公开(公告)号：US09400246B2

公开(公告)日：2016-07-26

申请号：US13648768

申请日：2012-10-10

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Lawrence D. Rotter ,  David Y. Wang ,  Andrei Veldman ,  Kevin Peterlinz ,  Gregory Brady ,  Derrick Shaughnessy

IPC: G01J4/00 ,  G01N21/55 ,  G01B11/06 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/211 ,  G01B11/0616 ,  G01N21/4738 ,  G01N21/55 ,  G01N2021/213 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633

Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源，被配置为检测从样品的表面发出的照明的检测器，被配置为将来自可调节照明源的照明引导到 样品的表面，被配置为将样品的表面的照射引导到检测器的收集光学器件，以及通信地耦合到可调节照明源的调制控制系统，其中调制控制系统被配置为调制可调节照明的驱动电流 源，其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。

公开(公告)号：US09255877B2

公开(公告)日：2016-02-09

申请号：US14278224

申请日：2014-05-15

Applicant: KLA-Tencor Corporation

Inventor： Andrei Veldman ,  Andrei V. Shchegrov ,  Gregory Brady ,  Thaddeus Gerard Dziura ,  Stilian Ivanov Pandev ,  Alexander Kuznetsov

IPC: G01N21/21 ,  G01N21/95 ,  G01B11/06

CPC classification number: G01N21/211 ,  G01B11/0625 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/9501 ,  G01N2021/213

Abstract: Methods and systems for evaluating the capability of a measurement system to track measurement parameters through a given process window are presented herein. Performance evaluations include random perturbations, systematic perturbations, or both to effectively characterize the impact of model errors, metrology system imperfections, and calibration errors, among others. In some examples, metrology target parameters are predetermined as part of a Design of Experiments (DOE). Estimated values of the metrology target parameters are compared to the known DOE parameter values to determine the tracking capability of the particular measurement. In some examples, the measurement model is parameterized by principal components to reduce the number of degrees of freedom of the measurement model. In addition, exemplary methods and systems for optimizing the measurement capability of semiconductor metrology systems for metrology applications subject to process variations are presented.

Abstract translation: 本文介绍了用于评估测量系统通过给定过程窗口跟踪测量参数的能力的方法和系统。 性能评估包括随机扰动，系统扰动或两者，以有效表征模型误差，计量系统缺陷和校准误差等的影响。 在一些示例中，度量目标参数被预先确定为实验设计（DOE）的一部分。 将度量目标参数的估计值与已知的DOE参数值进行比较，以确定特定测量的跟踪能力。 在一些示例中，测量模型由主要组件参数化，以减少测量模型的自由度数。 此外，提出了用于优化用于受过程变化的度量应用的半导体测量系统的测量能力的示例性方法和系统。

公开(公告)号：US20150117610A1

公开(公告)日：2015-04-30

申请号：US14521966

申请日：2014-10-23

Applicant: KLA-Tencor Corporation

Inventor： Andrei Veldman ,  Michael S. Bakeman ,  Andrei V. Shchegrov ,  Walter D. Mieher

IPC: G03F7/20 ,  G01N23/201 ,  G01N21/95 ,  G01N23/203

CPC classification number: G03F7/70633 ,  G01N21/9501 ,  H01L22/12

Abstract: Disclosed are apparatus and methods for determining overlay error in a semiconductor target. For illumination x-rays having at least one angle of incidence (AOI), a correlation model is obtained, and the correlation model correlates overlay error of a target with a modulation intensity parameter for each of one or more diffraction orders (or a continuous diffraction intensity distribution) for x-rays scattered from the target in response to the illumination x-rays. A first target is illuminated with illumination x-rays having the at least one AOI and x-rays that are scattered from the first target in response to the illumination x-rays are collected. An overlay error of the first target is determined based on the modulation intensity parameter of the x-rays collected from the first target for each of the one or more diffraction orders (or the continuous diffraction intensity distribution) and the correlation model.

Abstract translation: 公开了用于确定半导体目标中的重叠误差的装置和方法。 对于具有至少一个入射角（AOI）的照明x射线，获得相关模型，并且相关模型将目标的重叠误差与一个或多个衍射级（或连续衍射中的每一个）的调制强度参数相关联 强度分布），用于响应于照射x射线从目标散射的X射线。 利用具有至少一个AOI的照明x射线照射第一个目标，并且响应于照射x射线而从第一个目标物体散射的X射线被照射。 基于对于一个或多个衍射级（或连续衍射强度分布）和相关模型中的每一个而从第一目标收集的x射线的调制强度参数来确定第一目标的覆盖误差。

公开(公告)号：US20130169966A1

公开(公告)日：2013-07-04

申请号：US13648768

申请日：2012-10-10

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Lawrence D. Rotter ,  David Y. Wang ,  Andrei Veldman ,  Kevin Peterlinz ,  Gregory Brady ,  Derrick Shaughnessy

IPC: G01N21/55 ,  G01N21/47

CPC classification number: G01N21/211 ,  G01B11/0616 ,  G01N21/4738 ,  G01N21/55 ,  G01N2021/213 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633

Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源，被配置为检测从样品的表面发出的照明的检测器，被配置为将来自可调节照明源的照明引导到 样品的表面，被配置为将样品的表面的照射引导到检测器的收集光学器件，以及通信地耦合到可调节照明源的调制控制系统，其中调制控制系统被配置为调制可调节照明的驱动电流 源，其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。