Method of forming an inverted T shaped channel structure for an inverted T channel field effect transistor device
    22.
    发明授权
    Method of forming an inverted T shaped channel structure for an inverted T channel field effect transistor device 有权
    形成用于反向T沟道场效应晶体管器件的反相T形沟道结构的方法

    公开(公告)号:US08158484B2

    公开(公告)日:2012-04-17

    申请号:US12679385

    申请日:2007-10-03

    IPC分类号: H01L21/331 H01L21/8222

    摘要: A method of forming an inverted T shaped channel structure having a vertical channel portion and a horizontal channel portion for an Inverted T channel Field Effect Transistor ITFET device comprises providing a semiconductor substrate, providing a first layer of a first semiconductor material over the semiconductor substrate, and providing a second layer of a second semiconductor material over the first layer. The first and the second semiconductor materials are selected such that the first semiconductor material has a rate of removal which is less than a rate of removal of the second semiconductor material. The method further comprises removing a portion of the first layer and a portion of the second layer selectively according to the different rates of removal so as to provide a lateral layer and the vertical channel portion of the inverted T shaped channel structure and removing a portion of the lateral layer so as to provide the horizontal channel portion of the inverted T shaped channel structure.

    摘要翻译: 一种形成具有用于反向T沟道场效应晶体管ITFET器件的垂直沟道部分和水平沟道部分的反向T形沟道结构的方法包括提供半导体衬底,在半导体衬底上提供第一半导体材料的第一层, 以及在所述第一层上提供第二半导体材料层。 选择第一和第二半导体材料,使得第一半导体材料具有小于除去第二半导体材料的速率的去除速率。 该方法还包括根据不同的去除速率选择性地去除第一层的一部分和第二层的一部分,以便提供倒置的T形沟道结构的横向层和垂直沟道部分,并且去除 横向层,以提供倒置的T形通道结构的水平通道部分。

    Method of sealing an air gap in a layer of a semiconductor structure and semiconductor structure
    23.
    发明授权
    Method of sealing an air gap in a layer of a semiconductor structure and semiconductor structure 有权
    密封半导体结构和半导体结构层中的气隙的方法

    公开(公告)号:US08071459B2

    公开(公告)日:2011-12-06

    申请号:US12936113

    申请日:2008-04-17

    IPC分类号: H01L21/00

    摘要: A method of sealing an air gap in a layer of a semiconductor structure comprises providing a first layer of the semiconductor structure having at least one air gap for providing isolation between at least two conductive lines formed in the first layer. The at least one air gap extends into the first layer from a first surface of the first layer. The method further comprises forming a barrier layer of a barrier dielectric material over the first surface of the first layer and the at least one air gap. The barrier dielectric material is selected to have a dielectric constant less than 3.5 and to provide a barrier to prevent chemicals entering the at least one air gap. In another embodiment, the at least one air gap extends from a first surface of the first layer to at least a portion of side surfaces of the at least two conductive lines to expose at least a portion of the side surfaces, and a barrier layer of a barrier dielectric material is formed over the exposed portions of the side surfaces of each of the at least two conductive lines.

    摘要翻译: 密封半导体结构层中的气隙的方法包括提供具有至少一个气隙的半导体结构的第一层,用于在形成在第一层中的至少两个导电线之间提供隔离。 所述至少一个气隙从所述第一层的第一表面延伸到所述第一层中。 该方法还包括在第一层的第一表面和至少一个气隙上形成阻挡介电材料的阻挡层。 阻挡介电材料被选择为具有小于3.5的介电常数并且提供屏障以防止化学品进入至少一个气隙。 在另一个实施例中,至少一个空气间隙从第一层的第一表面延伸到至少两个导电线的侧表面的至少一部分以暴露至少一部分侧表面,并且阻挡层 在所述至少两根导电线中的每一个的侧表面的暴露部分上形成阻挡介电材料。

    METHOD OF FORMING AN INVERTED T SHAPED CHANNEL STRUCTURE FOR AN INVERTED T CHANNEL FIELD EFFECT TRANSISTOR DEVICE
    25.
    发明申请
    METHOD OF FORMING AN INVERTED T SHAPED CHANNEL STRUCTURE FOR AN INVERTED T CHANNEL FIELD EFFECT TRANSISTOR DEVICE 有权
    形成用于反相T通道场效应晶体管器件的反相T形通道结构的方法

