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21.发明授权公开(公告)号：US10802410B2
公开(公告)日：2020-10-13
申请号：US15299240
申请日：2016-10-20
发明人： Nicolaas Rudolf Kemper , Marcel Beckers , Stefan Philip Christiaan Belfroid , Ferdy Migchelbrink , Sergei Shulepov
IPC分类号： G03F7/20
摘要： A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.
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公开(公告)号：US10114299B2
公开(公告)日：2018-10-30
申请号：US15311544
申请日：2015-05-07
发明人： Günes Nakiboglu , Mark Constant Johannes Baggen , Gerard Johannes Boogaard , Nicolaas Rudolf Kemper , Sander Kerssemakers , Robertus Mathijs Gerardus Rijs , Frank Johannes Jacobus Van Boxtel , Erwin Antonius Henricus Franciscus Van Den Boogaert , Marc Wilhelmus Maria Van Der Wijst , Martinus Van Duijnhoven , Jessica Henrica Anna Verdonschot , Hendrikus Herman Marie Cox
IPC分类号： G10K11/168 , G03F7/20 , G10K11/16
摘要： A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.
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公开(公告)号：US20170357161A1
公开(公告)日：2017-12-14
申请号：US15688262
申请日：2017-08-28
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
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公开(公告)号：US09766556B2
公开(公告)日：2017-09-19
申请号：US15266453
申请日：2016-09-15
发明人： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Sergei Shulepov
CPC分类号： G03F7/70866 , G03F7/70341 , H01L21/67034
摘要： A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
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公开(公告)号：US20220082948A1
公开(公告)日：2022-03-17
申请号：US17531953
申请日：2021-11-22
发明人： Christian Gerardus Norbertus Hendricus Marie CLOIN , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michael Christiaan Van Der Wekken
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
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公开(公告)号：US10331047B2
公开(公告)日：2019-06-25
申请号：US15687938
申请日：2017-08-28
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03F7/20
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US10126664B2
公开(公告)日：2018-11-13
申请号：US15483410
申请日：2017-04-10
IPC分类号： G03F7/20
摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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28.发明授权公开(公告)号：US10018925B2
公开(公告)日：2018-07-10
申请号：US15452445
申请日：2017-03-07
发明人： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC分类号： G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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公开(公告)号：US09746782B2
公开(公告)日：2017-08-29
申请号：US14975412
申请日：2015-12-18
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
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公开(公告)号：US09618853B2
公开(公告)日：2017-04-11
申请号：US14831663
申请日：2015-08-20
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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