ARRAY SUBSTRATE AND DISPLAY APPARATUS HAVING THE SAME
    21.
    发明申请
    ARRAY SUBSTRATE AND DISPLAY APPARATUS HAVING THE SAME 有权
    阵列基板和显示装置

    公开(公告)号:US20100208184A1

    公开(公告)日:2010-08-19

    申请号:US12611054

    申请日:2009-11-02

    IPC分类号: G02F1/1343

    摘要: An array substrate includes first and second pixel electrodes. The first pixel electrode includes a plurality of first slit electrode portions and a first supporting electrode portion connected with the first slit electrode portions. The first slit electrode portions extend in a zigzag fashion along the shape of a unit pixel area and a first direction. The second pixel electrode includes a plurality of second slit electrode portions and a second supporting electrode portion connected with the second slit electrode portion. The second slit electrode portions extend in the zigzag fashion along the shape of the unit pixel area and the first direction. Side visibility and a response time may be improved, so that display quality may be improved.

    摘要翻译: 阵列基板包括第一和第二像素电极。 第一像素电极包括多个第一狭缝电极部分和与第一狭缝电极部分连接的第一支撑电极部分。 第一狭缝电极部分沿着单位像素区域和第一方向的形状以锯齿形的方式延伸。 第二像素电极包括多个第二狭缝电极部分和与第二狭缝电极部分连接的第二支撑电极部分。 第二狭缝电极部分以Z字形的方式沿着单位像素区域和第一方向的形状延伸。 侧面可见度和响应时间可以改善,从而可以提高显示质量。

    LIQUID CRYSTAL DISPLAY DEVICE HAVING IMPROVED ALIGNMENT OF LIQUID CRYSTALS
    22.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE HAVING IMPROVED ALIGNMENT OF LIQUID CRYSTALS 审中-公开
    液晶显示装置具有改进的液晶对准

    公开(公告)号:US20100149475A1

    公开(公告)日:2010-06-17

    申请号:US12484724

    申请日:2009-06-15

    IPC分类号: G02F1/1337 G02F1/13

    摘要: A liquid crystal display device provides for improved alignment of its liquid crystal molecules by having an alignment layer with polymer branches that are cured so as to reinforce a predefined orientation of the liquid crystal molecules even when no voltages are applied to the pixel-electrodes and/or common electrode of the device. Bruising of the screen can thus be rapidly repaired. In one embodiment, the device includes: first and second substrates opposed to each other; a liquid crystal layer including liquid crystal molecules interposed between the substrates; a gate line formed on the first substrate; first and second data lines formed on the first substrate and connected for transmitting first and second data voltages having different polarities; a first and second switching elements respectively connected to the gate line and the first or second data line; first and second pixel electrodes that are connected to the first and second switching elements, respectively; an alignment layer formed on the first and second pixel electrodes; and a polymer layer including a plurality of cured prepolymers that are cured so as to prearrange the liquid crystal molecules in a desired orientation.

    摘要翻译: 液晶显示装置通过具有固化的聚合物分支的取向层来改善其液晶分子的取向,从而即使当没有电压施加到像素电极和/ 或器件的公共电极。 因此可以快速修复屏幕的瘀伤。 在一个实施例中,该装置包括:彼此相对的第一和第二基板; 包括介于基板之间的液晶分子的液晶层; 形成在第一基板上的栅极线; 第一和第二数据线形成在第一基板上并被连接用于发射具有不同极性的第一和第二数据电压; 第一和第二开关元件,分别连接到栅极线和第一或第二数据线; 分别连接到第一和第二开关元件的第一和第二像素电极; 形成在所述第一和第二像素电极上的取向层; 以及聚合物层,其包含多个固化的预聚物,其被固化以使所述液晶分子以期望的取向预选择。

    Method for atomic layer deposition (ALD) of silicon oxide film
    23.
    发明申请
    Method for atomic layer deposition (ALD) of silicon oxide film 审中-公开
    氧化硅膜的原子层沉积(ALD)方法

    公开(公告)号:US20060090694A1

    公开(公告)日:2006-05-04

    申请号:US11305686

    申请日:2005-12-16

    摘要: The present invention relates to a method for forming silicon oxide films on substrates using an atomic layer deposition process. Specifically, the silicon oxide films are formed at low temperature and high deposition rate via the atomic layer deposition process using a Si2Cl6 source unlike a conventional atomic layer deposition process using a SiCl4 source. The atomic layer deposition apparatus used in the above process can be in-situ cleaned effectively at low temperature using a HF gas or a mixture gas of HF gas and gas containing —OH group.

