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21.发明授权公开(公告)号：US07518128B2
公开(公告)日：2009-04-14
申请号：US11478303
申请日：2006-06-30
CPC分类号： G03F7/70925 , B08B7/00
摘要： A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.
摘要翻译： 提供了用于EUV光刻设备（例如具有Sn源的EUV光刻设备）的清洁装置。 清洁装置包括用于含氢气体和氢根源的气体源。 氢自由基源是（UV）辐射源，其诱导氢的光解离。 自由基可以减少Sn氧化物（如果存在）和形成Sn沉积和/或碳沉积的挥发性氢化物。 以这种方式，清洁装置可用于从Sn和/或C沉积物清洁光学元件。 EUV源可以用作氢源。 使用滤光器去除不期望的EUV辐射并传输所需的UV辐射。
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公开(公告)号：US20100141909A1
公开(公告)日：2010-06-10
申请号：US12519077
申请日：2007-11-27
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailòvitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer , Denis Alexandrovich Glushkov
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailòvitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer , Denis Alexandrovich Glushkov
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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23.发明授权Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法公开(公告)号：US07706057B2
公开(公告)日：2010-04-27
申请号：US12230384
申请日：2008-08-28
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.
摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。
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公开(公告)号：US07696493B2
公开(公告)日：2010-04-13
申请号：US11637937
申请日：2006-12-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
IPC分类号： G03F7/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
摘要翻译： 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹持物。 辐射系统还包括等离子体复合表面，该等离子体复合表面被布置成接近于夹紧，并且被配置为中和多个等离子体颗粒。
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公开(公告)号：US20090072168A1
公开(公告)日：2009-03-19
申请号：US12289884
申请日：2008-11-06
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch IVANOV , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch IVANOV , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： G01J3/10
CPC分类号： G03F7/70933 , G03F7/70925
摘要： A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.
摘要翻译： 清洁装置被配置为清洁EUV光刻设备的EUV光学元件。 部分自由基压力范围在0.1-10Pa之间。清洁装置可以被配置在光刻设备的清洁茧内用于离线清洁。 它也可以配置在设备内的特定位置，以便在生产过程中清洁附近的光学元件。 在0.1-10Pa的压力范围内，原子氢进入光学器件的渗透率很高，而分子氢和氢消耗的复合受到限制。
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26.发明授权Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07453645B2
公开(公告)日：2008-11-18
申请号：US11025601
申请日：2004-12-30
CPC分类号： G21K1/06 , G03F7/70575 , G21K2201/067
摘要： A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
摘要翻译： 光谱纯度滤光器包括孔，孔具有直径，其中光谱纯度滤光器被配置为通过反射第一波长的辐射并允许第二波长的至少一部分辐射来增强辐射束的光谱纯度 通过孔径传播，第一波长大于第二波长。 光谱纯度滤光片可用于提高极紫外（EUV）辐射束的光谱纯度。
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公开(公告)号：US20080217558A1
公开(公告)日：2008-09-11
申请号：US12067309
申请日：2006-09-18
IPC分类号： G21H3/02
CPC分类号： G02B5/3058 , G01N21/6445 , G01N21/648 , G01N2021/036 , G01N2021/6482
摘要： The present invention proposes a sub-wavelength luminescence sensor, such as e.g. a luminescence biosensor or a luminescence chemical sensor, comprising at least two wire grids (1, 2) positioned perpendicular with respect to each other. The luminescence sensor, in which the excitation radiation is efficiently used and the luminescence radiation is efficiently detected, has an improved signal-to-noise ratio and a separated excitation and luminescence radiation.
摘要翻译： 本发明提出了一种亚波长发光传感器，例如， 发光生物传感器或发光化学传感器，其包括相对于彼此垂直定位的至少两个线栅（1,2）。 其中有效地利用激发辐射和有效地检测发光辐射的发光传感器具有改善的信噪比和分离的激发和发光辐射。
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公开(公告)号：US07414700B2
公开(公告)日：2008-08-19
申请号：US11239479
申请日：2005-09-30
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder
IPC分类号： G03B27/42
CPC分类号： B82Y10/00 , B08B7/0035 , B08B17/04 , G03F7/70925 , G03F7/70983 , G21K1/062
摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
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公开(公告)号：US20080142736A1
公开(公告)日：2008-06-19
申请号：US11637936
申请日：2006-12-13
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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30.发明授权Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus 有权用于去除光学元件上的沉积的方法，用于保护光学元件的方法，器件制造方法，包括光学元件的设备和光刻设备公开(公告)号：US07355672B2
公开(公告)日：2008-04-08
申请号：US10956344
申请日：2004-10-04
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder
CPC分类号： B82Y10/00 , B08B7/0035 , B08B17/04 , G03F7/70925 , G03F7/70983 , G21K1/062
摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。
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