of molybdenum and 0.003 to 0.12 atomic percent, based on the total amount of the components of the material, of at least one trace element selected from the group consisting of calcium and magnesium, and thereafter annealing the worked material in a non-oxidizing atmosphere to a temperature of at least 1800.degree. C. but below the melting point of molybdenum.

Abstract translation: 大的晶粒或由钼构成的钼的单晶和选自钙和镁的至少一种微量元素，微量元素的量为0.003至0.12原子％，基于组分的总量 大晶粒或单晶，以及用于制造大晶粒或钼的单晶的方法，其包括在900℃至1500℃的温度下加工由钼和0.003至0.12原子％组成的多晶材料，基于 关于材料成分的总量，选自钙和镁的至少一种微量元素，然后在非氧化性气氛中将加工的材料退火至至少1800℃的温度，但是 低于钼的熔点。

公开(公告)号：US08253950B2

公开(公告)日：2012-08-28

申请号：US12332033

申请日：2008-12-10

Applicant: Toshiyuki Kazama ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima ,  Michio Tada

Inventor： Toshiyuki Kazama ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima ,  Michio Tada

IPC: G06K15/00 ,  G06K1/00

CPC classification number: H04N1/053 ,  H04N1/12 ,  H04N2201/02439 ,  H04N2201/04712 ,  H04N2201/04734 ,  H04N2201/04737 ,  H04N2201/04756 ,  H04N2201/04794

Abstract: A recording material moving device comprises: a position adjuster that moves a recording material in a direction which is parallel to a recording surface of the recording material and orthogonal to a transporting direction, in an upstream side of a recording position along the transport direction of the recording material; a reference position specifying unit that specifies a reference position; a determination unit that determines whether a range of a predetermined width centered on the reference position exceeds a movable range of the recording material within which the recording material can be moved by the position adjuster; and a controller that causes, if the determination unit determines that the movable range is not exceeded, the position adjuster to sequentially move the recording material within the movable range of the predetermined width centered on the reference position each time a condition for moving the recording material is satisfied.

Abstract translation: 记录材料移动装置包括：位置调节器，其沿着沿着记录材料的传送方向在记录位置的上游侧沿着与记录材料的记录表面平行的方向并且与传送方向垂直的方向移动记录材料 录音材料; 参考位置指定单元，其指定参考位置; 确定单元，其确定以所述基准位置为中心的预定宽度的范围是否超过所述记录材料的可移动范围，所述记录材料可通过所述位置调节器移动到所述可移动范围内; 以及控制器，如果所述确定单元确定未超过所述可移动范围，则所述位置调整器在每次所述记录材料的移动条件时，将所述记录材料顺序地移动到以所述基准位置为中心的所述预定宽度的可移动范围内 满意

公开(公告)号：US07776511B2

公开(公告)日：2010-08-17

申请号：US12299523

申请日：2007-05-18

Applicant: Masaru Takeshita ,  Ryoji Watanabe

Inventor： Masaru Takeshita ,  Ryoji Watanabe

IPC: G03F7/004 ,  G03F7/30

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  Y10S430/111

Abstract: A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0-1) represented by general formula (a0-1) shown below and a structural unit (a0-2) represented by general formula (a0-2) shown below: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of Y1 and Y3 independently represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; each of c, d and e independently represents an integer of 0 to 3; each of g and h independently represents an integer of 0 to 3; and i represents an integer of 1 to 3.

Abstract translation: 包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，包括结构单元（a0-1）的树脂组分（A） 由下述通式（a0-1）表示的结构单元（a0-2）和下述通式（a0-2）表示的结构单元（a0-2）表示：其中：R表示氢原子，卤素原子，低级烷基或 卤代低级烷基; Y 1和Y 3各自独立地表示脂族环基; Z表示含叔烷基的基团或烷氧基烷基; a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3。 c，d和e各自独立地表示0〜3的整数， g和h各自独立地表示0〜3的整数， i表示1〜3的整数。

公开(公告)号：US20100104972A1

公开(公告)日：2010-04-29

申请号：US11997527

申请日：2006-07-10

Applicant: Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

Inventor： Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0048 ,  G03F7/0397 ,  Y10S430/114

Abstract: A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.

