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    METHOD OF FORMING RESIST PATTERN
    3.
    发明申请
    METHOD OF FORMING RESIST PATTERN 失效
    形成电阻图案的方法

    公开(公告)号：US20100035192A1

    公开(公告)日：2010-02-11

    申请号：US12533685

    申请日：2009-07-31

    申请人： Tomoyuki Ando ,  Sho Abe ,  Ryoji Watanabe ,  Komei Hirahara

    发明人： Tomoyuki Ando ,  Sho Abe ,  Ryoji Watanabe ,  Komei Hirahara

    IPC分类号： G03F7/20

    CPC分类号： G03F7/2022 ,  G03F7/095

    摘要： A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.

    摘要翻译： 一种形成抗蚀剂图案的方法，包括：使用化学放大型负性抗蚀剂组合物在基板上形成抗蚀剂膜; 通过使抗蚀剂膜首先通过光掩模曝光来形成第一线和空间图案的潜像; 通过使光刻胶膜通过光掩模进行第二曝光，形成与第一线和空间图案的潜像相交的第二线和空间图案的潜像; 并且使抗蚀剂膜显影以在抗蚀剂膜中形成孔图案。

    Positive resist composition and method of forming resist pattern
    4.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US07645559B2

    公开(公告)日：2010-01-12

    申请号：US12064288

    申请日：2006-08-16

    申请人： Ryoji Watanabe ,  Masaru Takeshita

    发明人： Ryoji Watanabe ,  Masaru Takeshita

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  C08F220/28 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/122

    摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.

    摘要翻译： 提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。 正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有 缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基， 烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。

    RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE
    5.
    发明申请
    RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE 有权
    记录材料移动装置和图像形成装置

    公开(公告)号：US20090257074A1

    公开(公告)日：2009-10-15

    申请号：US12332033

    申请日：2008-12-10

    申请人： Toshiyuki Kazama ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima ,  Michio Tada

    发明人： Toshiyuki Kazama ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima ,  Michio Tada

    IPC分类号： H04N1/60

    CPC分类号： H04N1/053 ,  H04N1/12 ,  H04N2201/02439 ,  H04N2201/04712 ,  H04N2201/04734 ,  H04N2201/04737 ,  H04N2201/04756 ,  H04N2201/04794

    摘要： A recording material moving device comprises: a position adjuster that moves a recording material in a direction which is parallel to a recording surface of the recording material and orthogonal to a transporting direction, in an upstream side of a recording position along the transport direction of the recording material; a reference position specifying unit that specifies a reference position; a determination unit that determines whether a range of a predetermined width centered on the reference position exceeds a movable range of the recording material within which the recording material can be moved by the position adjuster; and a controller that causes, if the determination unit determines that the movable range is not exceeded, the position adjuster to sequentially move the recording material within the movable range of the predetermined width centered on the reference position each time a condition for moving the recording material is satisfied.

    摘要翻译： 记录材料移动装置包括：位置调节器，其沿着沿着记录材料的传送方向在记录位置的上游侧沿着与记录材料的记录表面平行的方向并且与传送方向垂直的方向移动记录材料 录音材料; 参考位置指定单元，其指定参考位置; 确定单元，其确定以所述基准位置为中心的预定宽度的范围是否超过所述记录材料的可移动范围，所述记录材料可通过所述位置调节器移动到所述可移动范围内; 以及控制器，如果所述确定单元确定未超过所述可移动范围，则所述位置调整器在每次所述记录材料的移动条件时，将所述记录材料顺序地移动到以所述基准位置为中心的所述预定宽度的可移动范围内 满意

    Method and apparatus for retrieving natural language text
    7.
    发明申请
    Method and apparatus for retrieving natural language text 审中-公开
    检索自然语言文本的方法和装置

    公开(公告)号：US20050187964A1

    公开(公告)日：2005-08-25

    申请号：US10913807

    申请日：2004-08-05

    申请人： Takahiro Nakamura ,  Hiroshi Aizawa ,  Ryoji Watanabe

    发明人： Takahiro Nakamura ,  Hiroshi Aizawa ,  Ryoji Watanabe

    IPC分类号： G06F17/00 ,  G06F17/30

    CPC分类号： G06F16/334 ,  G06F16/90344

    摘要： A method for retrieving data from a set of natural language texts, includes the steps of storing the units of the natural language texts and fixed-length codes into a conversion-code table relating each unit uniquely to each code; constructing a coded-text database which stores a set of coded texts produced by converting the units of the natural language texts into the relating fixed-length code using the conversion-code table while maintaining information concerning unit order of the natural language texts; and retrieving coded-texts from the coded-text database using the fixed-length code.

