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公开(公告)号：US20070247722A1
公开(公告)日：2007-10-25
申请号：US11716679
申请日：2007-03-12
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D 1表示的最大直径，并且第二凸度具有由D 2表示的最大直径和0.8
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公开(公告)号：US20050231813A1
公开(公告)日：2005-10-20
申请号：US10931051
申请日：2004-09-01
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
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公开(公告)号：US06891596B2
公开(公告)日：2005-05-10
申请号：US10379809
申请日：2003-03-06
CPC分类号： G02B13/143 , G03F7/70241 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.
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24.发明申请PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND PROJECTION OBJECTIVE 有权投影曝光装置，投影曝光方法和投影目标公开(公告)号：US20080117400A1
公开(公告)日：2008-05-22
申请号：US11747630
申请日：2007-05-11
CPC分类号： G03F7/70225 , G02B17/0892 , G03F7/70275
摘要： A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).
摘要翻译： 一种投影曝光装置，用于曝光布置在投影物镜的图像表面的区域中的辐射敏感基板，其具有布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像 具有用于从围绕中心工作波长λ> 200nm的带宽为10mPa的波长带发射紫外光的光源; 照明系统，用于接收来自光源的光并将照射辐射引导到掩模的图案上; 以及用于将掩模的结构成像到感光基板上的投影物镜。 投影物镜是一个反射折射投影物镜，它具有至少一个凹面镜，该凹面镜布置在投影物镜的光瞳表面的区域中，以及一个负极组，具有至少一个负透镜， 瞳孔表面，其中成像的边缘射线高度（MRH）大于主射线高度（CRH）。
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公开(公告)号：US20050231814A1
公开(公告)日：2005-10-20
申请号：US11085602
申请日：2005-03-22
CPC分类号： G02B13/143 , G03F7/70241 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.
摘要翻译： 适用于浸没式微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在具有负折射力的第一透镜组，具有正折射力的第二透镜组， 提供具有负折射率的第三透镜组，具有正折射率的第四透镜组和具有正折射率的第五透镜组。 系统孔径在第四和第五透镜组之间的最大光束直径的区域中。 根据本发明的投影物镜的实施例与大图像场一起实现了NA> 1的非常高的数值孔径，并且通过良好的光学校正状态和适度的总体尺寸来区分。 在波长低于200nm的情况下，当在投影物镜和基底之间使用浸液时，可以解析出大致低于100nm的图案宽度。
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公开(公告)号：US07312847B2
公开(公告)日：2007-12-25
申请号：US11085602
申请日：2005-03-22
CPC分类号： G02B13/143 , G03F7/70241 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.
摘要翻译： 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在具有负折射光焦度的第一透镜组，具有正折射光焦度的第二透镜组， 提供具有负折射率的第三透镜组，具有正折射率的第四透镜组和具有正折射率的第五透镜组。 系统孔径在第四和第五透镜组之间的最大光束直径的区域中。 根据本发明的投影物镜的实施例与大图像场一起实现了NA> 1的非常高的数值孔径，并且通过良好的光学校正状态和适度的总体尺寸来区分。 在波长低于200nm的情况下，当在投影物镜和基底之间使用浸液时，可以解析出大致低于100nm的图案宽度。
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公开(公告)号：US06906866B2
公开(公告)日：2005-06-14
申请号：US10688212
申请日：2003-10-15
CPC分类号： G03F7/70241 , G02B13/143
摘要： According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.
摘要翻译： 根据一个示例性实施例，提供具有物平面和像平面的投影透镜，并且包括以成像方式对象地列出的以下透镜组：（1）具有负屈光力的第一透镜组; 和（2）具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中，投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四，第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径，并且具有1/2腰围结构，其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。
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公开(公告)号：US09182578B2
公开(公告)日：2015-11-10
申请号：US13326516
申请日：2011-12-15
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
CPC分类号： G02B17/0663 , G02B27/0905 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.
摘要翻译： 成像光学系统具有多个反射镜，其将物平面中的对象场成像到图像平面中的图像场。 至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。 物体场的纵横比大于1.物体场的最小和最大横向尺寸的比可以小于0.9。
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公开(公告)号：US08730572B2
公开(公告)日：2014-05-20
申请号：US13470956
申请日：2012-05-14
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。
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公开(公告)号：US08416490B2
公开(公告)日：2013-04-09
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。
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