公开(公告)号：US20060196604A1

公开(公告)日：2006-09-07

申请号：US11365509

申请日：2006-03-02

申请人： Tsuyoshi Moriya ,  Takahiro Murakami

发明人： Tsuyoshi Moriya ,  Takahiro Murakami

IPC分类号： C23F1/00

CPC分类号： H01J37/3244 ,  C23F4/00

摘要： A gas supply member is disposed in a chamber of a plasma processing apparatus and has a planar surface facing an inner space of the chamber and a plurality of gas holes bored in the planar surface to supply a gas through the gas holes to the inner space. An outer periphery portion of each gas hole at the planar surface has a slant surface formed to correspond to a flow of the gas injected through each gas hole. Further, the slant surface includes at least any one of a flat surface and a curved surface. An angle formed between the slant surface and the planar surface is equal to or greater than that formed between the planar surface and a distribution of the gas injected through each gas hole.

摘要翻译： 气体供给构件设置在等离子体处理装置的腔室中，并且具有面向腔室的内部空间的平坦表面和在平坦表面中钻出的多个气体孔，以通过气体孔向内部空间供应气体。 平坦表面处的每个气孔的外周部分具有与通过每个气孔注入的气体流相对应的倾斜表面。 此外，倾斜表面包括平坦表面和弯曲表面中的至少任一个。 在倾斜表面和平坦表面之间形成的角度等于或大于在平坦表面与通过每个气孔注入的气体的分布之间形成的角度。

公开(公告)号：US20050237728A1

公开(公告)日：2005-10-27

申请号：US11069572

申请日：2005-03-02

申请人： Kazuto Satoh ,  Hideki Okabe ,  Yoshifumi Iketani ,  Koji Yamazaki ,  Takahiro Murakami ,  Hisanori Sato

发明人： Kazuto Satoh ,  Hideki Okabe ,  Yoshifumi Iketani ,  Koji Yamazaki ,  Takahiro Murakami ,  Hisanori Sato

IPC分类号： G09F9/00 ,  H05K9/00

CPC分类号： H05K9/0054 ,  H01J2217/492

摘要： A shield casing of an image display apparatus including a casing which covers other than a front surface of an image display device having an electromagnetic wave emitter and shielding the electromagnetic waves, a protection panel on which a conductive film is laminated, and a mounting device which is in contact with the conductive film and attaches the protection panel to the casing, wherein the mounting device has an arm stretching toward a front side of the protection panel, a tip portion of the arm curves toward the protection panel and has a contact surface with the protection panel on an outer side surface of the tip portion, and the mounting device mounts the protection panel to the casing with the force more than supporting the protection panel.

摘要翻译： 一种图像显示装置的屏蔽壳体，包括：壳体，其覆盖除了具有电磁波发射器的图像显示装置的前表面以及屏蔽电磁波;保护板，其上层叠有导电膜;以及安装装置， 与导电膜接触并且将保护面板附接到壳体，其中安装装置具有朝向保护面板的前侧延伸的臂，臂的尖端部朝向保护面板弯曲，并且具有与 所述保护面板在所述前端部的外侧表面上，并且所述安装装置以大于支撑所述保护面板的力将所述保护面板安装到所述壳体。

公开(公告)号：US06597102B2

公开(公告)日：2003-07-22

申请号：US10119860

申请日：2002-04-11

申请人： Tsunehiko Sugawara ,  Mikio Miyamoto ,  Toshihiro Ohashi ,  Takahiro Murakami

发明人： Tsunehiko Sugawara ,  Mikio Miyamoto ,  Toshihiro Ohashi ,  Takahiro Murakami

IPC分类号： H01J3100

CPC分类号： H01J29/86 ,  H01J29/87

摘要： A glass bulb for a cathode ray tube comprising a panel portion having a substantially rectangular face portion and a funnel portion having a neck portion, wherein when the glass bulb is used for a cathode ray tube, the glass bulb at least regionally suffers from a tensile stress resulting from the atmospheric pressure on the outer surface of the glass bulb having a vacuum inside, at least part of the face portion of the panel portion where the tensile stress over the face portion has a maximum value &sgr;VP has a compressive stress layer formed by chemical tempering on the outer surface, and the &sgr;VP, the magnitude of the compressive stress on the compressive stress layer &sgr;C MPa, and the thickness of the compressive stress layer tC &mgr;m satisfy the following relationship: 120/tC≧(1−|&sgr;VP/&sgr;C|)>30/tC provided that &sgr;VP≧20 MPa.

