Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A panel for a display device includes a display area and a peripheral area. The display area comprises a plurality of pixels each comprising a switching element and gate lines and data lines connected to the pixels. The peripheral area comprises a plurality of gate driving integrated circuit regions, a plurality of data driving integrated circuit regions, a plurality of repair lines disposed along the edge of the panel, connecting pads connected to both ends of the repair lines, a test line connected to at least one connecting pad, and a test pad connected to the test line. A test method for detecting disconnection of the data lines is also provided.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode and a pair of redundant electrodes on the first and the second portions of the lower conductive film, respectively, the redundant electrodes exposing a part of the second portion of the lower conductive film; removing the exposed part of the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
The present invention relates to a transition metal catalyst composition which can exhibit high reactivity in a polymerization reaction of a polyolefin and can easily control characteristics such as chemical structure, molecular weight distribution, mechanical properties, and the like of a synthesized polyolefin, and a method of preparing a polyolefin using the catalyst composition.
Abstract:
A thin film transistor array panel and a manufacturing method therefor. A shorting bar for connecting a thin film transistor with data lines is formed separate from the data lines, and then the data lines and the shorting bar are connected through a connecting member. As a result, all the data lines are floated during manufacture, so that variation in etching speed between data lines does not occur. Since variation in etching speed between the data lines can be prevented, performance deterioration of the transistor caused by a thickness difference in the lower layer of the data line can be prevented, as can resulting deterioration in display quality. Also, the influence of static electricity can be reduced or eliminated. Furthermore, since the data lines and the shorting bar are connected to each other, the generation of static electricity can be prevented or reduced, and quality testing is more readily performed.
Abstract:
A display substrate includes a plurality of gate lines, a plurality of data lines, a gate signal-inputting unit, a first test unit, and a first dummy switching unit. The gate lines extend in a first direction. The data lines extend in a second direction intersected with the first direction. The gate signal-inputting unit is formed at a first end of each of the gate lines to apply gate signals to the gate lines. The first test unit is formed at a second end of each of the gate lines opposite to the first end applying a first test signal to the gate lines. The first dummy switching unit is formed between the gate signal-inputting unit and the first test unit and transferring the first test signal to the gate lines.
Abstract:
A liquid crystal display and a dual gate driving circuit therefor wherein the number of signal lines are reduced by sharing a start pulse and an output signal of a dummy stage. The liquid crystal display includes a timing controller generating an output enable signal, a gate clock, and a signal start signal in response to an external input signal, a level shifter generating a gate clock pulse and a gate clock bar pulse in response to the output enable signal and the gate clock and generating a single start pulse in response to the start signal and the gate clock, and first and second gate driving circuits outputting the gate clock pulse or the gate clock bar pulse as a gate driving signal to the plurality of gate lines in response to the single start pulse.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.