公开(公告)号：US20230161274A1

公开(公告)日：2023-05-25

申请号：US18158293

申请日：2023-01-23

Applicant: Applied Materials, Inc.

Inventor： Uwe HOLLERBACH ,  Thomas L. LAIDIG

IPC: G03F7/20

CPC classification number: G03F7/70991 ,  G03F7/70508 ,  G03F7/70291 ,  G03F7/70383 ,  H01L21/0274

Abstract: Aspects of disclosure provide a method for attaching wiring connections to a component using both design and field measured data of the component to produce accurate wiring connections.

公开(公告)号：US20230152712A1

公开(公告)日：2023-05-18

申请号：US17915056

申请日：2020-04-29

Applicant: Applied Materials, Inc.

Inventor： Thomas L. LAIDIG ,  Christopher Dennis BENCHER

IPC: G03F7/20

CPC classification number: G03F7/70508 ,  G03F7/709 ,  G03F7/70291

Abstract: The present disclosure provides methods and systems for correcting the shooting of images from a spatial light modulator (SLM) to a substrate, when cross-scan vibrations, including sub-pixel cross-scan vibrations, are present. The methods and systems include shifting a mask pattern on an SLM rotated relative to the in-scan direction of travel on a substrate, shifting along an axis of the SLM to correct for cross-scan vibrations, and either delaying, or accelerating, the shooting of the mask pattern onto the substrate.

公开(公告)号：US20200073253A1

公开(公告)日：2020-03-05

申请号：US16597718

申请日：2019-10-09

Applicant: Applied Materials, Inc.

Inventor： Joseph R. JOHNSON ,  Thomas L. LAIDIG ,  Christopher Dennis BENCHER

IPC: G03F7/20 ,  G03B27/70

Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.

公开(公告)号：US20190243250A1

公开(公告)日：2019-08-08

申请号：US16389412

申请日：2019-04-19

Applicant: Applied Materials, Inc.

Inventor： Thomas L. LAIDIG ,  Joseph R. JOHNSON ,  Christopher Dennis BENCHER

IPC: G03F7/20

CPC classification number: G03F7/2051

Abstract: An image correction application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The embodiments described herein relate to a software application platform, which corrects non-uniform image patterns on a substrate. The application platform method includes in a digital micromirror device (DMD) installed in an image projection system, the DMD having a plurality of columns, each column having a plurality of mirrors, disabling at least one entire column of the plurality of columns, exposing a first portion of the substrate to a first shot of electromagnetic radiation, exposing a second portion of the substrate to a second shot of electromagnetic radiation, and iteratively translating the substrate a step size and exposing another portion of the substrate to another shot of electromagnetic radiation until the substrate has been completely exposed to shots of electromagnetic radiation.

公开(公告)号：US20170068163A1

公开(公告)日：2017-03-09

申请号：US15253379

申请日：2016-08-31

Applicant: Applied Materials, Inc.

Inventor： Thomas L. LAIDIG ,  Joseph R. JOHNSON ,  Christopher Dennis BENCHER

IPC: G03F7/20

CPC classification number: G03F7/2051

Abstract: An image correction application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The embodiments described herein relate to a software application platform, which corrects non-uniform image patterns on a substrate. The application platform method includes in a digital micromirror device (DMD) installed in an image projection system, the DMD having a plurality of columns, each column having a plurality of mirrors, disabling at least one entire column of the plurality of columns, exposing a first portion of the substrate to a first shot of electromagnetic radiation, exposing a second portion of the substrate to a second shot of electromagnetic radiation, and iteratively translating the substrate a step size and exposing another portion of the substrate to another shot of electromagnetic radiation until the substrate has been completely exposed to shots of electromagnetic radiation.

Abstract translation: 公开了一种在制造过程中涉及将无掩模光刻图案应用于基板的能力的图像校正应用。 这里描述的实施例涉及校正衬底上的不均匀图像图案的软件应用平台。 应用平台方法包括安装在图像投影系统中的数字微镜装置（DMD），DMD具有多个列，每列具有多个反射镜，禁用多个列的至少一个整列，暴露一个 衬底的第一部分到电磁辐射的第一射击，将衬底的第二部分暴露于电磁辐射的第二射击，并且迭代地将衬底平移到步长并将衬底的另一部分暴露于另一射电的电磁辐射直到 基板已经完全暴露于电磁辐射的射击。

公开(公告)号：US20170003598A1

公开(公告)日：2017-01-05

申请号：US15188667

申请日：2016-06-21

Applicant: Applied Materials, Inc.