Abstract translation: 本发明的抗蚀剂组合物是通过在有机溶剂（S）中暴露后溶解在酸作用下显示出改变的碱溶性的树脂组分（A）和产生酸的酸产生剂组分（B），其中有机溶剂 溶剂（S）包括芳族有机溶剂（S1）。 根据本发明，可以提供抗蚀剂组合物和形成抗蚀剂图案的方法，其中LWR的水平降低。

公开(公告)号：US20100003622A1

公开(公告)日：2010-01-07

申请号：US12373714

申请日：2007-06-18

Applicant: Shogo Matsumaru ,  Ryoji Watanabe ,  Toshiyuki Ogata

Inventor： Shogo Matsumaru ,  Ryoji Watanabe ,  Toshiyuki Ogata

IPC: G03F7/20 ,  C09D5/00

CPC classification number: H01L21/0273 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/40 ,  H01L21/0337 ,  H01L21/0338

Abstract: A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a metal oxide film on the surface of each resist pattern, forming a second resist film by applying a second chemically amplified resist composition onto the support having the coated patterns formed thereon, and selectively exposing and then developing the second resist film, thereby forming a pattern composed of the plurality of coated patterns and a resist pattern formed in the second resist film onto the support.

Abstract translation: 一种图案形成方法，包括：通过将第一化学放大抗蚀剂组合物施加到载体上来形成第一抗蚀剂膜，通过选择性地暴露然后显影第一抗蚀剂膜形成多个抗蚀剂图案，通过形成 在每个抗蚀剂图案的表面上由金属氧化物膜构成的涂膜，通过将第二化学放大型抗蚀剂组合物施加到其上形成有涂覆图案的载体上形成第二抗蚀剂膜，并选择性地暴露然后显影第二抗蚀剂膜 从而形成由多个涂布图案构成的图案和形成在第二抗蚀剂膜上的抗蚀剂图案到支撑体上。

公开(公告)号：US20090250864A1

公开(公告)日：2009-10-08

申请号：US12331989

申请日：2008-12-10

Applicant: Toshiyuki Kazama ,  Michio Tada ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima

Inventor： Toshiyuki Kazama ,  Michio Tada ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima

IPC: B65H5/00

CPC classification number: B65H7/10 ,  B65H2511/20 ,  B65H2553/416 ,  B65H2557/23 ,  B65H2701/1315 ,  B65H2801/06 ,  G03G15/235 ,  G03G15/6561 ,  G03G2215/00409 ,  G03G2215/00599 ,  G03G2215/00616 ,  G03G2215/00721 ,  B65H2220/03 ,  B65H2220/01 ,  B65H2220/02

Abstract: A recording medium transport apparatus includes: plural storage units each storing a recording medium; a transport unit that transports the recording medium from one of the storage units to a recording position where an image is recorded on the recording medium; a memory that stores a reference position of a recording medium prescribed for each storage unit; a measuring unit that measures a position of the transported recording medium; and a movement unit that reads the reference position corresponding to the storage unit that stored the transported recording medium, from the memory, and moves the recording medium according to the difference between the reference position and the measured position such that the position of the recording medium approaches the reference position when the recording medium is located upstream of the recording position in the transport direction thereof.

Abstract translation: 记录介质传送装置包括：多个存储单元，每个存储单元存储记录介质; 传送单元，其将记录介质从存储单元之一传送到记录介质上记录图像的记录位置; 存储器，其存储为每个存储单元规定的记录介质的参考位置; 测量所述传送的记录介质的位置的测量单元; 以及移动单元，从存储器读取对应于存储运送的记录介质的存储单元的参考位置，并且根据参考位置和测量位置之间的差异移动记录介质，使得记录介质的位置 当记录介质位于记录位置的输送方向的上游时，接近基准位置。

公开(公告)号：US20090188780A1

公开(公告)日：2009-07-30

申请号：US12354595

申请日：2009-01-15

Applicant: Ryoji WATANABE

Inventor： Ryoji WATANABE

IPC: H01H13/76

CPC classification number: H01H13/807 ,  H01H2201/038 ,  H01H2203/026 ,  H01H2221/01 ,  H01H2221/014 ,  H01H2221/018 ,  H01H2225/03 ,  H01H2231/026

Abstract: A switch device, includes a device main body incorporating a fixed pressure contact portion and includes a fixed sliding contact portion that forms a circuit together with the fixed pressure contact portion, and at least one pair of switches supported on the device main body, each switch comprising an operating knob. One switch of the at least one pair of switches includes a pressure-operated switch includes a movable pressure contact portion corresponding to the fixed pressure contact portion, and another switch includes a slide-operated switch includes a movable sliding contact portion corresponding to the fixed sliding contact portion.