摘要翻译： 一种用于阴极射线管的玻壳，包括具有基本矩形面部分的面板部分和具有颈部的漏斗部分，其中当玻璃灯泡用于阴极射线管时，玻璃灯泡至少在区域上受到拉伸 由于内部有真空的玻璃泡的外表面的大气压力引起的应力，面部的表面部分的拉伸应力的最大值为σVP的面板部的面部的至少一部分具有压缩应力层， 外表面的化学回火，σVP，压应力层压缩应力σcMPa的压缩应力的大小以及压应力层tC mum的厚度满足以下关系：条件是σVP> = 20MPa。

公开(公告)号：US06455795B1

公开(公告)日：2002-09-24

申请号：US09407398

申请日：1999-09-29

申请人： Takahiro Murakami ,  Hideki Ito

发明人： Takahiro Murakami ,  Hideki Ito

IPC分类号： H01H304

CPC分类号： H01H13/14 ,  H01H2221/026 ,  H01H2221/028

摘要： Disclosed is a key switch in which a stem extending from a key top is slidably inserted into a seat formed on a housing; and longitudinal grooves extending in the direction of the axis X of reciprocating movement of the stem are formed in the circumferential surface of the stem which is in contact with the inner surface of the seat.

摘要翻译： 公开了一种键开关，其中从键顶延伸的杆可滑动地插入形成在壳体上的座中; 并且在所述杆的与所述座的内表面接触的圆周表面中形成在所述杆的往复运动的轴线X的方向上延伸的纵向槽。

公开(公告)号：USD386488S

公开(公告)日：1997-11-18

申请号：US49992

申请日：1996-02-06

申请人： Masaaki Kageyama ,  Hideki Ito ,  Yoshirou Koutaka ,  Takahiro Murakami ,  Katsuyuki Katayama ,  Hiromi Chiba

设计人： Masaaki Kageyama ,  Hideki Ito ,  Yoshirou Koutaka ,  Takahiro Murakami ,  Katsuyuki Katayama ,  Hiromi Chiba

公开(公告)号：US08734549B2

公开(公告)日：2014-05-27

申请号：US13401493

申请日：2012-02-21

申请人： Koubun Kyo ,  Takahiro Murakami ,  Toshiyuki Suda ,  Shigeru Kusama ,  Toshiro Fujimori

发明人： Koubun Kyo ,  Takahiro Murakami ,  Toshiyuki Suda ,  Shigeru Kusama ,  Toshiro Fujimori

IPC分类号： C01B3/36

CPC分类号： C10K1/20 ,  C10J3/463 ,  C10J3/54 ,  C10J3/66 ,  C10J2300/1807 ,  C10J2300/1823 ,  C10K1/026 ,  C10K1/26 ,  C10K3/023 ,  C10K3/04

摘要： A gasification process is divided into three processes: a gasification furnace for carrying out gasification process by pyrolysis and gasification (pyrolysis gasification phase, first process), a combustion furnace for burning char to obtain calcined active chemical (char combustion phase, second process) and a gas purification furnace for purifying gasified gas (gasified gas purification phase, third process). Through heat transmission by the fluid heat medium and chemical reactions in respective phases by the chemical, the gasification furnace is independently controlled to a low or medium temperature (773-1073 K) which is required for gasification and which enables absorption of CO2; and the gas purification furnace is controlled to a high temperature (1073 K or more) required for gas purification.

摘要翻译： 气化过程分为三个过程：用于通过热解和气化进行气化过程的气化炉（热解气化阶段，第一工艺），用于燃烧焦炭的燃烧炉以获得煅烧活性化学品（焦炭燃烧相，第二工艺）和 用于净化气化气体的气体净化炉（气化气体净化阶段，第三工序）。 通过流体热介质的热传递和化学反应各阶段的化学反应，气化炉独立控制在气化所需的低温或中等温度（773-1073 K），可吸收CO2; 将气体净化炉控制为气体净化所需的高温（1073K以上）。

公开(公告)号：US08414735B2

公开(公告)日：2013-04-09

申请号：US13233968

申请日：2011-09-15

申请人： Takahiro Murakami ,  Nobuhiro Sato

发明人： Takahiro Murakami ,  Nobuhiro Sato

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01J37/32642

摘要： A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves.

