公开(公告)号：US20080017506A1

公开(公告)日：2008-01-24

申请号：US11547309

申请日：2005-03-17

申请人： Anja Blondeel ,  Wilmert De Bosscher

发明人： Anja Blondeel ,  Wilmert De Bosscher

IPC分类号： H01F7/00 ,  C23C14/35

CPC分类号： H01J37/3405

摘要： A tubular magnet assembly mountable inside a cylindrical target to which the magnet assembly can relatively rotate or translate is disclosed. The magnet assembly discriminates itself from the state-of-the-art in that it comprises both a ‘near’ magnetic field for confinement of charge in the vicinity of the target in combination with a ‘far’ magnetic field reaching the substrate for guidance of charge towards the substrate. Such a magnet assembly also has the advantage that it is angularly directional and can be mounted centrally in an ion plating deposition unit.

摘要翻译： 公开了一种可安装在磁体组件可以相对旋转或平移的圆柱形靶内的管状磁体组件。 磁体组件与现有技术相鉴定，因为它包括用于限制目标附近的电荷的“近”磁场，以及与到达衬底的“远”磁场结合，用于引导 向基板充电。 这样的磁体组件也具有其角度方向性并且可以集中安装在离子镀沉积单元中的优点。

公开(公告)号：US20060102465A1

公开(公告)日：2006-05-18

申请号：US10550507

申请日：2004-02-26

申请人： Anja Blondeel ,  Wilmert De Bosscher

发明人： Anja Blondeel ,  Wilmert De Bosscher

IPC分类号： C23C14/32

CPC分类号： C23C14/3407 ,  C23C14/564

摘要： A method for improving the sputter deposition process is provided. The method comprises the following steps: a) providing a vacuum; b) providing an electrode (10, 34, 34′, 44, 44′) in the provided vacuum ; c) providing a substrate in said vacuum, said substrate having no contact with said electrodes (10, 34, 34′, 44, 44′) providing a device (22, 22′, 24, 24′, 26, 26′, 28, 28′, 30, 36, 36′, 48, 48′) in the vacuum. The device is in relative motion to the electrode and is in contact with the electrode over a contact zone. The device removes solid material from the electrode or applies solid material to the electrode. The method is carried out by means of a simple mechanism. There is no need for complicated electronics or sophisticated control algorithms. The method is carried out in vacuum, i.e. there is no need to break the vacuum, so that the machine downtime is reduced.

摘要翻译： 提供了一种改进溅射沉积工艺的方法。 该方法包括以下步骤：a）提供真空; b）在所提供的真空中提供电极（10,34,34'，44,44'）; c）在所述真空中提供衬底，所述衬底与所述电极（10,34,34'，44,44'）没有接触，提供一个装置（22,22'，24,24'，26,26'，28 ，28'，30，36，36'，48，48'）。 器件与电极相对运动并且在接触区域上与电极接触。 该装置从电极移除固体材料或将固体材料施加到电极。 该方法通过简单的机制进行。 不需要复杂的电子或复杂的控制算法。 该方法在真空中进行，即不需要破坏真空，从而减少了机器停机时间。

公开(公告)号：US06375814B1

公开(公告)日：2002-04-23

申请号：US09673176

申请日：2001-02-12

申请人： Wilmert De Bosscher ,  Hugo Lievens

发明人： Wilmert De Bosscher ,  Hugo Lievens

IPC分类号： C23C1434

CPC分类号： H01J37/3405

摘要： A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly (22, 24*) is described, the magnet assembly (22, 24*) being adapted to produce an elongate plasma race-track on the surface of the target, the elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions (22′), wherein the spacing between the tracks of the race-track is increased locally to materially effect sputtering onto a substrate. The increase in spacing may be at the end portions or along the parallel track portion. The increase in spacing may provide more even erosion of the target beneath the end portions of the race-track, and provide more even coatings on the substrate.