Abstract translation: 一种开关装置，包括具有固定压力接触部分的装置主体，并且包括与固定压力接触部分一起形成电路的固定滑动接触部分和支撑在装置主体上的至少一对开关，每个开关 包括操作旋钮。 至少一对开关的一个开关包括压力操作开关，其包括对应于固定压力接触部分的可移动压力接触部分，另一个开关包括滑动操作开关，其包括对应于固定滑动件的可动滑动接触部分 接触部分。

公开(公告)号：US6040838A

公开(公告)日：2000-03-21

申请号：US148052

申请日：1993-11-05

Applicant: Richard D. Webb ,  Ryoji Watanabe

Inventor： Richard D. Webb ,  Ryoji Watanabe

IPC: G06F3/048 ,  G06F3/14 ,  G06T1/00 ,  G06T11/00 ,  G06T17/00 ,  G06F15/00

CPC classification number: G06T17/00

Abstract: A method and system for graphic state processing in which a graphic state object separate from a graphic contains state information. The state object can be accessed during times other than drawing. The object is comprised of sub-states which represent particular graphic processing states. A graphic need only send the graphic hierarchy, and the graphic state object automatically takes care of the sending of the graphic states to the rendering device. The graphic state object is an entity separate from the graphic which is to be drawn.

Abstract translation: 图形状态处理的方法和系统，其中与图形分离的图形状态对象包含状态信息。 可以在绘图之外的时间访问状态对象。 该对象由代表特定图形处理状态的子状态组成。 图形只需要发送图形层次结构，图形状态对象自动将图形状态发送到渲染设备。 图形状态对象是与要绘制的图形分开的实体。

公开(公告)号：US6014139A

公开(公告)日：2000-01-11

申请号：US285944

申请日：1999-04-01

Applicant: Ralph T. Watson ,  Jack R. Robson ,  Ryoji Watanabe ,  Jeff Wishnie

Inventor： Ralph T. Watson ,  Jack R. Robson ,  Ryoji Watanabe ,  Jeff Wishnie

IPC: G06F3/033 ,  G06F3/048 ,  G06F9/44 ,  G06F3/14 ,  G06F9/46

CPC classification number: G06F8/38 ,  G06F3/0481 ,  G06F3/04812

Abstract: A system and method providing a cursor tool framework and tool server with support for multiple cursors on any given system, and supporting the selection of a cursor tool using a cursor. The framework and server facilitate the association of cursor tools to a cursor in a process-independent space such that tools can be used cross-process and cross-document. The framework also provides default functionality for communication among cursor tools and the canvas on which they are used. This high degree of interaction allows any cursor tool and any document to function together such that the cursor tool can be written without the participation of the document developer.

Abstract translation: 一种提供光标工具框架和工具服务器的系统和方法，支持任何给定系统上的多个光标，并支持使用光标选择光标工具。 框架和服务器便于将游标工具与过程无关的空间中的游标相关联，从而可以使用跨进程和跨文档的工具。 该框架还为光标工具和使用它们的画布提供了默认的功能。 这种高度的交互允许任何光标工具和任何文档一起工作，使得光标工具可以被写入而不需要文档开发者的参与。

公开(公告)号：US5409624A

公开(公告)日：1995-04-25

申请号：US151305

申请日：1993-11-12

Applicant: Ryoji Watanabe

Inventor： Ryoji Watanabe

IPC: H01F1/057 ,  H01F1/08 ,  H01F1/147

CPC classification number: H01F1/0578 ,  H01F1/083

Abstract: Compositions for making a bonded magnet product by conventional moulding techniques comprising high amounts of magnetic particles together with a polyamide resin and from about 0.2 to 3% by weight of a hindered phenol hydrazine compound are described.

Abstract translation: 描述了通过常规模塑技术制造粘结磁体产品的组合物，其包括大量的磁性颗粒与聚酰胺树脂以及约0.2-3重量％的受阻酚肼化合物。