Inventor： Joseph R. JOHNSON ,  Christopher Dennis BENCHER ,  Thomas L. LAIDIG

IPC: G03F7/20

CPC classification number: G03F7/70041 ,  G03F7/70291 ,  G03F7/70583

Abstract: An image correction application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The embodiments described herein relate to a software application platform which maintains the ability to correct non-uniform image patterns using time-shifted exposures of the substrate. The application exposes subsequent portions of a substrate to electromagnetic radiation at variable and alternating pulse frequencies using a time delay in order to correct interference patterns and increase exposure uniformity.

Abstract translation: 公开了一种在制造过程中涉及将无掩模光刻图案应用于基板的能力的图像校正应用。 本文描述的实施例涉及一种软件应用平台，其保持使用衬底的时移曝光校正不均匀图像图案的能力。 该应用使用时间延迟以可变和交替的脉冲频率将衬底的后续部分暴露于电磁辐射，以便校正干涉图案并增加曝光均匀性。

公开(公告)号：US20160284044A1

公开(公告)日：2016-09-29

申请号：US15078444

申请日：2016-03-23

Applicant: Applied Materials, Inc.

Inventor： Thomas L. LAIDIG ,  Jun YANG

IPC: G06T1/20 ,  G06T1/60

CPC classification number: G06T1/20

Abstract: A low-latency high bandwidth data path software application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The application processes graphical objects and configures the graphical objects for partition into a plurality of trapezoids. A tessellation of the graphical objects to trapezoids may simplify the rasterization stage. The application may use caching and parallel computation to compute rasterized images of the trapezoids quickly. Additionally, low-latency may allow for the correction of stage imperfections.

Abstract translation: 公开了一种涉及在制造过程中将无掩模光刻图案应用于基板的能力的低延迟高带宽数据路径软件应用。 应用程序处理图形对象并将分区的图形对象配置为多个梯形。 图形对象到梯形的细分可以简化光栅化阶段。 应用程序可以使用缓存和并行计算来快速计算梯形图的光栅化图像。 此外，低等待时间可能允许校正舞台瑕疵。

公开(公告)号：US20240126180A1

公开(公告)日：2024-04-18

申请号：US18484016

申请日：2023-10-10

Applicant: Applied Materials, Inc.

Inventor： Jang Fung CHEN ,  Thomas L. LAIDIG ,  Chung-Shin KANG ,  Chi-Ming TSAI ,  Wei-Ning SHEN

IPC: G03F7/00

CPC classification number: G03F7/70508

Abstract: Embodiments of the present disclosure relate to a system, a software application, and methods of digital lithography for semiconductor packaging. The method includes comparing positions of vias and via locations, generating position data based on the comparing the positions of vias and the via locations, providing the position data of the vias to a digital lithography device, updating a redistributed metal layer (RDL) mask pattern according to the position data such that RDL locations correspond to the positions of the vias, and projecting the RDL mask pattern with the digital lithography device.

公开(公告)号：US20240012978A1

公开(公告)日：2024-01-11

申请号：US18470717

申请日：2023-09-20

Applicant: Applied Materials, Inc.

Inventor： Aravind INUMPUDI ,  Thomas L. LAIDIG

IPC: G06F30/398 ,  G03F1/72

CPC classification number: G06F30/398 ,  G03F1/72 ,  G06F2119/18

Abstract: Embodiments described herein relate to a system, software, and a method of using the system to edit a design to be printed by a lithography system. The system and methods utilize a server of a maskless lithography device. The server includes a memory. The memory includes a virtual mask file. The virtual mask file includes cells and the cells include sub-cells that form one or more polygons. The server further includes a controller coupled to the memory. The controller is configured to receive a replacement table. The replacement table includes instructions to replace the cells of the virtual mask file. The controller is further configured to replace the cells with replacement cells according to the replacement table to create an edited virtual mask file.

公开(公告)号：US20220367438A1

公开(公告)日：2022-11-17

申请号：US17636998

申请日：2019-09-23

Applicant: Applied Materials, Inc.

Inventor： Chung-Shin KANG ,  Thomas L. LAIDIG ,  Yinfeng DONG ,  Yao-Cheng YANG ,  Chen-Chien HUNG ,  Shivaraj Gururaj KAMALAPURA ,  Tsaichuan KAO

IPC: H01L27/02 ,  G03F7/20 ,  G06F30/398

Abstract: A digital pattern generation system comprises a memory and a controller. The controller is coupled the memory and is configured to remove redundant cells from a digital pattern file, generate a first updated digital pattern file and compare the first updated digital pattern file with the digital pattern file. Further a number of vertexes of a first arc of the first updated digital pattern file is reduced to generate a second updated digital pattern file. Additionally, a first cell of the second updated digital pattern file is replaced with an alternative version of the first cell to generate a third updated digital pattern file. Further, one or more polygons within the third updated digital pattern file is converted to one or more quad polygons to generate an optimized digital pattern file.