摘要翻译： 描述了具有旋转的圆柱形靶和固定磁体组件（22,24 *）的溅射磁控管，磁体组件（22,24 *）适于在靶的表面上产生细长的等离子体跑道，细长 赛道在其长度的大部分上具有基本上平行的轨道，并且在每个端部处由端部部分（22'）封闭，其中轨道的轨道之间的间隔被局部增加以在衬底上实质上实现溅射。 间隔的增加可以在端部或沿平行的轨迹部分。 间隔的增加可以在跑道的端部之下提供更均匀的目标侵蚀，并且在基底上提供更均匀的涂层。

公开(公告)号：US06322679B1

公开(公告)日：2001-11-27

申请号：US09554790

申请日：2000-07-06

申请人： Wilmert De Bosscher ,  Dirk Cnockaert

发明人： Wilmert De Bosscher ,  Dirk Cnockaert

IPC分类号： C23C1434

CPC分类号： H01J37/3455 ,  H01J37/3408

摘要： The present invention provides a planar magnetron including a surface for mounting a planar substantially polygonal target (2) having a substantially central target area for sputtering onto a substrate. The magnetron comprises an array of magnets (4) defining a closed loop magnetic field for generating an elongated plasma race-track above the target (2). Means for establishing cyclical, relative, substantially translational movement between the race-track and the target support surface are provided, the substantially translational movement being substantially parallel to this surface and the trace of the substantially translational movement being a two-dimensional figure. The periphery of the race-track lies substantially within said substantially central target area throughout each cycle, the establishing means being adapted to provide a substantially uniform erosion of the target (2) at least within said substantially central target area.

摘要翻译： 本发明提供了一种平面磁控管，其包括用于安装具有用于溅射到基板上的基本中心目标区域的平面基本上多边形的靶（2）的表面。 磁控管包括限定用于在目标（2）上方产生细长等离子体跑道的闭环磁场的磁体阵列（4）。 提供了用于在跑道和目标支撑表面之间建立周期性的，相对的，基本上平移的运动的手段，基本平移的运动基本上平行于该表面，并且基本平移运动的轨迹是二维图形。 轨道的周边在每个循环内基本上位于所述基本上中心的目标区域内，所述建立装置适于至少在所述基本上中心的目标区域内提供目标（2）的基本均匀的侵蚀。

公开(公告)号：US08562799B2

公开(公告)日：2013-10-22

申请号：US11665562

申请日：2005-10-11

申请人： Krist Dellaert ,  Wilmert De Bosscher ,  Joannes De Boever ,  Gregory Lapeire

发明人： Krist Dellaert ,  Wilmert De Bosscher ,  Joannes De Boever ,  Gregory Lapeire

IPC分类号： C23C14/00 ,  C25B11/00 ,  C25B13/00

CPC分类号： C23C14/3407 ,  H01J37/3435

摘要： An end-block for use in a tubular magnetron sputtering apparatus is disclosed. Such an end-block rotatably transfers movement, coolant 5 and electrical current to the target while maintaining vacuum integrity and a closed coolant circuit. It hence comprises a drive means, a rotary electrical contact means, a bearing means, a number of rotary coolant seal means and a number of vacuum seal means. The inventive end-block occupies a minimal axial length along the target thus allowing 10 space savings in existing equipment such as e.g. display coaters. The axial length is reduced by mounting at least two of the means radial to one another.

摘要翻译： 公开了一种用于管状磁控溅射装置的端块。 这种端块可以将运动，冷却剂5和电流转移到目标物上，同时保持真空完整性和封闭的冷却剂回路。 因此，它包括驱动装置，旋转电接触装置，轴承装置，多个旋转冷却剂密封装置和多个真空密封装置。 本发明的端块沿着目标占据最小的轴向长度，从而允许现有设备中的10个空间节省，例如， 显示涂布机 通过将至少两个装置相对于彼此径向地安装来减小轴向长度。