    摘要翻译: 本发明涉及使用原子层沉积工艺在衬底上形成氧化硅膜的方法。 具体地,通过使用Si 2 C 6 C 6源的原子层沉积工艺,在低温和高沉积速率下形成氧化硅膜,这与使用 SiCl 4 SO 4源。 在上述方法中使用的原子层沉积装置可以使用HF气体或HF气体和含有-OH基团的气体的混合气体在低温下有效地进行现场清洗。

    Frequency estimation method of MB-OFDM UWB system using time frequency hopping strategy
    24.
    发明申请
    Frequency estimation method of MB-OFDM UWB system using time frequency hopping strategy 失效
    使用时频跳频策略的MB-OFDM UWB系统的频率估计方法

    公开(公告)号:US20060083290A1

    公开(公告)日:2006-04-20

    申请号:US11023382

    申请日:2004-12-29

    IPC分类号: H04B1/69 H04K1/10

    摘要: There is provided a frequency estimation method of multiband (MB)-orthogonal frequency division multiplexing (OFDM) ultra wide band (UWB) system using an Alt-PHY time frequency (TF) hopping strategy based on IEEE 802. 15. 3a. The frequency estimation method includes the steps of: a) selecting a predetermined number of frequencies among a plurality of center frequencies based on a predetermined number of OFDM symbols and estimating relative frequency offsets for selected frequencies; b) obtaining an average relative frequency offset by averaging the estimated relative frequency offsets when two or more frequencies are selected at the step a); and c) obtaining real frequency offsets for each of the center frequencies by transforming the obtained average relative frequency offset to the real frequency offsets and compensating a frequency offset caused by a transmitting/receiving local oscillators based on the obtained real frequency offsets.

    摘要翻译: 提供了使用基于IEEE802.15的Alt-PHY时间频率(TF)跳频策略的多频带(MB) - 正交频分复用(OFDM)超宽带(UWB)系统的频率估计方法。 频率估计方法包括以下步骤:a)基于预定数量的OFDM符号来选择多个中心频率中的预定数量的频率,并估计所选频率的相对频率偏移; b)当在步骤a)选择两个或更多个频率时,通过平均所估计的相对频率偏移来获得平均相对频率偏移; 以及c)通过将所获得的平均相对频率偏移变换为实际偏移量来获得每个中心频率的实际频率偏移,并且基于所获得的实频偏移来补偿由发送/接收本地振荡器引起的频率偏移。

    Method for manufacturing semiconductor device
    25.
    发明申请
    Method for manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US20060177579A1

    公开(公告)日:2006-08-10

    申请号:US11376402

    申请日:2006-03-15

    IPC分类号: C23C16/00 H05H1/24

    摘要: Disclosed are PEALD (plasma-enhanced atomic layer deposition) apparatus and PEALD method for manufacturing a semiconductor device, the PEALD apparatus comprising: a housing including a reaction chamber in which a deposition reaction is performed; a rotary disk unit installed in the housing and provided with a plurality of susceptors for receiving wafers thereon so as to move the wafers; a gas spray unit mounted on the upper end of the housing above the rotary disk unit, and provided with first reactive gas sprayers, second reactive gas sprayers and inert gas sprayers on a lower surface of a circular disk for spraying respective gases into the housing; a gas feed unit connected to the gas spray unit for supplying first and second reactive gases and a purge gas into the housing; a gas exhaust port formed around the rotary disk unit; and a plasma generator for generating plasma to excite the second reactive gas.

    摘要翻译: 公开了用于制造半导体器件的PEALD(等离子体增强原子层沉积)装置和PEALD方法,该PEALD装置包括:壳体,包括执行沉积反应的反应室; 旋转盘单元,其安装在壳体中并且设置有用于在其上接收晶片以便移动晶片的多个基座; 安装在旋转盘单元上方的壳体上端的气体喷射单元,并且在圆盘的下表面上设置有第一反应气体喷雾器,第二反应气体喷雾器和惰性气体喷雾器,用于将各种气体喷射到壳体中; 连接到气体喷射单元的气体供给单元,用于将第一和第二反应气体和净化气体供应到壳体中; 形成在旋转盘单元周围的排气口; 以及用于产生等离子体以激发第二反应气体的等离子体发生器。