摘要翻译： 用于等离子体处理的环形部件包括设置成围绕要进行等离子体处理的基板的外周设置的内环状部件和设置成围绕内部的外周设置的外环形部件 环形构件。 外环形构件具有面向处理空间侧的第一表面和面向等离子体产生侧的相对侧的第二表面。 第二表面上具有一个或多个环形槽。

公开(公告)号：US20130078158A1

公开(公告)日：2013-03-28

申请号：US13683265

申请日：2012-11-21

申请人： Takahiro MURAKAMI ,  Koubun KYO ,  Toshiyuki SUDA

发明人： Takahiro MURAKAMI ,  Koubun KYO ,  Toshiyuki SUDA

IPC分类号： F27B15/00

CPC分类号： C10J3/84 ,  C10J3/482 ,  C10J3/485 ,  C10J3/56 ,  C10J3/721 ,  C10J2300/0956 ,  C10J2300/0959 ,  C10J2300/0973 ,  C10J2300/0993 ,  C10J2300/1671 ,  C10J2300/1807 ,  F27B15/00

摘要： A fuel gasification system including a gasification furnace including a fluidized bed formed by fluidizing reactant gas for gasifying fuel charged into gasification gas and flammable solid content, a combustion furnace for combustion of the flammable solid content into which the flammable solid content produced in the furnace is introduced together with bed material and that includes a fluidized bed formed by fluidizing reactant gas, a material separator such as hot cyclone that separates bed material from exhaust gas introduced from the combustion furnace, the separated bed material being fed through a downcomer to the gasification furnace, and a tar decomposing mechanism that heats the gasification gas produced in the furnace to decompose tar contained in the gasification gas.

摘要翻译： 一种燃气气化系统，包括气化炉，其包括通过使反应气体流化而形成的流化床，用于将装入气化气体的燃料气化和可燃性固体成分气化，用于燃烧在炉中产生的可燃固体成分的易燃固体成分的燃烧炉为 与床料一起引入，其包括通过使反应气体流化而形成的流化床，将床材料与从燃烧炉引入的废气分离的热旋风分离器的材料分离器，分离的床材料通过降液管进料至气化炉 以及焦化分解机构，其加热在炉中产生的气化气体，以分解气化气体中所含的焦油。

公开(公告)号：US20120167467A1

公开(公告)日：2012-07-05

申请号：US13401493

申请日：2012-02-21

申请人： Koubun KYO ,  Takahiro MURAKAMI ,  Toshiyuki SUDA ,  Shigeru KUSAMA ,  Toshiro FUJIMORI

发明人： Koubun KYO ,  Takahiro MURAKAMI ,  Toshiyuki SUDA ,  Shigeru KUSAMA ,  Toshiro FUJIMORI

IPC分类号： C10J3/72

CPC分类号： C10K1/20 ,  C10J3/463 ,  C10J3/54 ,  C10J3/66 ,  C10J2300/1807 ,  C10J2300/1823 ,  C10K1/026 ,  C10K1/26 ,  C10K3/023 ,  C10K3/04

摘要： A gasification process is divided into three processes: a gasification furnace for carrying out gasification process by pyrolysis and gasification (pyrolysis gasification phase, first process), a combustion furnace for burning char to obtain calcined active chemical (char combustion phase, second process) and a gas purification furnace for purifying gasified gas (gasified gas purification phase, third process). Through heat transmission by the fluid heat medium and chemical reactions in respective phases by the chemical, the gasification furnace is independently controlled to a low or medium temperature (773-1073 K) which is required for gasification and which enables absorption of CO2; and the gas purification furnace is controlled to a high temperature (1073 K or more) required for gas purification.

摘要翻译： 气化过程分为三个过程：用于通过热解和气化进行气化过程的气化炉（热解气化阶段，第一工艺），用于燃烧焦炭的燃烧炉以获得煅烧活性化学品（焦炭燃烧相，第二工艺）和 用于净化气化气体的气体净化炉（气化气体净化阶段，第三工序）。 通过流体热介质的热传递和化学反应各阶段的化学反应，气化炉独立控制在气化所需的低温或中等温度（773-1073 K），可吸收CO2; 将气体净化炉控制为气体净化所需的高温（1073K以上）。

公开(公告)号：US08038837B2

公开(公告)日：2011-10-18

申请号：US11511404

申请日：2006-08-29

申请人： Takahiro Murakami ,  Nobuhiro Sato

发明人： Takahiro Murakami ,  Nobuhiro Sato

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01J37/32642

摘要： A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves.

摘要翻译： 用于等离子体处理的环形部件包括设置成围绕要进行等离子体处理的基板的外周设置的内环状部件和设置成围绕内部的外周设置的外环形部件 环形构件。 外环形构件具有面向处理空间侧的第一表面和面向等离子体产生侧的相对侧的第二表面。 第二表面上具有一个或多个环形槽。