公开(公告)号：US20120194123A1

公开(公告)日：2012-08-02

申请号：US13332572

申请日：2011-12-21

申请人： Yu-Liang Lin ,  Chun-Hsueh Lee

发明人： Yu-Liang Lin ,  Chun-Hsueh Lee

IPC分类号： H02P23/08

CPC分类号： F04D27/004

摘要： A fan rotation speed control circuit comprises an AC power source, a coil electrically connected with the AC power source, a sensing module having a first resistor and a sensing device in parallel connection with mentioned first resistor, a capacitor, a DIAC, and a TRIAC having a first terminal, a second terminal and a gate terminal, wherein mentioned coil electrically connected with the first resistor and the sensing device, mentioned capacitor electrically connected with the first resistor and the sensing device, mentioned DIAC electrically connected with the first resistor, the sensing device and the capacitor, mentioned first terminal electrically connected with the first resistor, the sensing device and the coil, mentioned second terminal electrically connected with the capacitor and the AC power source, and mentioned gate terminal electrically connected with the DIAC.

摘要翻译： 风扇转速控制电路包括AC电源，与AC电源电连接的线圈，具有第一电阻器和与所述第一电阻器并联连接的感测装置的感测模块，电容器，DIAC和TRIAC 具有第一端子，第二端子和栅极端子，其中所述线圈与第一电阻器和感测装置电连接，所述电容器与第一电阻器和感测装置电连接，提及与第一电阻器电连接的DIAC， 所述第一端子与第一电阻器，感测装置和线圈电连接，所述第二端子与电容器和AC电源电连接，并且所述栅极端子与DIAC电连接。

公开(公告)号：US20060043950A1

公开(公告)日：2006-03-02

申请号：US11111807

申请日：2005-04-22

申请人： Yu-Liang Lin ,  Yu-Lung Dung ,  Yueh-Lung Huang ,  Ming-Shi Tsai

发明人： Yu-Liang Lin ,  Yu-Lung Dung ,  Yueh-Lung Huang ,  Ming-Shi Tsai

IPC分类号： G05F1/40

CPC分类号： H02P7/29 ,  G06F1/206 ,  H02M2001/0025 ,  Y02D10/16

摘要： A fan motor speed control circuit and a voltage-regulating module thereof are disclosed. The fan motor speed control circuit includes the voltage-regulating module and a driving module electrically connected to the voltage-regulating module. The driving module includes a pulse signal generating unit, a speed control unit, and a drive unit. The speed control unit compares a high frequency pulse signal generated by the pulse signal generating unit with a variable reference voltage signal output by the voltage-regulating module, and then outputs a control signal to the drive unit to proceed the speed control of the fan motor. In application, the voltage-regulating module and the driving module are electrically connected to a voltage source in parallel.

摘要翻译： 公开了一种风扇电动机速度控制电路及其电压调节模块。 风扇电动机速度控制电路包括电压调节模块和电连接到电压调节模块的驱动模块。 驱动模块包括脉冲信号发生单元，速度控制单元和驱动单元。 速度控制单元将由脉冲信号生成单元生成的高频脉冲信号与由电压调节模块输出的可变参考电压信号进行比较，然后向驱动单元输出控制信号，以进行风扇电动机的速度控制 。 在应用中，电压调节模块和驱动模块并联电连接到电压源。

公开(公告)号：US06857942B1

公开(公告)日：2005-02-22

申请号：US09481224

申请日：2000-01-11

申请人： Yu-Liang Lin ,  Chih-I Peng

发明人： Yu-Liang Lin ,  Chih-I Peng

IPC分类号： B24B1/00 ,  B24B37/04 ,  B24B53/007 ,  B24B53/12

CPC分类号： B24B53/017 ,  B24B53/12

摘要： An apparatus and a method for off-line pre-conditioning a conditioning disc that is used in a chemical mechanical polishing process are provided. In the apparatus, an upper platform for mounting a conditioning disc thereto and a lower platform for mounting a polishing pad thereto are engaged together under a pre-set pressure and rotated in opposite directions for a pre-set length of time. The apparatus is effective in removing loose particles from the surface of the conditioning disc such that the possibility of any such particles causing scratches on a wafer surface during a subsequently conducted chemical mechanical polishing process is eliminated. The present invention novel apparatus can be used off-line for pre-conditioning a conditioning disc such that valuable machine time of a chemical mechanical polishing apparatus is not wasted.

