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公开(公告)号：US08408259B2
公开(公告)日：2013-04-02
申请号：US13270057
申请日：2011-10-10
申请人： David Pozgay , James B. Stevens , Harald Krondorfer , Jeff Schreiner , Martin Feldman , Tim Truesdale , Arturo Gonzalez , Deborah Brown , Erick Higashi , Charlie Ren
发明人： David Pozgay , James B. Stevens , Harald Krondorfer , Jeff Schreiner , Martin Feldman , Tim Truesdale , Arturo Gonzalez , Deborah Brown , Erick Higashi , Charlie Ren
IPC分类号： B27C5/10
CPC分类号： B23Q9/0028 , B27C5/10 , Y10T409/306608 , Y10T409/307952 , Y10T409/308624
摘要： A routing machine comprises a base unit and a motor unit releasably connected to the base unit. The base unit includes a handle and a first electrical connector. The motor unit includes an electric motor, motor control circuitry configured to energize or de-energize the electric motor, and a second electrical connector connected to the motor control circuitry. The second electrical connector is configured to engage the first electrical connector when the motor unit is properly seated on the base unit. An electric switch is positioned on the base unit. The motor control circuitry is configured to deliver electric power to the electric motor when the switch is in an on position. The motor control circuitry is configured to not provide electric power to the electric motor when the switch is in an off position.
摘要翻译： 路由机包括基本单元和可释放地连接到基座单元的马达单元。 基座单元包括手柄和第一电连接器。 电动机单元包括电动机，电动机控制电路，被配置为使电动机通电或断电，以及连接到电动机控制电路的第二电连接器。 第二电连接器被配置为当电动机单元正确地就座在基座单元上时接合第一电连接器。 电开关位于基座上。 电动机控制电路被配置为当开关处于接通位置时向电动机供电。 电动机控制电路构造成当开关处于关闭位置时不向电动机提供电力。
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公开(公告)号：US08033307B2
公开(公告)日：2011-10-11
申请号：US12371559
申请日：2009-02-13
申请人： David Pozgay , James B. Stevens , Harald Krondorfer , Jeff Schreiner , Martin Feldman , Tim Truesdale , Arturo Gonzalez , Deborah Brown , Erick Higashi , Charlie Ren
发明人： David Pozgay , James B. Stevens , Harald Krondorfer , Jeff Schreiner , Martin Feldman , Tim Truesdale , Arturo Gonzalez , Deborah Brown , Erick Higashi , Charlie Ren
IPC分类号： B27C5/10
CPC分类号： B23Q9/0028 , B27C5/10 , Y10T409/306608 , Y10T409/307952 , Y10T409/308624
摘要： A routing machine comprises a base unit and a motor unit releasably connected to the base unit. The base unit includes a handle and a first electrical connector. The motor unit includes an electric motor, motor control circuitry configured to energize or de-energize the electric motor, and a second electrical connector connected to the motor control circuitry. The second electrical connector is configured to engage the first electrical connector when the motor unit is properly seated on the base unit. An electric switch is positioned on the base unit. The motor control circuitry is configured to deliver electric power to the electric motor when the switch is in an on position. The motor control circuitry is configured to not provide electric power to the electric motor when the switch is in an off position.
摘要翻译： 路由机包括基本单元和可释放地连接到基座单元的马达单元。 基座单元包括手柄和第一电连接器。 电动机单元包括电动机，电动机控制电路，被配置为使电动机通电或断电，以及连接到电动机控制电路的第二电连接器。 第二电连接器被配置为当电动机单元正确地就座在基座单元上时接合第一电连接器。 电开关位于基座上。 电动机控制电路被配置为当开关处于接通位置时向电动机供电。 电动机控制电路构造成当开关处于关闭位置时不向电动机提供电力。
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公开(公告)号：US07715109B2
公开(公告)日：2010-05-11
申请号：US12154738
申请日：2008-05-27
申请人： Martin Feldman
发明人： Martin Feldman
CPC分类号： G02B3/14 , G02B17/0896
摘要： An optical system for the production of images, comprising an all optical system is disclosed. Said all optical system manipulates images directly by digital electronics without loss in the number of resolvable spots at higher magnifications.
