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    Pulse modifier with adjustable etendue
    7.
    发明授权
    Pulse modifier with adjustable etendue 有权
    脉冲调节剂，具有可调节的光密度

    公开(公告)号：US08625199B2

    公开(公告)日：2014-01-07

    申请号：US13173905

    申请日：2011-06-30

    申请人： Adel Joobeur ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

    发明人： Adel Joobeur ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

    IPC分类号： G02B27/14

    CPC分类号： G03F7/70583 ,  G02B27/144 ,  G02B27/145 ,  H01S3/0057

    摘要： A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

    摘要翻译： 光束修改单元增加照明光束的时间脉冲长度和延迟。 脉冲修改单元接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。 分束器将输入脉冲分成第一和第二脉冲部分，并且沿着第二光路引导第一脉冲部分，并且沿着作为输出光束的一部分的第一光路引导第二部分。 第二光路包括发散光学元件。 具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，并且接收第二脉冲部分以重定向第二部分，使得通过脉冲修正器的第二部分的光路是 比第一部分长，分离度小于曲率半径。

    Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process
    9.
    发明授权
    Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process 有权
    光栅组件，光刻设备，光刻工艺中的用途以及在光刻工艺的单次扫描运动中投影两个或多个图像场的方法

    公开(公告)号：US09140999B2

    公开(公告)日：2015-09-22

    申请号：US13679662

    申请日：2012-11-16

    申请人： Paul Van Der Veen

    发明人： Paul Van Der Veen

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/62 ,  G03F7/20 ,  H01L21/68

    CPC分类号： G03F7/70633 ,  G03F7/70425 ,  G03F7/70716 ,  H01L21/682

    摘要： A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions.

    摘要翻译： 一种用于光刻工艺的掩模版组件，其中第一图像场和第二图像场投影到基板上的第一目标部分和第二目标部分上，所述标线组件被布置成保持具有第一图像的第一掩模版 场和第二掩模版具有第二图像场，使得第一和第二图像场之间的距离基本上对应于第一和第二目标部分之间的距离。 实施例还涉及包括光罩组件的光刻设备，在光刻工艺中使用其中第一图像场和第二图像场投射到基板上的第一目标部分和第二部分上，第一掩模版具有 第一图像场和第二掩模版具有第二图像场，其中第一和第二图像场之间的距离基本上对应于第一和第二目标部分之间的距离。

    Pulse Modifier with Adjustable Etendue
    10.
    发明申请
    Pulse Modifier with Adjustable Etendue 有权
    脉冲调制器，具有可调电流

    公开(公告)号：US20110255173A1

    公开(公告)日：2011-10-20

    申请号：US13173905

    申请日：2011-06-30

    申请人： Adel JOOBEUR ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

    发明人： Adel JOOBEUR ,  Oscar Franciscus Jozephus Noordman ,  Paul Van Der Veen ,  Arun Mahadevan Venkataraman

    IPC分类号： G02B27/14

    CPC分类号： G03F7/70583 ,  G02B27/144 ,  G02B27/145 ,  H01S3/0057

    摘要： A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

    摘要翻译： 光束修改单元增加照明光束的时间脉冲长度和延迟。 脉冲修改单元接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。 分束器将输入脉冲分成第一和第二脉冲部分，并且沿着第二光路引导第一脉冲部分，并且沿着作为输出光束的一部分的第一光路引导第二部分。 第二光路包括发散光学元件。 具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，并且接收第二脉冲部分以重定向第二部分，使得通过脉冲修正器的第二部分的光路是 比第一部分长，分离度小于曲率半径。