摘要翻译： 提供了用于离线预处理用于化学机械抛光工艺中的调节盘的设备和方法。 在该装置中，用于安装调节盘的上平台和用于将抛光垫安装在其上的下平台在预定压力下接合在一起并以相反方向旋转预定的时间长度。 该装置有效地从调节盘的表面去除松散的颗粒，使得在随后进行的化学机械抛光工艺期间任何这种颗粒在晶片表面上引起划痕的可能性被消除。 本发明的新型设备可以离线使用，用于对调节盘进行预处理，使得化学机械抛光装置的有价值的机器时间不被浪费。

公开(公告)号：USD486906S1

公开(公告)日：2004-02-17

申请号：US29178618

申请日：2003-03-31

申请人： Li-Hui Xiao ,  Te-Fu Chen ,  Yu-Liang Lin ,  Tsung-Yu Lei ,  Kuo-Cheng Lin

设计人： Li-Hui Xiao ,  Te-Fu Chen ,  Yu-Liang Lin ,  Tsung-Yu Lei ,  Kuo-Cheng Lin

公开(公告)号：US06341997B1

公开(公告)日：2002-01-29

申请号：US09634494

申请日：2000-08-08

申请人： Yu-Liang Lin

发明人： Yu-Liang Lin

IPC分类号： B24B100

CPC分类号： B24B53/017 ,  B08B5/02 ,  B08B7/0064 ,  B24B53/12 ,  B24C1/003

摘要： A method for cleaning or recycling a polishing pad conditioning disk used in a chemical mechanical polishing apparatus is disclosed. In the method, a conditioning disk that has a top surface formed of diamond particles and covered by a layer of polishing debris such as silicon oxide is first provided. A water jet that has a pressure of at least 1,500 psi, or preferably, 3,000 psi is directed toward the top surface of the conditioning disk for at least 5 min., and preferably, for at least 10 min. to substantially remove the polishing debris. The conditioning disk is then positioned on a heated surface and heated to a temperature of at least 40° C. while simultaneously being blown by a flow of inert gas or CO2 maintained at 0° C. or below on the top surface to remove any residual polishing debris by causing a thermal shock in the silicon oxide films and a separation from the conditioning disk.

摘要翻译： 公开了一种用于清洁或再循环用于化学机械抛光装置中的抛光垫调节盘的方法。 在该方法中，首先提供具有由金刚石颗粒形​​成并被一层抛光残渣（例如氧化硅）覆盖的顶表面的调节盘。 具有至少1,500psi或优选3,000psi压力的水射流指向调理盘的顶表面至少5分钟，优选至少10分钟。 以基本上去除抛光碎片。 然后将调节盘定位在加热的表面上并加热到至少40℃的温度，同时通过在顶表面上保持在0℃或更低的惰性气体或二氧化碳的流动吹扫以除去任何残余物 通过在氧化硅膜中引起热冲击并与调节盘分离来抛光碎片。

公开(公告)号：US08133097B2

公开(公告)日：2012-03-13

申请号：US12437315

申请日：2009-05-07

申请人： Yu-Liang Lin ,  Chien Ling Hwang ,  Jean Wang ,  Chen-Hua Yu

发明人： Yu-Liang Lin ,  Chien Ling Hwang ,  Jean Wang ,  Chen-Hua Yu

IPC分类号： B24B7/22 ,  B24B57/02

CPC分类号： B24B57/02 ,  B24B37/107 ,  B24B53/017 ,  H01L21/02052

摘要： A chemical mechanical polishing (CMP) device for processing a wafer is provided which includes a plate for supporting the wafer to be processed in a face-up orientation, a polishing head opposing the plate, wherein the polishing head includes a rotatable polishing pad operable to contact the wafer while the polishing pad is rotating, and a slurry coating system providing a slurry to the polishing pad for polishing the wafer.

摘要翻译： 提供了一种用于处理晶片的化学机械抛光（CMP）装置，其包括用于以面朝上的方向支撑待加工的晶片的板，与该板相对的抛光头，其中抛光头包括可旋转的抛光垫， 在抛光垫旋转的同时接触晶片;以及浆料涂覆系统，其向抛光垫提供浆料以抛光晶片。

公开(公告)号：US07905109B2

公开(公告)日：2011-03-15

申请号：US11226721

申请日：2005-09-14

申请人： Chien Ling Hwang ,  Yu-Liang Lin ,  Fu-Kang Tien ,  Jyh-Chemg Sheu

发明人： Chien Ling Hwang ,  Yu-Liang Lin ,  Fu-Kang Tien ,  Jyh-Chemg Sheu

IPC分类号： F25D17/02

CPC分类号： H01L21/67109

摘要： A rapid cooling system for a rapid thermal processing chamber includes a rapid thermal processing chamber having a wafer support for supporting a wafer. A tank having a supply of cooling liquid is provided in fluid communication with the chamber. A pump is provided in fluid communication with the rapid thermal processing chamber and the tank for pumping the cooling liquid from the tank to the chamber and cooling the wafer during the cooling phase of rapid thermal processing.

