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61 条记录 (耗时 0.046 秒)

    Positive resist composition and method of forming resist pattern
    21.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08206891B2

    公开(公告)日：2012-06-26

    申请号：US12573686

    申请日：2009-10-05

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/123

    摘要： A positive resist composition including: a base component (A) which includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) and a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group; and an acid generator component (B) which includes an acid generator (B1) containing an anion moiety represented by the general formula (I): (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In the formula (I), X represents a cyclic group of 3 to 30 carbon atoms, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).

    摘要翻译： 一种正型抗蚀剂组合物，其包含：包含含有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）和由具有由通式（a0-1）表示的结构单元（a0））的结构单元（a1）的基础组分（A） 酸解离，溶解抑制组; 和含有由通式（I）表示的阴离子部分的酸发生剂（B1）的酸产生剂成分（B）：（式（a0-1）中，R 1表示氢原子，低级烷基 1〜5个碳原子的卤代低级烷基或1〜5个碳原子的卤代低级烷基; R2表示二价连接基团; R3表示环状骨架中含有-SO2-的环状基团，式（I）中，X表示 3〜30个碳原子的环状基团，Q1表示含有氧原子的二价连接基团，Y1表示碳原子数1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。

    Distributed system and multiplexing control method for the system
    22.
    发明授权
    Distributed system and multiplexing control method for the system 有权
    分布式系统和多路复用控制方法

    公开(公告)号：US07272632B2

    公开(公告)日：2007-09-18

    申请号：US10083572

    申请日：2002-02-27

    申请人： Kotaro Endo

    发明人： Kotaro Endo

    IPC分类号： G06F15/16

    CPC分类号： G06F11/1482 ,  G06F11/1425 ,  G06F11/182

    摘要： A distributed system of this invention forms multiplexing by n computers, and permits up to f computers to fail and halt. Respective computers exchange input candidates via an internal network B, and generate lists of input candidates. Each computer repeats generation of the list until (n−f) identical input candidates appear in that list. A computer which satisfies this condition executes its process irrespective of the states of other computers. This distributed system never generates a split brain in principle, and never interrupts a process upon occurrence of a failure due to time-out since it does not perform any failure detection.

    摘要翻译： 本发明的分布式系统通过n台计算机形成多路复用，并允许多达f台计算机故障并停止。 各计算机通过内部网络B交换输入候选，并生成候选输入列表。 每个计算机重复列表的生成，直到（n-f）相同的输入候选出现在该列表中。 满足该条件的计算机执行其处理，而与其他计算机的状态无关。 这种分布式系统原则上不会产生分裂的大脑，并且由于它不执行任何故障检测，所以在由于超时而导致的故障发生时不会中断进程。

    Method for synchronizing program applied to distributed computer system
    23.
    发明授权
    Method for synchronizing program applied to distributed computer system 失效
    同步程序应用于分布式计算机系统的方法

    公开(公告)号：US06799222B1

    公开(公告)日：2004-09-28

    申请号：US09632628

    申请日：2000-08-04

    申请人： Kotaro Endo

    发明人： Kotaro Endo

    IPC分类号： G06F1516

    CPC分类号： H04L47/10 ,  H04L47/15

    摘要： A method for synchronizing a program that is executed on one of a plurality of computers in a distributed computer system by using a reliable ordered multicast, comprising the steps of generating a new process comprising a program and the status in execution on a computer, and transferring the new process through the reliable ordered multicast to the computers, respectively.

    摘要翻译： 一种通过使用可靠的有序多播来同步在分布式计算机系统中的多个计算机之一上执行的程序的方法，包括以下步骤：在计算机上生成包括程序和执行状态的新进程，以及传送 新进程通过可靠的有序组播分别到计算机。

    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    24.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号：US20120329969A1

    公开(公告)日：2012-12-27

    申请号：US13539558

    申请日：2012-07-02

    申请人： Tasuku MATSUMIYA ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai ,  Kotaro Endo

    发明人： Tasuku MATSUMIYA ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai ,  Kotaro Endo

    IPC分类号： C08F228/06

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/111

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.

    摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），由通式（a0-1）表示的结构单元（a0），由含有酸解离性，溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和来自丙烯酸酯的结构单元（a3） 含有由通式（a3-1）表示的含羟基的脂族烃基的酯和基于构成聚合化合物（A1）的所有结构单元的总和的结构单元（a3）的量在该范围内 为1〜30摩尔％。

    Material for forming resist protective film and method for forming resist pattern using same
    27.
    发明授权
    Material for forming resist protective film and method for forming resist pattern using same 有权
    用于形成抗蚀剂保护膜的材料和使用其形成抗蚀剂图案的方法

    公开(公告)号：US07951523B2

    公开(公告)日：2011-05-31

    申请号：US11659006

    申请日：2005-07-29

    申请人： Keita Ishizuka ,  Kotaro Endo ,  Tomovuki Hiranoa

    发明人： Keita Ishizuka ,  Kotaro Endo ,  Tomovuki Hiranoa

    IPC分类号： G03F7/11 ,  C07D265/00 ,  C07D285/00

    CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  Y10S430/128

    摘要： In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes, thereby making it possible to form a high resolution resist pattern using liquid immersion lithography. Using an alkaline soluble polymer, a crosslinking agent, and a solvent capable of dissolving them as at least constituent component, a composition is prepared and a protective film is formed on the surface of the resist film to be used, using the composition.

    摘要翻译： 在液浸光刻工艺中，通过同时防止抗蚀剂膜的劣化以及使用包括水在内的各种浸渍液体的液浸光刻中所使用的浸渍液的劣化，可以提高抗蚀剂膜的后曝光延迟性，而不会增加 处理次数，从而可以使用液浸光刻法形成高分辨率抗蚀剂图案。 使用碱溶性聚合物，交联剂和能够溶解至少构成成分的溶剂，制备组合物，并使用该组合物在所使用的抗蚀剂膜的表面上形成保护膜。

    Positive resist composition and method of forming resist pattern
    29.
    发明申请
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US20100183981A1

    公开(公告)日：2010-07-22

    申请号：US12591819

    申请日：2009-12-02

    申请人： Tasuku Matsumiya ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai ,  Kotaro Endo

    发明人： Tasuku Matsumiya ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai ,  Kotaro Endo

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/111

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.

    摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），由通式（a0-1）表示的结构单元（a0），由含有酸解离性，溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和来自丙烯酸酯的结构单元（a3） 含有由通式（a3-1）表示的含羟基的脂族烃基的酯和基于构成聚合化合物（A1）的所有结构单元的总和的结构单元（a3）的量在该范围内 为1〜30摩尔％。