-
公开(公告)号：US07525642B2
公开(公告)日：2009-04-28
申请号：US11359765
申请日：2006-02-23
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.
摘要翻译： 光刻投影系统具有具有偏振构件的照明系统。 多个引导元件将入射光束的不同子束反射到可调节的，可独立控制的方向。 通过重新引导光学元件，可以在其横截面中产生光束的所需偏振空间强度分布。
-
公开(公告)号：US07525641B2
公开(公告)日：2009-04-28
申请号：US11295517
申请日：2005-12-07
申请人： Richard C. Zimmerman , Eric B. Catey , David A. Hult , Alexander C. Kremer , Heine Melle Mulder , Hendrikus Robertus Marie Van Greevenbroek , Roberto B. Wiener
发明人： Richard C. Zimmerman , Eric B. Catey , David A. Hult , Alexander C. Kremer , Heine Melle Mulder , Hendrikus Robertus Marie Van Greevenbroek , Roberto B. Wiener
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.
摘要翻译： 提供了一种用于均匀性校正的系统和方法。 该系统包括以限定的构造插入到照明场中的多个翼状校正元件。 相邻的有翼校正元件被重叠以最小化诱导的均匀性纹波。 每个翼状校正元件在校正元件的纵向边缘上具有第一突出部，并且在相对的纵向边缘上具有第二突起。 第一突起的倾斜边缘的斜率和第二突起的倾斜边缘的斜率与照明场的不均匀轮廓中的梯度的斜率相关联。 此外，由校正元件的平坦尖端和第一和第二突起的倾斜边缘限定的角度与照明场的梯度的角度相关联。
-
公开(公告)号：US20090033902A1
公开(公告)日：2009-02-05
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。
-
公开(公告)号：US09250536B2
公开(公告)日：2016-02-02
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
-
公开(公告)号：US07872731B2
公开(公告)日：2011-01-18
申请号：US11785906
申请日：2007-04-20
申请人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Heine Melle Mulder , Erik Martijn Greijdanus
发明人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Heine Melle Mulder , Erik Martijn Greijdanus
IPC分类号： G03B27/42
CPC分类号： G03F7/70108 , G03F7/70566
摘要： A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the first direction and an optical propagation length adaptor associated with the wedge-shaped optically active members to adjust the predetermined angle.
摘要翻译： 光刻设备包括偏振改变元件，该偏振改变元件包括至少两个楔形光学有源元件，所述至少两个楔形光学有源元件被配置为相对于第一方向以预定角度旋转辐射束的至少一部分的偏振方向，并且光学传播长度适配器相关联 与楔形光学活动构件一起调节预定角度。
-
公开(公告)号：US20100020300A1
公开(公告)日：2010-01-28
申请号：US12506481
申请日：2009-07-21
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70075 , G03F7/70091 , G03F7/7085
摘要： According to an aspect of the present invention, a method of controlling a measurement apparatus for determining a property of an individually controllable element of an array of individually controllable elements, the array of individually controllable elements being capable of controlling a distribution of a beam of radiation, is disclosed. The method includes, for a sequence of a plurality of individually controllable elements: directing a measurement beam of radiation at an individually controllable element of the plurality of individually controllable elements; and detecting the measurement beam once it has been re-directed by the individually controllable element, wherein the sequence in which the method is undertaken for the plurality of individually controllable elements is related to the orientation of the plurality of individually controllable elements when the plurality of individually controllable elements are oriented to control a distribution of a beam of radiation.
