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21.发明申请Apparatus and methods for minimizing force variation from immersion liquid in lithography systems 审中-公开用于最小化光刻系统中浸入液体的力变化的装置和方法公开(公告)号：US20080198348A1
公开(公告)日：2008-08-21
申请号：US12068737
申请日：2008-02-11
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic projection apparatus includes an optical assembly that projects an image onto a workpiece, and a containment member disposed adjacent to a lower end of the optical assembly. The containment member has an aperture through which an exposure beam passes from the optical assembly to the workpiece. The lithographic projection apparatus also includes a stage assembly including a workpiece table that supports the workpiece adjacent to the containment member. A space between the containment member and the workpiece is filled with an immersion liquid. The lithographic projection apparatus further includes a liquid collection system that has a recess in the workpiece table that receives immersion liquid that overflows the space between the containment member and the workpiece. At least part of the recess is disposed radially outward of the workpiece. The recess is partially filled with a porous material.
摘要翻译： 光刻投影装置包括将图像投影到工件上的光学组件和邻近光学组件的下端设置的容纳构件。 容纳构件具有孔，曝光光束通过该孔从光学组件通过工件。 平版印刷投影装置还包括台架组件，其包括支撑靠近容纳构件的工件的工件台。 容纳构件和工件之间的空间填充有浸没液体。 光刻投影装置还包括液体收集系统，该液体收集系统在工件台中具有凹部，该凹部接收溢流在容纳构件和工件之间的空间的浸没液体。 凹部的至少一部分设置在工件的径向外侧。 凹部部分地填充有多孔材料。
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22.发明申请Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中公开(公告)号：US20070279608A1
公开(公告)日：2007-12-06
申请号：US11523595
申请日：2006-09-20
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.
摘要翻译： 公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。 该装置包括限定图像的成像元件和被配置为支撑基板的台。 提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。 在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。 使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。 在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。
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公开(公告)号：US20120013861A1
公开(公告)日：2012-01-19
申请号：US13137964
申请日：2011-09-22
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.
摘要翻译： 一种设备和方法为浸没式光刻提供流体。 可以沿一个方向移动的喷嘴构件被布置成围绕光学元件下方的空间。 喷嘴构件可以具有用于在曝光期间将浸没液体供应到光学元件下方的空间的输入，以及在曝光期间从喷嘴构件和晶片之间的间隙移除浸没液体的输出。 浸入液体可以以第一速率从喷嘴构件的第一部分以第二速率从曝光中的第二部分以第二速率供应到空间。 晶片衬底通过浸没液体被光照射。
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公开(公告)号：US07283200B2
公开(公告)日：2007-10-16
申请号：US10623004
申请日：2003-07-17
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
IPC分类号： G03B27/42
CPC分类号： G03F7/70775
摘要： A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.
摘要翻译： 用于测量载物台（248）沿着第一轴线的位置的测量系统（222）包括第一系统（260），该第一系统（260）具有第一光束源（260A），该第一光束源引导第一光束（260H） 与第二轴平行，并且第一重定向器（260D）重定向第一光束，使得重定向的第一光束（260H）在与第一轴平行的第一重定向路径上，而与第一重定向器 （260D）围绕第三轴线。 测量系统（222）可以包括保护第一光束（260H）免受环境条件影响的屏蔽（380）。
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25.发明申请公开(公告)号：US20100231876A1
公开(公告)日：2010-09-16
申请号：US12801081
申请日：2010-05-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： Apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. Liquid is supplied through a supply inlet. A porous member is disposed adjacent to a space. The porous member includes a first portion and a second portion. A recovery capability to remove the supplied liquid from the space through the first portion is different from a recovery capability to remove the supplied liquid from the space through the second portion.