摘要翻译： 用于快速热处理室的快速冷却系统包括具有用于支撑晶片的晶片支撑件的快速热处理室。 提供具有冷却液供应的罐与腔室流体连通。 提供与快速热处理室和储罐流体连通的泵，用于将冷却液体从罐中泵送到室，并在快速热处理的冷却阶段期间冷却晶片。

公开(公告)号：US07826722B2

公开(公告)日：2010-11-02

申请号：US11450419

申请日：2006-06-12

申请人： Yu-Liang Lin ,  Tsung-Jung Hsieh ,  Yueh-Lung Huang ,  Wen-Shi Huang

发明人： Yu-Liang Lin ,  Tsung-Jung Hsieh ,  Yueh-Lung Huang ,  Wen-Shi Huang

IPC分类号： H02P7/29

CPC分类号： H02P7/2913

摘要： A driving apparatus for fan motors, electrically connected between a pulse width modulation (PWM) signal generator and a controller, includes a converter electrically connected to the PWM signal generator, generating a first reference voltage according to the duty cycle of a PWM signal generated by the PWM signal generator; a reference voltage generator electrically connected to an external power source, generating a second reference voltage according to the external power source; and a comparator having a first and second input terminal and an output terminal; wherein the first input terminal is electrically connected to the converter, the second input terminal is connected to the reference voltage generator and the output terminal is connected to the controller, and when the first reference voltage is greater than the second reference voltage, a driving signal is output from the output terminal to the controller to control the rotation speed of the fan motor.

摘要翻译： 电连接在脉宽调制（PWM）信号发生器和控制器之间的风扇电动机的驱动装置包括电连接到PWM信号发生器的转换器，根据由PWM信号发生器产生的PWM信号的占空比产生第一参考电压， PWM信号发生器; 电连接到外部电源的参考电压发生器，根据外部电源产生第二参考电压; 以及具有第一和第二输入端子和输出端子的比较器; 其中所述第一输入端子与所述转换器电连接，所述第二输入端子连接到所述参考电压发生器，并且所述输出端子连接到所述控制器，并且当所述第一参考电压大于所述第二参考电压时，驱动信号 从输出端子输出到控制器，以控制风扇马达的转速。

公开(公告)号：US20080112136A1

公开(公告)日：2008-05-15

申请号：US12013228

申请日：2008-01-11

申请人： Yu-Liang Lin ,  Yu-Lung Dung ,  Yueh-Lung Huang ,  Chen-Lin Huang

发明人： Yu-Liang Lin ,  Yu-Lung Dung ,  Yueh-Lung Huang ,  Chen-Lin Huang

IPC分类号： H05K7/20

CPC分类号： H05K1/0272 ,  F04B15/08 ,  F04D25/0633 ,  F04D25/068 ,  F04D29/5813 ,  F04D29/5853 ,  H01L2924/0002 ,  H05K1/0209 ,  H05K2201/09027 ,  H05K2201/09063 ,  H05K2201/09354 ,  H05K2201/09781 ,  H05K2201/10689 ,  H01L2924/00

摘要： A circuit board adapted to a fan comprises a circuit region and a heat-dissipative film. The circuit region is provided on a first surface of the circuit board and comprises at least one heat-generating component thereon. The heat-dissipative film is coated on an edge portion of the first surface and is in contact with the heat-generating component. A plurality of openings through the heat-dissipative film, a protrusion of the circuit board, a cutout in the protrusion to expose the heat-generating component to airflow, etc., have been disclosed and claimed for enhancing the efficiency in heat dissipation. A heat sink may also be provided on a second surface opposite to the first surface of the circuit board. The heat sink is connected to the heat-dissipative film to help dissipate the heat generated by the operation of the fan.

摘要翻译： 适于风扇的电路板包括电路区域和散热膜。 电路区域设置在电路板的第一表面上，并且在其上包括至少一个发热部件。 散热膜涂覆在第一表面的边缘部分上并与发热部件接触。 为了提高散热效率，已经公开并要求了通过散热膜的多个开口，电路板的突起，突起中的切口以将发热部件暴露于气流等。 也可以在与电路板的第一表面相对的第二表面上设置散热器。 散热器连接到散热片，以帮助消散风扇运行产生的热量。

公开(公告)号：US20060242967A1

公开(公告)日：2006-11-02

申请号：US11119218

申请日：2005-04-28

申请人： Yu-Liang Lin ,  Chin-Hsien Lin ,  Jerry Hwang

发明人： Yu-Liang Lin ,  Chin-Hsien Lin ,  Jerry Hwang

IPC分类号： F25B21/02

CPC分类号： H01L35/32 ,  H01L21/67109 ,  H01L35/325

摘要： A thermoelectric wafer chuck is disclosed. The thermoelectric wafer chuck includes a wafer support surface for supporting a wafer; and a thermoelectric module provided in thermal contact with the wafer support surface for heating and/or cooling the wafer support surface and wafer.

摘要翻译： 公开了一种热电晶片卡盘。 热电晶片卡盘包括用于支撑晶片的晶片支撑表面; 以及与所述晶片支撑表面热接触地设置用于加热和/或冷却晶片支撑表面和晶片的热电模块。