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    Catalysts
    2.
    发明授权
    Catalysts 有权

    公开(公告)号：US10556988B2

    公开(公告)日：2020-02-11

    申请号：US15327806

    申请日：2015-07-22

    申请人： Econic Technologies Ltd

    发明人： Andy Chapman ,  Anthony Chartoire ,  James Leeland ,  Michael Kember ,  Louis Adriaenssens

    IPC分类号： C08G64/00 ,  C08G64/34 ,  B01J31/18 ,  B01J31/22 ,  C08G63/82 ,  C07D257/02 ,  C07D285/00 ,  C07D487/08

    摘要： The present invention relates to the field of polymerisation catalysts, and systems comprising said catalysts for polymerising carbon dioxide and an epoxide, a lactide and/or lactone, and/or an epoxide and an anhydride. The catalyst is of formula (I): Wherein M1 and M2 are independently selected from Zn(II), Cr(II), Co(II), Cu(II), Mn(II), Ni(II), Mg(II), Fe(II), Ti(II), V(II), Cr(III)-X, Co(III)-X, Ni(III)-X, Mn(III)-X, Fe(III)-X, Ca(II), Ge(II), Al(III)-X, Ti(III)-X, V(III)-X, Ge(IV)-(X)2 or Ti(IV)-(X)2. R3A is different from R3B; and/or at least one occurrence of E3, E4, E5 and E6 is different to a remaining occurrence of E3, E4, E5 and E6. A ligand, a process of asymmetric N-substitution of a symmetrical ligand and a process for the reaction of: (i) carbon dioxide with an epoxide; (ii) an epoxide and an anhydride; and/or (iii) a lactide and/or a lactone, in the presence of a catalyst is also described.

    Catalysts
    3.
    发明申请
    Catalysts 审中-公开

    公开(公告)号：US20170210848A1

    公开(公告)日：2017-07-27

    申请号：US15327806

    申请日：2015-07-22

    申请人： Econic Technologies Ltd

    发明人： Andy CHAPMAN ,  Anthony CHARTOIRE ,  James LEELAND ,  Michael KEMBER ,  Louis ADRIAENNSENS

    IPC分类号： C08G64/34 ,  C07D285/00 ,  C07D487/08 ,  B01J31/22 ,  C07D257/02

    摘要： The present invention relates to the field of polymerisation catalysts, and systems comprising said catalysts for polymerising carbon dioxide and an epoxide, a lactide and/or lactone, and/or an epoxide and an anhydride. The catalyst is of formula (I): Wherein M1 and M2 are independently selected from Zn(II), Cr(II), Co(II), Cu(II), Mn(II), Ni(II), Mg(II), Fe(II), Ti(II), V(II), Cr(III)-X, Co(III)-X, Ni(III)-X, Mn(III)-X, Fe(III)-X, Ca(II), Ge(II), Al(III)-X, Ti(III)-X, V(III)-X, Ge(IV)-(X)2 or Ti(IV)-(X)2. R3A is different from R3B; and/or at least one occurrence of E3, E4, E5 and E6 is different to a remaining occurrence of E3, E4, E5 and E6. A ligand, a process of asymmetric N-substitution of a symmetrical ligand and a process for the reaction of: (i) carbon dioxide with an epoxide; (ii) an epoxide and an anhydride; and/or (iii) a lactide and/or a lactone, in the presence of a catalyst is also described.

    Material for formation of resist protection film and method of forming resist pattern therewith
    6.
    发明授权
    Material for formation of resist protection film and method of forming resist pattern therewith 失效
    用于形成抗蚀剂保护膜的材料及其形成抗蚀剂图案的方法

    公开(公告)号：US07879529B2

    公开(公告)日：2011-02-01

    申请号：US11658900

    申请日：2005-07-29

    申请人： Kotaro Endo ,  Masaaki Yoshida ,  Keita Ishizuka

    发明人： Kotaro Endo ,  Masaaki Yoshida ,  Keita Ishizuka

    IPC分类号： G03F7/11 ,  G03F7/26 ,  C07D265/00 ,  C07D285/00

    CPC分类号： G03F7/2041 ,  G03F7/11

    摘要： In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes, thereby making it possible to form a high resolution resist pattern using liquid immersion lithography. Furthermore, it is possible to apply a high refractive index liquid immersion medium, used in combination with the high refractive index liquid immersion medium, thus making it possible to further improve pattern accuracy. Using a composition comprising an acrylic resin component having characteristics which have substantially no compatibility with a liquid in which a resist film is immersed, particularly water, and are also soluble in alkaline, a protective film is formed on the surface of a resist film used.