摘要翻译： 根据本发明的一个方面，一种控制测量装置的方法，所述测量装置用于确定独立可控元件阵列的独立可控元件的特性，所述独立可控元件的阵列能够控制辐射束的分布 ，被披露。 该方法包括：对于多个独立可控元件的序列：将测量光束射向多个独立可控元件的独立可控元件; 并且一旦所述测量光束被所述可独立控制的元件重新引导，就检测所述测量光束，其中，所述多个独立可控元件进行所述方法的顺序与所述多个独立可控元件的取向相关， 独立可控元件被定向成控制辐射束的分布。
-
公开(公告)号：US20080259300A1
公开(公告)日：2008-10-23
申请号：US11785906
申请日：2007-04-20
申请人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Heine Melle Mulder , Erik Martijn Greijdanus
发明人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Heine Melle Mulder , Erik Martijn Greijdanus
IPC分类号： G03B27/42
CPC分类号： G03F7/70108 , G03F7/70566
摘要： A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the first direction and an optical propagation length adaptor associated with the wedge-shaped optically active members to adjust the predetermined angle.
摘要翻译： 光刻设备包括偏振改变元件，该偏振改变元件包括至少两个楔形光学有源元件，所述至少两个楔形光学有源元件被配置为相对于第一方向以预定角度旋转辐射束的至少一部分的偏振方向，并且光学传播长度适配器相关联 与楔形光学活动构件一起调节预定角度。
-
公开(公告)号：US20080186468A1
公开(公告)日：2008-08-07
申请号：US12000092
申请日：2007-12-07
IPC分类号： G03B27/54
CPC分类号： H01L21/0274 , G03F7/70091 , G03F7/705
摘要： A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.
摘要翻译： 提出了一种用于配置光刻设备的照明源的方法。 该方法包括将照明源分为像素组，每个像素组包括一个或多个照明源点; 选择照射形状以露出图案，所述照明形状由至少一个像素组形成; 作为照明源中的像素组的状态变化的结果，创建修改的照明形状的像素组的状态的变化，迭代地计算光刻度量; 并根据迭代计算结果调整照明形状。
-
公开(公告)号：US07397535B2
公开(公告)日：2008-07-08
申请号：US11312649
申请日：2005-12-21
申请人： Heine Melle Mulder
发明人： Heine Melle Mulder
CPC分类号： G03F7/70141 , G03F7/70091
摘要： Lithographic apparatus includes an illumination system for conditioning a radiation beam, a support for supporting a patterning device for imparting a cross-sectional pattern to the radiation beam to form a patterned radiation beam, and a substrate table for holding a substrate. A projection system is provided for projecting the patterned radiation beam onto a target portion of the substrate. Conditioning optics and an adjustable aperture are provided to condition the radiation beam from the illumination system, and a detector is provided to detect the size and divergence of the radiation beam propagated through the aperture and to provide a feedback signal in dependence thereon. An actuator serves to effect adjustment of at least one of the optics and the aperture to vary at least one optical characteristic of the radiation beam, and a control device is provided to control the actuator in response to the feedback signal from the detector.
摘要翻译： 平版印刷设备包括用于调节辐射束的照明系统，用于支撑用于赋予辐射束以形成图案化辐射束的横截面图案的图案形成装置的支撑件以及用于保持衬底的衬底台。 提供了一种投影系统，用于将图案化的辐射束投影到基板的目标部分上。 提供调理光学元件和可调节孔径以调节来自照明系统的辐射束，并且提供检测器以检测通过孔传播的辐射束的尺寸和发散度，并根据其提供反馈信号。 致动器用于实现至少一个光学元件和孔径的调节以改变辐射束的至少一个光学特性，并且提供控制装置以响应于来自检测器的反馈信号来控制致动器。
-
公开(公告)号：US20070285638A1
公开(公告)日：2007-12-13
申请号：US11448152
申请日：2006-06-07
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70116 , G03F7/70291 , G03F7/70858
摘要： A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.
摘要翻译： 镜阵列装置包括被配置为支撑多个可单独调节的反射元件的载体。 至少一个致动器与每个反射元件相关联，致动器被配置成调节相关联的反射元件的取向或位置。 该装置还包括与至少一部分反射元件接触的液体。
-
-
-
-
-
-
-
-
-
搜索结果
42 条记录 (耗时 0.039 秒)