摘要翻译： 公开了一种用于生产图像的光学系统，包括全光学系统。 所有的光学系统都是通过数字电子技术直接操纵图像，而不会在较高放大倍率的可解析点的数量上损失。
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公开(公告)号：US06792175B2
公开(公告)日：2004-09-14
申请号：US09726640
申请日：2000-11-30
IPC分类号： G02B635
CPC分类号： G02F1/31 , G02B6/3556 , G02B6/3594 , G02F1/13471 , G02F2203/07
摘要： A free space all-optical crossbar switches light from a plurality of sources onto a plurality of receivers, in any arbitrary permutation or combination (including one-to-one and many-to-one permutations). The sources and receivers may, for example, be single mode optical fibers. The polarization of the light from each source is controlled by a series of polarization control devices associated with the source so as to obtain desired angular deflections through a series of polarization-dependent angular deflectors in a first deflection unit. A lens may then direct the light from each source towards its desired receiver. An optional second deflection unit containing polarization control devices associated with individual receivers redirects the light so that it is incident normally on the receivers, an advantage if the receivers are single mode optical fibers. Alternative embodiments are described to reduce the number of optical components and to provide uninterrupted high speed data flow.
摘要翻译： 自由空间全光交叉开关将光从多个源切换到多个接收器，以任何任意的排列或组合（包括一对一和多对一排列）。 源和接收器可以例如是单模光纤。 来自每个源的光的偏振由与源相关联的一系列偏振控制装置控制，以便通过第一偏转单元中的一系列偏振相关角偏转器获得期望的角偏转。 然后，透镜可以将来自每个源的光引导到其期望的接收器。 包含与单个接收器相关联的偏振控制装置的可选的第二偏转单元重定向光，使得其正常地入射在接收器上，如果接收器是单模光纤，则具有优点。 描述了替代实施例以减少光学部件的数量并提供不间断的高速数据流。
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25.发明授权公开(公告)号：US06226120B1
公开(公告)日：2001-05-01
申请号：US08347804
申请日：1994-11-30
申请人： Martin Feldman
发明人： Martin Feldman
IPC分类号： G02B2300
CPC分类号： G02B23/00 , G02B3/005 , G02B3/0056
摘要： Methods are disclosed for making microstructures. In one method, the resist layer is reversibly deformed during exposure. When the resist is flattened and developed after exposure, non-vertical features result that are not obtainable through other existing means. One application of this method is to make nested cones suitable for use as a highly efficient x-ray lens. In another disclosed method, “halftone” lithography is used to generate microstructures having features whose height may vary continuously. One application of this method is to make a novel telescope array, a thin film having telescopic magnification properties.
摘要翻译： 公开了制造微结构的方法。 在一种方法中，抗蚀剂层在曝光期间可逆地变形。 当抗蚀剂在曝光后变平且显影时，不能通过其他现有方法获得非垂直特征。 该方法的一个应用是使嵌套锥体适合用作高效x射线透镜。 在另一公开的方法中，使用“半色调”光刻来产生具有其高度可连续变化的特征的微结构。 该方法的一个应用是制造一种新型的望远镜阵列，具有伸缩放大特性的薄膜。
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公开(公告)号：US5263073A
公开(公告)日：1993-11-16
申请号：US811305
申请日：1991-12-20
申请人： Martin Feldman
发明人： Martin Feldman
CPC分类号： G03F7/70058 , G03F7/70216 , G21K1/025 , G21K5/02
摘要： Novel methods and apparatus for high resolution electron beam and X-ray lithography. For electron-beam lithography, a novel 1:1 imaging system is disclosed. For X-ray lithography, novel 1:1 imaging and n:1 reduction imaging systems are disclosed.
摘要翻译： 用于高分辨率电子束和X射线光刻的新方法和装置。 对于电子束光刻，公开了一种新颖的1：1成像系统。 对于X射线光刻，公开了新颖的1：1成像和n：1还原成像系统。
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27.发明授权
公开(公告)号：US5078482A
公开(公告)日：1992-01-07
申请号：US638243
申请日：1991-01-03
CPC分类号： G03F7/70616 , G02B21/0072 , G03F7/70641
摘要： A new confocal microscope and a new device fabrication method in which linewidth control is achieved using the new confocal microscope are disclosed. This new confocal microscope has a configuration which achieves multiple passes, e.g., three, four, five, six, seven or more passes, of the incident light through the objective lens of the microscope. As a consequence, the new confocal microscope exhibits a smaller effective depth of focus and a smaller effective resolution than a conventional confocal microscope.