    摘要翻译： 一种用于从一组自然语言文本中检索数据的方法包括以下步骤：将自然语言文本和固定长度代码的单元存储到将每个单元唯一地与每个代码相关联的转换代码表中; 构建编码文本数据库，其存储通过使用转换代码表将自然语言文本的单位转换为相关的固定长度代码而生成的一组编码文本，同时保持关于自然语言文本的单位顺序的信息; 并使用固定长度的代码从编码文本数据库中检索编码文本。

    Operating system software architecture and methods for supporting color processing
    8.
    发明授权
    Operating system software architecture and methods for supporting color processing 失效
    操作系统软件架构和支持颜色处理的方法

    公开(公告)号：US5528261A

    公开(公告)日：1996-06-18

    申请号：US896112

    申请日：1992-06-09

    申请人： Lindsay B. Holt ,  James A. Quarato ,  Jerry G. Harris ,  Ryoji Watanabe ,  Keith McGreggor

    发明人： Lindsay B. Holt ,  James A. Quarato ,  Jerry G. Harris ,  Ryoji Watanabe ,  Keith McGreggor

    IPC分类号： G09G5/02 ,  H04N1/60

    CPC分类号： H04N1/6027 ,  G09G5/02 ,  H04N1/6052

    摘要： An operating system software architecture, implemented in an object-oriented design, supports and processes color. The object-oriented design has two levels, one being a class (TColor) defining a virtual abstract base class and being a container class containing calibrated colors, the other being a class (TDeviceColor) defining a virtual abstract base class and a container class containing uncalibrated colors. Several calibrated color classes including a class (TXYZColor) defining XYZ color space descend directly from class (TColor), several uncalibrated color classes including a class (TRGBColor) descending directly from class (TDeviceColor), a class (TColorGamut) storing color gamut information of peripheral devices that may interface with the architecture, and a class (TColorProfile) storing tonal reproduction curves of the peripheral devices provide data structures, together with method functions for various color processing. The architecture is extensible to add new color classes as new color models and devices are developed, to add new color matching algorithms as desired, allows users to work in color space of their choice, and provides for color matching amongst any peripheral devices interfacing with the architecture.

    摘要翻译： 在面向对象设计中实现的操作系统软件架构支持并处理颜色。 面向对象设计有两个层次，一个是定义虚拟抽象基类的类（TColor），它是一个包含校准颜色的容器类，另一个是定义虚拟抽象基类的类（TDeviceColor）和容纳类 未校准的颜色。 包括定义XYZ颜色空间的类（TXYZColor）的几个校准颜色类直接从类（TColor）下降，几个未校准的颜色类，包括直接从类（TDeviceColor）下降的类（TRGBColor），存储色域的色域信息（TColorGamut） 可以与架构接口的外围设备和存储外围设备的音调再现曲线的类（TColorProfile）提供数据结构以及用于各种颜色处理的方法功能。 该架构是可扩展的，以增加新的颜色类别，因为新的颜色模型和设备被开发，以根据需要添加新的颜色匹配算法，允许用户在他们选择的颜色空间中工作，并且提供与任何外部设备之间的颜色匹配 建筑。

    Positive resist composition and method of forming resist pattern
    9.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08247159B2

    公开(公告)日：2012-08-21

    申请号：US12299529

    申请日：2007-04-18

    申请人： Masaru Takeshita ,  Ryoji Watanabe

    发明人： Masaru Takeshita ,  Ryoji Watanabe

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397

    摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0) represented by general formula (a0) shown below and a structural unit (a1) derived from an acrylate ester having a polycyclic group-containing, acid dissociable, dissolution inhibiting group of a tertiary alkyl ester-type: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; and each of c, d and e independently represents an integer of 0 to 3.

    摘要翻译： 一种正型抗蚀剂组合物，其包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含由 由下述通式（a0）表示的结构单元（a1）和由具有含多环基团的酸解离性溶解抑制基团的叔烷基酯型的丙烯酸酯衍生的结构单元（a1）：其中：R表示氢原子，卤素 原子，低级烷基或卤代低级烷基; Y1表示脂肪族环状基团; Z表示含叔烷基的基团; a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3。 c，d和e各自独立地表示0〜3的整数。

    Resist composition and method of forming resist pattern
    10.
    发明授权
    Resist composition and method of forming resist pattern 有权
    抗蚀剂图案的抗蚀剂组成和方法

    公开(公告)号：US08007981B2

    公开(公告)日：2011-08-30

    申请号：US11997527

    申请日：2006-07-10

    申请人： Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

    发明人： Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/0048 ,  G03F7/0397 ,  Y10S430/114

    摘要： A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.

    摘要翻译： 本发明的抗蚀剂组合物是通过在有机溶剂（S）中暴露后溶解在酸作用下显示出改变的碱溶性的树脂组分（A）和产生酸的酸产生剂组分（B），其中有机溶剂 溶剂（S）包括芳族有机溶剂（S1）。 根据本发明，可以提供抗蚀剂组合物和形成抗蚀剂图案的方法，其中LWR的水平降低。