摘要:
A method is provided for manufacturing a synthetic silica glass. The method includes the steps of maintaining a silica glass member, which is formed using a flame hydrolysis method and having an OH group concentration of about 500 ppm to about 1300 ppm, at a predetermined holding temperature for a predetermined period of time so as to substantially relax the structure of the silica glass member. The method further includes the step of subsequently cooling the silica glass member to a first predetermined temperature at a cooling rate of about 10 K/hour or less, and thereafter, cooling the silica glass member to a second predetermined temperature at a cooling rate of about 1 K/hour or less. The method further includes the step of further cooling the silica glass member to a third predetermined temperature at a cooling rate of about 10 K/hour or less.
摘要翻译:提供了一种制造合成石英玻璃的方法。 该方法包括以下步骤:在预定的保持温度下,使用火焰水解法形成并具有约500ppm至约1300ppm的OH基浓度的二氧化硅玻璃构件, 放松石英玻璃构件的结构。 该方法还包括以约10K /小时以下的冷却速度随后将石英玻璃构件冷却至第一预定温度的步骤,然后以大约的冷却速度将石英玻璃构件冷却至第二预定温度 1 K /小时以下。 该方法还包括以约10K /小时或更低的冷却速度将石英玻璃构件进一步冷却至第三预定温度的步骤。
摘要:
A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degassed, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
摘要:
A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.
摘要翻译:提供了一种制造基本上不含氯的石英玻璃的方法。 该方法包括从由石英玻璃制成的燃烧器分别排出四氟化硅气体,燃烧气体和可燃气体的步骤,四氟化硅气体的流速在约9slm / cm 2至约20的范围内 slm / cm2。 该方法还包括以下步骤:通过使四氟化硅气体与通过燃烧气体与可燃气体的反应产生的水反应生成微小的二氧化硅玻璃颗粒,将微小二氧化硅玻璃颗粒沉积在靶材上,并通过熔融制备石英玻璃 并使沉积在靶上的微小二氧化硅玻璃颗粒玻璃化。
摘要:
A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.
摘要翻译:提供了一种制造基本上不含氯的石英玻璃的方法。 该方法包括从由石英玻璃制成的燃烧器分别排出四氟化硅气体,燃烧气体和可燃气体的步骤,四氟化硅气体的流速在约9slm / cm 2至约20的范围内 slm / cm2。 该方法还包括以下步骤:通过使四氟化硅气体与通过燃烧气体与可燃气体的反应产生的水反应生成微小的二氧化硅玻璃颗粒,将微小二氧化硅玻璃颗粒沉积在靶材上,并通过熔融制备石英玻璃 并使沉积在靶上的微小二氧化硅玻璃颗粒玻璃化。
摘要:
An optical member is provided for use in an image-focusing optical system for guiding light having a wavelength shorter than about 300 nm. The optical member includes a calcium fluoride crystal having a sodium concentration of less than about 0.2 ppm.
摘要:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
摘要:
In the measurement of internal transmittance of optical pieces, a standard is set for the piece for measuring the transmittance and a method of making the piece is provided. In the piece for measuring the Transmittance of optical materials having two opposing polished surfaces, their surface roughness rms is set to 10 .ANG. or less, thereby making it possible to accurately measure the internal transmittance in the short wavelength region of 300 nm or less where the intensity of the light source of spectrophotometer begins to decrease.
摘要:
In the measurement of internal transmittance of optical pieces, a standard is set for the piece for measuring the transmittance and a method of making the piece is provided. In the piece for measuring the transmittance of optical materials having two opposing polished surfaces, their surface roughness rms is set to 10 .ANG. or less, thereby making it possible to accurately measure the internal transmittance in the short wavelength region of 300 nm or less where the intensity of the light source of spectrophotometer begins to decrease.
摘要:
A sync clock signal for information reproduction is generated using a binary signal obtained from a recording medium as a reference signal. The phase of the binary signal is compared with that of the sync clock signal. A frequency is changed based on the comparison result to generate (2m+1) multi-phase clock signals mutually shifted in phase by an integral multiple of 2&pgr;/(2m+1). Any one of these clock signals is used as the sync clock signal for information reproduction. The binary signal is delayed by a controllable delay time to generate a binary delayed signal, the phase of which is compared with those of the clock signals. The delay time of the binary delayed signal is controlled based on the comparison result so that the level change timing of the binary delayed signal is moved on a time base away from that of the sync clock signal.
摘要:
An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm.