公开(公告)号：US09497841B2

公开(公告)日：2016-11-15

申请号：US14945096

申请日：2015-11-18

Applicant: GIGAPHOTON INC.

Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/00 ,  H01S3/06 ,  H01S3/11

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0602 ,  H01S3/08054 ,  H01S3/107 ,  H01S3/1115 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/235 ,  H05G2/006

Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

Abstract translation: 远端紫外线（EUV）发生系统被配置为通过提高等离子体产生的效率来提高激光系统的能量对EUV能量的转换效率。 EUV生成系统包括被配置为将目标朝向室内的等离子体产生区域输出的目标生成单元。 激光系统被配置为产生第一预脉冲激光束，第二预脉冲激光束和主脉冲激光束，使得靶被第一预脉冲激光束照射，第二预脉冲激光 光束和主脉冲激光束。 此外，EUV生成系统包括：控制器，被配置为控制激光系统，使得第二预脉冲激光束的能量密度等于或高于1J / cm 2，并且等于或低于主脉冲的能量密度 激光束。

公开(公告)号：US09402297B2

公开(公告)日：2016-07-26

申请号：US14724737

申请日：2015-05-28

Applicant: GIGAPHOTON INC.

Inventor： Osamu Wakabayashi ,  Tatsuya Yanagida ,  Hakaru Mizoguchi

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

Abstract translation: 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。

公开(公告)号：US08742380B2

公开(公告)日：2014-06-03

申请号：US13679930

申请日：2012-11-16

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Hideo Hoshino ,  Tatsuya Yanagida

IPC: G21K5/02 ,  G21K5/04

CPC classification number: G21K5/02 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided.

Abstract translation: 提供目标供应装置，其可以包括一对导轨，其布置成彼此面对，所述导轨具有导电性质;目标传送机构，其配置成将目标材料供应到轨道之间的空间中并与导轨接触;以及 连接到轨道并被配置为通过轨道向目标材料提供电流的电源。 还提供了使用目标供应装置的方法和系统。

公开(公告)号：US08710475B2

公开(公告)日：2014-04-29

申请号：US13846852

申请日：2013-03-18

Applicant: Gigaphoton Inc.

Inventor： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

IPC: A61N5/06

CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。