摘要翻译： 公开了一种使用新的共焦显微镜实现线宽控制的新的共焦显微镜和新的器件制造方法。 这种新的共焦显微镜具有通过显微镜的物镜实现入射光的多次通过，例如三次，四次，五次，六次，七次或更多遍的配置。 因此，与常规的共聚焦显微镜相比，新的共焦显微镜显示出较小的有效聚焦深度和较小的有效分辨率。
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公开(公告)号：US4626103A
公开(公告)日：1986-12-02
申请号：US594939
申请日：1984-03-29
申请人： Martin Feldman , David N. Reece , John S. Wagner
发明人： Martin Feldman , David N. Reece , John S. Wagner
CPC分类号： G03F9/7026
摘要： A method and apparatus are disclosed for tracking the position of surfaces during certain processing such as optical projection printing. Light from a line or point source is made incident on the surface at a small angle to produce interference fringes between the reflected light and a reference beam. Any movement of the surface causes a shifting of the fringe pattern which can be detected by appropriate means such as a slit or grating and photodiode combination.
摘要翻译： 公开了用于在诸如光学投影印刷的某些处理期间跟踪表面的位置的方法和装置。 来自线或点光源的光以小角度入射在表面上，以产生反射光和参考光束之间的干涉条纹。 表面的任何运动导致条纹图案的移动，该图案可以通过诸如狭缝或光栅和光电二极管组合的适当装置来检测。
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公开(公告)号：US4595289A
公开(公告)日：1986-06-17
申请号：US573816
申请日：1984-01-25
申请人： Martin Feldman , Lynn O. Wilson
发明人： Martin Feldman , Lynn O. Wilson
IPC分类号： G01B11/24 , G01B11/245 , G01N21/88 , G01N21/956 , G03F1/84 , G03F7/20 , H01L21/30 , H01L21/66 , G01B11/00
CPC分类号： G03F1/84 , G01N21/95607 , G03F7/70483
摘要： Integrated-circuit wafers and the lithographic masks and reticles used in their fabrication must be inspected for defects. Conventional systems accomplish such inspection by bright-field illumination and comparison of corresponding portions of two supposedly identical patterns on the workpiece. The minimum-size defect that can be so detected is set by misalignment between the patterns. Dark-field illumination of the portions to be compared significantly enhances the detection capabilities of such an inspection system. For a given misalignment, dark-field illumination permits the detection of defects at least four times smaller than those detectable in a conventional bright-field-illuminated system.
摘要翻译： 必须检查集成电路晶片及其制造中使用的光刻掩模和掩模版的缺陷。 常规系统通过明场照明来完成这种检查，并且将两个所假定的相同图案的对应部分在工件上进行比较。 可以如此检测到的最小尺寸缺陷是通过图案之间的未对准来设定的。 要比较的部分的暗场照明显着增强了这种检查系统的检测能力。 对于给定的未对准，暗场照明允许检测到的缺陷比常规亮场照明系统中可检测的缺陷少至少四倍。
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公开(公告)号：US4326805A
公开(公告)日：1982-04-27
申请号：US139544
申请日：1980-04-11
申请人： Martin Feldman , Alan D. White , Donald L. White
发明人： Martin Feldman , Alan D. White , Donald L. White
IPC分类号： H01L21/30 , G03F9/00 , G03F9/02 , H01L21/027 , G01B11/27
CPC分类号： G03F9/7076 , G03F9/703
摘要： Zone plate patterns (12,20,61,62) formed on spaced-apart mask and wafer members (10,60) are utilized for alignment purposes in the fabrication of integrated circuits. By providing off-axis illumination of the patterns, a significant mask-to-wafer alignment capability is provided in an X-ray lithographic system. This capability includes being able to correct for so-called magnification errors that arise from physical distortions in the mask and/or wafer or in other components of the system. These errors are compensated for by utilizing the zone plate patterns to form alignment marks that serve as a basis for adjusting the mask-to-wafer separation.
摘要翻译： 形成在间隔开的掩模和晶片构件（10,60）上的区域板图案（12,20,61,62）用于集成电路制造中的对准目的。 通过提供图案的离轴照明，在X射线光刻系统中提供了显着的掩模到晶片对准能力。 该能力包括能够校正由掩模和/或晶片或系统的其它部件中的物理失真引起的所谓放大误差。 这些误差通过利用区域板图案来补偿，以形成用作调整掩模到晶片间隔的基础的对准标记。
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