    公开(公告)号:US20100311213A1

    公开(公告)日:2010-12-09

    申请号:US12679385

    申请日:2007-10-03

    IPC分类号: H01L21/336 H01L21/302

    摘要: A method of forming an inverted T shaped channel structure having a vertical channel portion and a horizontal channel portion for an Inverted T channel Field Effect Transistor ITFET device comprises providing a semiconductor substrate, providing a first layer of a first semiconductor material over the semiconductor substrate and providing a second layer of a second semiconductor material over the first layer. The first and the second semiconductor materials are selected such that the first semiconductor material has a rate of removal which is less than a rate of removal of the second semiconductor material. The method further comprises removing a portion of the first layer and a portion of the second layer selectively according to the different rates of removal so as to provide a lateral layer and the vertical channel portion of the inverted T shaped channel structure and removing a portion of the lateral layer so as to provide the horizontal channel portion of the inverted T shaped channel structure.

    摘要翻译: 形成具有用于反向T沟道场效应晶体管ITFET器件的垂直沟道部分和水平沟道部分的反向T形沟道结构的方法包括提供半导体衬底,在半导体衬底上提供第一半导体材料层, 在所述第一层上提供第二半导体材料层。 选择第一和第二半导体材料,使得第一半导体材料具有小于除去第二半导体材料的速率的去除速率。 该方法还包括根据不同的去除速率选择性地去除第一层的一部分和第二层的一部分,以便提供倒置的T形沟道结构的横向层和垂直沟道部分,并且去除 横向层,以提供倒置的T形通道结构的水平通道部分。

    Antenna assembly comprising a surface dipole

    公开(公告)号:US20060164316A1

    公开(公告)日:2006-07-27

    申请号:US10528105

    申请日:2003-09-11

    IPC分类号: H01Q9/28

    CPC分类号: H01Q9/285 H01Q23/00

    摘要: An improved antenna assembly, wherein: the opposing end regions of the dipole halves are each electrically connected to a respective connection line; the connection lines lead to two amplifiers; the outputs of both amplifiers are connected to the two inputs of a transform, whose output is at least indirectly electrically connected to a connector, a coaxial connector; one or more filters are provided; the filters are positioned between the connection lines and the connector terminal; the filter or filters is/are designed to suppress mobile radio frequency ranges and/or to protect broadcasting signals.

    Device and method for selecting a gutter of a transmission
    27.
    发明授权
    Device and method for selecting a gutter of a transmission 失效
    用于选择传输天线的设备和方法

    公开(公告)号:US06615682B2

    公开(公告)日:2003-09-09

    申请号:US10093356

    申请日:2002-03-07

    IPC分类号: F16H5900

    摘要: An actuator for gutter selection in a gear positioning device for an automatic manual transmission has a selector shaft with a selector finger. A gutter selection device is movable back and forth along an axis into a first position and a second position. The selector finger of the selector shaft can move into engagement and out of engagement with the gutter selection device. A single valve device is provided for determining the first and second positions of the gutter selection device.

    摘要翻译: 用于自动手动变速器的齿轮定位装置中用于沟槽选择的致动器具有带选择指的选择轴。 沟槽选择装置可沿轴线前后移动到第一位置和第二位置。 选择器轴的选择手指可以移动到与沟槽选择装置接合并脱离接合。 提供单个阀装置用于确定沟槽选择装置的第一和第二位置。

    Intermediate product for a multichannel FET and process for obtaining an intermediate product
    30.
    发明授权
    Intermediate product for a multichannel FET and process for obtaining an intermediate product 有权
    用于多通道FET的中间产物和用于获得中间产物的方法

    公开(公告)号:US08293608B2

    公开(公告)日:2012-10-23

    申请号:US12865517

    申请日:2008-02-08

    IPC分类号: H01L21/20

    摘要: An intermediate product in the manufacture of a vertical multiple-channel FET device containing alternating —Si—[(SiGe)—Si]u- stacked layers is shown, as well as a process for selectively etching the SiGe layers in such a stacked layer system, and products obtained from such selective etching. Differential Ge content is added to the successive layers to provide uniform removal of the sacrificial SiGe layers.

    摘要翻译: 示出了制造包含交替的-Si - [(SiGe)-Si]层叠层的垂直多通道FET器件的中间产品,以及用于在这种堆叠层系统中选择性蚀刻SiGe层的工艺 ,以及从这种选择性蚀刻获得的产品。 将差分Ge含量添加到连续层中以提供牺牲SiGe层的均匀去除。