    摘要翻译： 在液浸光刻工艺中，通过同时防止抗蚀剂膜的劣化以及使用包括水在内的各种浸渍液体的液浸光刻中所使用的浸渍液的劣化，可以提高抗蚀剂膜的后曝光延迟性，而不会增加 处理次数，从而可以使用液浸光刻法形成高分辨率抗蚀剂图案。 此外，可以应用与高折射率浸液介质组合使用的高折射率液浸介质，从而可以进一步提高图案精度。 使用包含与浸渍有抗蚀剂膜的液体基本上不相容的特性的丙烯酸树脂组分的组合物，特别是水，并且也可溶于碱性，在所用的抗蚀剂膜的表面上形成保护膜。

    Paclitaxel enhancer compounds
    7.
    发明授权
    Paclitaxel enhancer compounds 失效
    紫杉醇增强剂化合物

    公开(公告)号：US07671092B2

    公开(公告)日：2010-03-02

    申请号：US12009641

    申请日：2008-01-18

    申请人： Keizo Koya ,  Lijun Sun ,  Shoujun Chen ,  Noriaki Tatsuta ,  Yaming Wu ,  Mitsunori Ono

    发明人： Keizo Koya ,  Lijun Sun ,  Shoujun Chen ,  Noriaki Tatsuta ,  Yaming Wu ,  Mitsunori Ono

    IPC分类号： A61K31/16 ,  C07D285/00 ,  C07D417/00

    CPC分类号： A61K47/48176 ,  A61K31/16 ,  A61K31/165 ,  A61K31/277 ,  A61K31/337 ,  A61K31/381 ,  A61K31/44 ,  A61K31/505 ,  A61K31/53 ,  A61K47/58 ,  C07C327/56 ,  C07C2601/02 ,  C07C2601/04 ,  C07C2601/08 ,  C07C2601/14 ,  C07D209/42 ,  C07D209/44 ,  C07D213/83 ,  C07D261/18 ,  C07D305/14 ,  C07D307/68 ,  C07D333/38 ,  C07D333/68 ,  C07D407/12

    摘要： Disclosed is a compound represented by the Structural Formula (I): Y is a covalent bond, a phenylene group or a substituted or unsubstituted straight chained hydrocarbyl group. In addition, Y, taken together with both >C=Z groups to which it is bonded, is a substituted or unsubstituted aromatic group. Preferably, Y is a covalent bond or —C(R7R8)—. R1 and R2 are independently an aryl group or a substituted aryl group, R3 and R4 are independently —H, an aliphatic group, a substituted aliphatic group, an aryl group or a substituted aryl group. R5-R6 are independently —H, an aliphatic group, a substituted aliphatic group, an aryl group or a substituted aryl group. R7 and R8 are each independently —H, an aliphatic or substituted aliphatic group, or R7 is —H and R8 is a substituted or unsubstituted aryl group, or, R7 and R8, taken together, are a C2-C6 substituted or unsubstituted alkylene group. Z is ═O or ═S. Also disclosed are pharmaceutical compositions comprising the compound of the present invention and a pharmaceutically acceptable carrier or diluent.Also disclosed is a method of treating a subject with cancer by administering to the subject a compound of Structural Formula (I) in combination with Paclitaxel or an analog of Paclitaxel.

    摘要翻译： 公开了由结构式（I）表示的化合物：Y是共价键，亚苯基或取代或未取代的直链烃基。 此外，Y与它所键合的两个> C = Z基团一起是取代或未取代的芳族基团。 优选Y为共价键或-C（R 7 R 8） - 。 R 1和R 2独立地是芳基或取代的芳基，R 3和R 4独立地是-H，脂族基团，取代的脂族基团，芳基或取代的芳基。 R5-R6独立地是-H，脂族基团，取代的脂族基团，芳基或取代的芳基。 R 7和R 8各自独立地为-H，脂族或取代的脂族基团，或者R 7为-H且R 8为取代或未取代的芳基，或者R 7和R 8一起为C 2 -C 6取代或未取代的亚烷基 。 Z为═O或═S。 还公开了包含本发明化合物和药学上可接受的载体或稀释剂的药物组合物。 还公开了通过向受试者施用结合式（I）的化合物与紫杉醇或紫杉醇的类似物组合来治疗患有癌症的受试者的方法。