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公开(公告)号：US10331045B2
公开(公告)日：2019-06-25
申请号：US15739824
申请日：2016-05-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Robbert Edgar Van Leeuwen
Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.
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公开(公告)号：US09977348B2
公开(公告)日：2018-05-22
申请号：US15502466
申请日：2015-06-25
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Suzanne Johanna Antonetta Geertruda Cosijns , Anne Willemijn Bertine Quist , Lukasz Sosniak , Frank Johannes Jacobus Van Boxtel , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
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公开(公告)号：US09891542B2
公开(公告)日：2018-02-13
申请号：US15387461
申请日：2016-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Steven Christiaan Westerlaken , Gerardus Arnoldus Hendricus Franciscus Janssen , Peter Paul Steijaert , Engelbertus Antonius Fransiscus Van Der Pasch , Franciscus Van De Mast
CPC classification number: G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
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公开(公告)号：US20170242349A1
公开(公告)日：2017-08-24
申请号：US15387461
申请日：2016-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Steven Christiaan Westerlaken , Gerardus Arnoldus Hendricus Franciscus Janssen , Peter Paul Steijaert , Engelbertus Antonius Fransiscus Van Der Pasch , Franciscus Van De Mast
IPC: G03F7/20
CPC classification number: G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
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公开(公告)号：US20130162966A1
公开(公告)日：2013-06-27
申请号：US13687524
申请日：2012-11-28
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria BEERENS , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
CPC classification number: G01B11/14 , G03F7/70008 , G03F7/70775
Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.
Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。
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Patent Agency Ranking
公开(公告)号：US11262661B2
公开(公告)日：2022-03-01
申请号：US16431833
申请日：2019-06-05
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Arie Jeffrey Den Boef , Duygu Akbulut , Marinus Johannes Maria Van Dam , Hans Butler , Hugo Augustinus Joseph Cramer , Engelbertus Antonius Fransiscus Van Der Pasch , Ferry Zijp , Jeroen Arnoldus Leonardus Johannes Raaymakers , Marinus Petrus Reijnders
IPC: G01N21/956 , G03F7/20
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US10571815B2
公开(公告)日：2020-02-25
申请号：US16547933
申请日：2019-08-22
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US10466599B2
公开(公告)日：2019-11-05
申请号：US16099733
申请日：2017-04-20
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US09696638B2
公开(公告)日：2017-07-04
申请号：US14965467
申请日：2015-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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公开(公告)号：US09606458B2
公开(公告)日：2017-03-28
申请号：US14430507
申请日：2013-09-12
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Dekkers , Andre Bernardus Jeunink , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Carolus Johannes Catharina Schoormans , Peter Hoekstra
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
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