公开(公告)号：US20230253181A1

公开(公告)日：2023-08-10

申请号：US18107042

申请日：2023-02-08

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/28 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J2237/1534 ,  H01J2237/1532

Abstract: An aberration corrector includes a first multipole element for producing a hexapole field, a second multipole element for producing a hexapole field, and a transfer lens system disposed between the first and second multipole elements. The first and second multipole elements are arranged along an optical axis. At least one of the hexapole fields respectively produced by the first multipole element and the second multipole element varies in strength along the optical axis.

公开(公告)号：US20230026970A1

公开(公告)日：2023-01-26

申请号：US17869117

申请日：2022-07-20

Applicant: JEOL Ltd.

Inventor： Keito Aibara ,  Tomohiro Nakamichi ,  Shigeyuki Morishita ,  Motofumi Saito ,  Ryusuke Sagawa ,  Fuminori Uematsu

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.

公开(公告)号：US20200266025A1

公开(公告)日：2020-08-20

申请号：US16776153

申请日：2020-01-29

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita ,  Izuru Chiyo

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/22

Abstract: In a scanning transmission electron microscope, a control unit performs: processing of calculating a first auto-correlation function that is an auto-correlation function of a first scanning transmission electron microscope image; processing of acquiring a first intensity profile along a straight line that passes through a center of the first auto-correlation function; processing of obtaining a position of an inflection point that is closest to the center of the first auto-correlation function in the first intensity profile and adopting an intensity at the position as a first reference intensity; processing of obtaining an aberration coefficient by fitting a first aberration function to an isointensity line that connects positions where intensity is equal to the first reference intensity in the first auto-correlation function and by fitting a second aberration function to an isointensity line that connects positions where intensity is equal to a second reference intensity in a second auto-correlation function; and processing of controlling an electron optical system based on the aberration coefficient.

公开(公告)号：US10720302B2

公开(公告)日：2020-07-21

申请号：US16289872

申请日：2019-03-01

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita ,  Takeo Sasaki ,  Tomohiro Nakamichi

IPC: H01J37/26 ,  H01J37/153 ,  H01J37/22

Abstract: An electron microscope includes: an optical system including an aberration correction device; and a control unit that controls the aberration correction device, wherein the control unit performs: processing for displaying, on a display unit, an image for designating a direction of aberration in superposition on an aberration pattern representing a state of aberration, processing for specifying the direction of aberration from the image that has been subjected to a rotation operation, and processing for controlling the aberration correction device to cause the aberration correction device to introduce an aberration in the specified direction.

公开(公告)号：US10332719B2

公开(公告)日：2019-06-25

申请号：US14743086

申请日：2015-06-18

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/22 ,  H01J37/28

Abstract: A device which computes an angular range of illumination of an electron beam in which aberrations in an optical system can be measured efficiently by a tableau method. The device (100) includes an aberration coefficient information acquisition portion (112) for obtaining information about aberration coefficients of the optical system, a phase distribution computing portion (114) for finding a distribution of phases in the electron beam passed through the optical system on the basis of the information about the aberration coefficients, and an angular range computing portion (116) for finding the angular range of illumination on the basis of the distribution of phases found by the phase distribution computing portion (114).

公开(公告)号：US20180366295A1

公开(公告)日：2018-12-20

申请号：US16012057

申请日：2018-06-19

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/14 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/14 ,  H01J37/226 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/153 ,  H01J2237/1534 ,  H01J2237/24585 ,  H01J2237/2802

Abstract: There is provided a method which is for use in a charged particle beam system including an illumination system equipped with an aberration corrector having a plurality of stages of multipole elements and a transfer lens system disposed between the multipole elements, the method being capable of correcting distortion in a shadow of an aperture of the illumination system. The method involves varying excitations of the transfer lens system to correct distortion in the shadow of the aperture of the illumination system.

公开(公告)号：US10014152B2

公开(公告)日：2018-07-03

申请号：US15386740

申请日：2016-12-21

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/00 ,  H01J37/141 ,  H01J37/12 ,  H01J37/145

CPC classification number: H01J37/141 ,  H01J37/12 ,  H01J37/145 ,  H01J37/1471 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/2802

Abstract: There are disclosed an aberration correction method and a charged particle beam system capable of correcting off-axis first order aberrations. The aberration correction method is for use in the charged particle beam system (100) equipped with an aberration corrector (30) which has plural stages of multipole elements (32a, 32b) and a transfer lens system (34) disposed between the multipole elements (32a, 32b). The method includes varying the excitation of the transfer lens system (34) and correcting off-axis first order aberrations.