摘要翻译： 设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。 液体通过供应入口供应。 多孔构件邻近空间设置。 多孔构件包括第一部分和第二部分。 通过第一部分从空间去除供应的液体的恢复能力不同于通过第二部分从空间移除供应的液体的恢复能力。
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26.发明申请Exposure apparatus that includes a phase change circulation system for movers 审中-公开包括移动器的相变循环系统的曝光装置公开(公告)号：US20080073563A1
公开(公告)日：2008-03-27
申请号：US11479628
申请日：2006-07-01
申请人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
发明人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
IPC分类号： G01F23/00
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译： 用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330） 。 循环系统（330）将循环流体（378）引导到流体通道（370）中。 循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。 通过这种设计，可以优化液体（378A）和气体（378B）的管道。 另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。 通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于 通道入口处的循环流体（378）的温度（374）。 此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体的状态的压力控制装置（996） 978）在通道入口附近（974）。 通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。
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公开(公告)号：US09285683B2
公开(公告)日：2016-03-15
申请号：US13137964
申请日：2011-09-22
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.
摘要翻译： 一种设备和方法为浸没式光刻提供流体。 可以沿一个方向移动的喷嘴构件被布置成围绕光学元件下方的空间。 喷嘴构件可以具有用于在曝光期间将浸没液体供应到光学元件下方的空间的输入，以及在曝光期间从喷嘴构件和晶片之间的间隙移除浸没液体的输出。 浸入液体可以以第一速率从喷嘴构件的第一部分以第二速率从曝光中的第二部分以第二速率供应到空间。 晶片衬底通过浸没液体被光照射。
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公开(公告)号：US07751026B2
公开(公告)日：2010-07-06
申请号：US11443361
申请日：2006-05-31
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. A porous member is disposed adjacent to the immersion area. A pressure control system provides a first low pressure to a first portion of the porous member to remove immersion fluid that escapes from the immersion area, and provides a second low pressure to a second portion of the porous member to remove immersion fluid that escapes from the immersion area. The second low pressure is different from the first low pressure.
摘要翻译： 一种设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。 多孔构件邻近浸没区域设置。 压力控制系统向多孔构件的第一部分提供第一低压以去除从浸没区域逸出的浸没流体，并且向多孔构件的第二部分提供第二低压以除去从该多孔构件逸出的浸没流体 沉浸区域。 第二低压与第一低压不同。
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公开(公告)号：US06917412B2
公开(公告)日：2005-07-12
申请号：US10375785
申请日：2003-02-26
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/70758
摘要： Methods and apparatus for providing a stage apparatus which is modular and allows for reaction force cancellation are described. According to one aspect of the present invention, a stage apparatus includes a table assembly and a first stage. The table assembly supports an object, e.g., a wafer or a reticle, which is to be moved. The first stage includes a counter mass arrangement, a plurality of carriages, and a plurality of linkages. The plurality of carriages is coupled to the table assembly through the plurality of linkages such that a first carriage and a second carriage are arranged to move in substantially opposite directions along a first axis to cause the table assembly to move along a second axis while reaction forces generated when the first carriage and the second carriage are substantially cancelled by the counter mass arrangement.
摘要翻译： 描述了用于提供模块化并允许反作用力抵消的平台装置的方法和装置。 根据本发明的一个方面，一种台架装置包括台组件和第一台。 桌子组件支撑要移动的物体，例如，晶片或掩模版。 第一阶段包括对质量布置，多个托架和多个连杆。 多个滑架通过多个连杆联接到工作台组件，使得第一滑架和第二滑架被布置成沿着第一轴线在基本上相反的方向上移动，以使台面组件沿着第二轴线移动，同时反作用力 当第一托架和第二托架基本上被反质量布置取消时产生。
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30.发明授权公开(公告)号：US08780323B2
公开(公告)日：2014-07-15
申请号：US13064232
申请日：2011-03-11
CPC分类号： G03F7/70925 , G03B27/42 , G03F7/70341 , G03F7/70725
摘要： Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
摘要翻译： 通过移动衬底相对于浸入式喷嘴使基板的剩余部分已经通过浸入式喷嘴的方式残留在基板的一部分上的浸入流体，使得残留有浸没流体的基板部分再次被浸入式喷嘴通过。 确定要移动衬底以移除剩余浸没流体的路径。 该路径可以基于先前的基底移动来确定，包括先前移动的速度和/或长度等因素。 或者，可以检测浸入液体残留的基板的部分，然后基于检测结果，移动基板以使浸没流体保留的基板的部分通过浸渍喷嘴。 浸没流体也可以从位于基底之外的载物台表面除去。
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