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公开(公告)号：US20090033902A1
公开(公告)日：2009-02-05
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。
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公开(公告)号：US09250536B2
公开(公告)日：2016-02-02
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US08937706B2
公开(公告)日：2015-01-20
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。
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公开(公告)号：US20080239268A1
公开(公告)日：2008-10-02
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。
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公开(公告)号：US20090190197A1
公开(公告)日：2009-07-30
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译： 一种控制单独可控元件阵列的元件的方法。 该方法包括改变驱动元件的驱动电压的频率。
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公开(公告)号：US08089672B2
公开(公告)日：2012-01-03
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译： 一种控制单独可控元件阵列的元件的方法。 该方法包括改变驱动元件的驱动电压的频率。
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公开(公告)号：US08885144B2
公开(公告)日：2014-11-11
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译： 公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。 照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力 一个或多个元素。
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公开(公告)号：US08610878B2
公开(公告)日：2013-12-17
申请号：US12966448
申请日：2010-12-13
申请人： Johannes Jacobus Matheus Baselmans , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
发明人： Johannes Jacobus Matheus Baselmans , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
CPC分类号： G03B27/54 , G03F7/70066 , G03F7/70208
摘要： A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
摘要翻译： 光刻设备包括被配置为提供第一辐射束的照明系统，其形成第一掩模照射区域，并且被配置为基本上同时提供第二辐射束，其形成第二掩模照射区域。 第一和第二照明区域被配置为基本上同时照射相同的掩模。 光刻设备还包括投影系统，该投影系统配置成投射第一辐射束，使得其形成第一基板照明区域并且被配置为同时投射第二辐射束，使得其形成第二基板照明区域。
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公开(公告)号：US07224440B2
公开(公告)日：2007-05-29
申请号：US11019525
申请日：2004-12-23
申请人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
发明人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
IPC分类号： G03B27/52
CPC分类号： G03F7/70108 , G03F7/70275
摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。 光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。 为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。
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10.发明授权Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product 有权光刻设备，设备制造方法，由此制造的设备，控制系统，计算机程序和计算机程序产品公开(公告)号：US06737662B2
公开(公告)日：2004-05-18
申请号：US10157033
申请日：2002-05-30
申请人： Heine Melle Mulder , Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Dierichs
发明人： Heine Melle Mulder , Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Dierichs
IPC分类号： G01N2186
CPC分类号： G03F7/70116 , G03F7/70075 , G03F7/70141 , G03F7/702
摘要： A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
摘要翻译： 光刻投影系统具有照明系统。 多个引导元件将入射投影光束的不同子光束反射到可调节的，可独立控制的方向。 通过使用重新引导光学元件，可以在其横截面中产生投影光束的所需空间强度分布。
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