公开(公告)号：US08043488B2

公开(公告)日：2011-10-25

申请号：US12302203

申请日：2007-05-31

申请人： Wilmert De Bosscher

发明人： Wilmert De Bosscher

IPC分类号： C23C14/34 ,  H01J37/34

CPC分类号： C23C14/3414 ,  C23C14/0036 ,  C23C14/0089 ,  C23C14/35 ,  H01J37/3429 ,  H01J37/3435 ,  H01J37/3491

摘要： The invention relates to a rotatable sputter target and to a method to manufacture such a sputter target. The sputter target comprises a target material and a magnet array located at the interior of the target material. The magnet array defines a central zone extending along the major part of the length of the target material and defines an end zone at each end of the central zone. The target material comprises a first material and a second material. The target material comprises the first material at least on the central zone and comprises the second material at least on the end zones. The second material has a lower sputter deposition rate than the first material. The second material is preferably applied by thermal spraying. The first material comprises a first element and the second material comprises a compound of the first element of the first material.

摘要翻译： 本发明涉及可旋转的溅射靶和制造这种溅射靶的方法。 溅射靶包括目标材料和位于靶材料内部的磁体阵列。 磁体阵列限定了沿着目标材料的长度的主要部分延伸的中心区域，并且在中心区域的每个端部限定了一个端部区域。 靶材料包括第一材料和第二材料。 目标材料至少在中心区域上包括第一材料，并且至少在端部区域上包括第二材料。 第二种材料具有比第一种材料更低的溅射沉积速率。 第二种材料优选通过热喷涂来施加。 第一材料包括第一元件，第二材料包括第一材料的第一元素的化合物。

公开(公告)号：US07824528B2

公开(公告)日：2010-11-02

申请号：US11665563

申请日：2005-10-11

申请人： Krist Dellaert ,  Wilmert De Bosscher ,  Joannes De Boever ,  Stijn Porteman

发明人： Krist Dellaert ,  Wilmert De Bosscher ,  Joannes De Boever ,  Stijn Porteman

IPC分类号： C25B9/00 ,  C25B13/00 ,  C25B11/00 ,  C23C14/00

CPC分类号： H01J37/3435 ,  H01J37/3405

摘要： An end-block for electrically energising a rotatable tubular target in a vacuum coating installation is disclosed. The end-block has a rotary electrical contact that reduces the joule heating effects when operating in alternating current mode. When compared to known end-blocks, this is achieved by increasing the number of contact areas between a contacting ring and a series of circumferentially mounted contacting shoes. Also the contact shoes are being pressed radially outwardly by means of resilient elements against the contacting ring.

摘要翻译： 公开了一种用于对真空涂覆装置中的可旋转管状靶进行电激励的端块。 端块具有旋转电接触，可在交流模式下工作时减少焦耳加热效应。 当与已知的端块相比时，这通过增加接触环和一系列周向安装的接触鞋之间的接触面积的数量来实现。 此外，接触鞋被抵靠接触环的弹性元件径向向外挤压。

公开(公告)号：US20090139862A1

公开(公告)日：2009-06-04

申请号：US12302203

申请日：2007-05-31

申请人： Wilmert De Bosscher

发明人： Wilmert De Bosscher

IPC分类号： C23C14/35

CPC分类号： C23C14/3414 ,  C23C14/0036 ,  C23C14/0089 ,  C23C14/35 ,  H01J37/3429 ,  H01J37/3435 ,  H01J37/3491

摘要： The invention relates to a rotatable sputter target and to a method to manufacture such a sputter target. The sputter target comprises a target material and a magnet array located at the interior of the target material. The magnet array defines a central zone extending along the major part of the length of the target material and defines an end zone at each end of the central zone. The target material comprises a first material and a second material. The target material comprises the first material at least on the central zone and comprises the second material at least on the end zones. The second material has a lower sputter deposition rate than the first material. The second material is preferably applied by thermal spraying. The first material comprises a first element and the second material comprises a compound of the first element of the first material.

