Abstract:
The liquid crystal display device, in which liquid crystal is filled between a TFT array substrate having a TFT and a counter substrate placed opposite to the TFT array substrate, includes a pixel electrode placed at least partly directly over or under a drain electrode of the thin film transistor so as to directly overlap the drain electrode, an interlayer insulating layer placed to cover the pixel electrode, and a counter electrode placed on the interlayer insulating layer and having a slit to generate a fringe electric field with the pixel electrode, wherein the counter electrode is placed to overlap a gate line connected to a gate electrode of the TFT in at least part of area and connected to the counter electrode in an adjacent pixel across the gate line.
Abstract:
The present invention intends to provide a manufacturing method of a semi-transmissive liquid crystal display device in which method a structure and manufacturing process thereof are simplified to enable to reduce the manufacturing cost. In order to achieve the above object, a semi-transmissive liquid crystal display device in the invention has a layer constitution in which a reflective pixel electrode is formed with a second conductive film that constitutes a source electrode, a drain electrode, a source wiring and so on and on an upper layer of the second metal film a transmissive pixel electrode made of a transparent conductive film is formed through the insulating film. A TFT array substrate can be formed through 5 times of photoengraving process.
Abstract:
In a method of manufacturing a TFT substrate in accordance with an exemplary aspect of the present invention, an intrinsic semiconductor film, an impurity semiconductor film, and a conductive film for source lines are formed in succession, and a resist having a thin-film portion and a thick-film portions is formed on the conductive film for source lines. Then, etching is performed by using the resist as a mask, and after that, a part of the conductive film for source lines is exposed by removing the thin-film portion of the resist. Next, the exposed conductive film for source lines is etched by using the thick-film portions of the resist a mask, so that the impurity semiconductor film is exposed. Then, by etching the exposed impurity semiconductor film, a back channel region of a TFT 108 is formed. Further, a dummy back channel region 18a, which is irrelevant to the operation of the finished product, is also formed in a portion other than the TFT 108 region.
Abstract:
A transflective liquid crystal display device in which a transmissive area to transmit light to a pixel area and a reflective area as well as a thin film transistor are arranged on an insulating substrate, includes an TFT array substrate having plural gate wirings each provided with a gate electrode and a storage capacitive wiring provided with a storage capacitive electrode made of a first conductive film, plural source wirings each provided with a source electrode and a drain electrode made of a second conductive film, a reflecting pixel electrode extending from the drain electrode, and a transmissive pixel electrode formed through a second insulating film, and an opposite substrate arranged oppositely to the TFT array substrate. The source wirings and the reflecting pixel electrode are arranged apart from each other by a predetermined interval, and a contrast preventing electrode is formed over the interval on the second insulating film.
Abstract:
The liquid crystal display device, in which liquid crystal is filled between a TFT array substrate having a TFT and a counter substrate placed opposite to the TFT array substrate, includes a pixel electrode placed at least partly directly over or under a drain electrode of the thin film transistor so as to directly overlap the drain electrode, an interlayer insulating layer placed to cover the pixel electrode, and a counter electrode placed on the interlayer insulating layer and having a slit to generate a fringe electric field with the pixel electrode, wherein the counter electrode is placed to overlap a gate line connected to a gate electrode of the TFT in at least part of area and connected to the counter electrode in an adjacent pixel across the gate line.
Abstract:
A transflective liquid crystal display device comprising: a first substrate; a second substrate having an opposing electrode; and a liquid crystal layer; wherein the first substrate includes: gate wires; source wires that cross the gate wires in plan view; a reflective pixel electrode that is formed apart from the source wires by a predetermined region in a reflective region, the reflective region is a part of a unit pixel region partitioned by the gate wires and the source wires; and a reflective contrast reduction preventing electrode formed above the reflective pixel electrode in the predetermined region, and the reflective contrast reduction preventing electrode having a region overlapping with the reflective pixel electrode in plan view; and wherein the reflective contrast reduction preventing electrode is connected to the reflective pixel electrode; and the reflective pixel electrode includes a constricted part in close proximity to the contact hole in plan view.
Abstract:
A method of producing a thin film transistor array substrate which includes an insulating substrate, a display pixel having a pixel electrode connected to a drain electrode, a gate wiring, and a source wiring perpendicular to the gate wiring, comprising forming a first thin metal multi-layer film an upper layer of which includes aluminum, and spreading a photo-resist, forming the photo-resist to a thickness less in an area connected to a second thin metal film than other area, patterning the first thin metal film, reducing a thickness of the photo-resist layer and removing the photo-resist in the area, removing the upper layer in the area to expose a lower layer, forming an interlayer insulating film and patterning it to expose the lower layer in the area, and patterning the second thin metal film to include the area, to connect the lower layer to the second thin metal film.
Abstract:
A liquid crystal display device displays images by applying an electric field substantially parallel to an insulating substrate between a pixel electrode and a common electrode placed across from each other. The liquid crystal display device has a capacitor terminal connected to the pixel electrode and placed opposite to a capacitor electrode with an insulating layer therebetween. The pixel electrode has at least two voltage supply paths to the capacitor terminal.
Abstract:
A liquid crystal display of the present invention comprises a display portion having two opposed insulating substrates (an electrode substrate (1) and an opposed substrate 2) holding a liquid crystal layer to form a plurality of display elements, wires (3a) formed on at least one of the insulating substrates, for supplying signals to the plurality of display elements, a driver LSI (6) provided in a peripheral portion of the insulating substrate, being connected to terminals of the wires (3a, 3b) to drive a plurality of display elements, and a conductive film pattern portion formed on the wires (3a) in the peripheral portion of the insulating substrate with a first insulating layer interposed therebetween. With this constitution, a liquid crystal display which allows inspection of output signals of the driver LSI in a failure analysis, without extending wires or exposing electrode portions connected to the wires and a method of inspecting the liquid crystal display are provided.
Abstract:
The present invention relates to a liquid crystal display device of In-Plane Switching mode. The liquid crystal display device includes a common electrode having an overlap portion in which the common electrode is overlapped with a source line. The common electrode has separating areas for line disconnection recovery outside of the overlap portion. The separating areas disconnect the overlap portion from other portion of the common electrode at least between which and a pixel electrode is generated an electric field.