摘要翻译： 本发明涉及可旋转的溅射靶和制造这种溅射靶的方法。 溅射靶包括目标材料和位于靶材料内部的磁体阵列。 磁体阵列限定了沿着目标材料的长度的主要部分延伸的中心区域，并且在中心区域的每个端部限定了一个端部区域。 靶材料包括第一材料和第二材料。 目标材料至少在中心区域上包括第一材料，并且至少在端部区域上包括第二材料。 第二种材料具有比第一种材料更低的溅射沉积速率。 第二种材料优选通过热喷涂来施加。 第一材料包括第一元件，第二材料包括第一材料的第一元素的化合物。

公开(公告)号：US20080105543A1

公开(公告)日：2008-05-08

申请号：US11665562

申请日：2005-10-11

申请人： Krist Dellaert ,  Wilmert De Bosscher ,  Joannes De Boever ,  Gregory Lapeire

发明人： Krist Dellaert ,  Wilmert De Bosscher ,  Joannes De Boever ,  Gregory Lapeire

IPC分类号： C23C14/50

CPC分类号： C23C14/3407 ,  H01J37/3435

摘要： An end-block for use in a tubular magnetron sputtering apparatus is disclosed. Such an end-block rotatably transfers movement, coolant 5 and electrical current to the target while maintaining vacuum integrity and a closed coolant circuit. It hence comprises a drive means, a rotary electrical contact means, a bearing means, a number of rotary coolant seal means and a number of vacuum seal means. The inventive end-block occupies a minimal axial length along the target thus allowing 10 space savings in existing equipment such as e.g. display coaters. The axial length is reduced by mounting at least two of the means radial to one another.

摘要翻译： 公开了一种用于管状磁控溅射装置的端块。 这种端块可以将运动，冷却剂5和电流转移到目标物上，同时保持真空完整性和封闭的冷却剂回路。 因此，它包括驱动装置，旋转电接触装置，轴承装置，多个旋转冷却剂密封装置和多个真空密封装置。 本发明的端块沿着目标占据最小的轴向长度，从而允许现有设备中的10个空间节省，例如， 显示涂布机 通过将至少两个装置相对于彼此径向地安装来减小轴向长度。

公开(公告)号：US20070007129A1

公开(公告)日：2007-01-11

申请号：US10550515

申请日：2004-02-23

申请人： Wilmert De Bosscher

发明人： Wilmert De Bosscher

IPC分类号： C23C14/00

CPC分类号： F16L37/148

摘要： A coupling system (10) to releasably affix a cylindrical target (12) to a spindie (14) comprises the following parts: a) a spindle (14) terminating in a flange portion (16); b) a cylindrical target (12) having at its end a grooved outside circumferential surface (18); c) an interface ring (20) having a circumferential inner or outer surface (22) adapted to engage respectively with the grooved outside or inside circumferential surface (22) of the cylindrical target (12); d) a clamping ring (26) adapted to engage at its one side with the flange portion (16) and to engage radially at its other side with the interface ring (20) to hold the cylindrical target (12) to the spindle (14); e) one or more sealing rings (30) between the spindle (14) and the cylindrical target (12). The interface ring (20) makes it possible to use particular types of cylindrical targets (12) with other types of spindles (14).

摘要翻译： 将圆柱形目标（12）可释放地固定到螺纹（14）的联接系统（10）包括以下部件：a）端接在凸缘部分（16）中的主轴（14）; b）圆柱形靶（12），其端部具有开槽的外圆周表面（18）; c）具有周向内表面或外表面（22）的界面环（20），其适于分别与所述圆柱形靶（12）的带槽的外侧或内周表面（22）接合; d）适于在其一侧与凸缘部分（16）接合并且在其另一侧与接口环（20）径向接合以将圆柱形目标（12）保持在主轴（14）上的夹紧环（26） ）; e）主轴（14）和圆柱形靶（12）之间的一个或多个密封环（30）。 接口环（20）使得可以将特定类型的圆柱形靶（12）与其它类型的心轴（14）一起使用。