Focus tracking system
    1.
    发明授权
    Focus tracking system 失效
    焦点跟踪系统

    公开(公告)号:US4626103A

    公开(公告)日:1986-12-02

    申请号:US594939

    申请日:1984-03-29

    IPC分类号: G01B9/02 G01B11/14

    CPC分类号: G03F9/7026

    摘要: A method and apparatus are disclosed for tracking the position of surfaces during certain processing such as optical projection printing. Light from a line or point source is made incident on the surface at a small angle to produce interference fringes between the reflected light and a reference beam. Any movement of the surface causes a shifting of the fringe pattern which can be detected by appropriate means such as a slit or grating and photodiode combination.

    摘要翻译: 公开了用于在诸如光学投影印刷的某些处理期间跟踪表面的位置的方法和装置。 来自线或点光源的光以小角度入射在表面上,以产生反射光和参考光束之间的干涉条纹。 表面的任何运动导致条纹图案的移动,该图案可以通过诸如狭缝或光栅和光电二极管组合的适当装置来检测。

    Digital image pointing and digital zoom optical system
    4.
    发明申请
    Digital image pointing and digital zoom optical system 有权
    数字图像指向和数字变焦光学系统

    公开(公告)号:US20090015937A1

    公开(公告)日:2009-01-15

    申请号:US12154738

    申请日:2008-05-27

    申请人: Martin Feldman

    发明人: Martin Feldman

    IPC分类号: G02B15/14

    CPC分类号: G02B3/14 G02B17/0896

    摘要: An optical system for the production of images, comprising an all optical system is disclosed. Said all optical system manipulates images directly by digital electronics without loss in the number of resolvable spots at higher magnifications.

    摘要翻译: 公开了一种用于生产图像的光学系统,包括全光学系统。 所有的光学系统都是通过数字电子技术直接操纵图像,而不会在较高放大倍率的可解析点的数量上损失。

    High Precision Code Plates and Geophones
    5.
    发明申请
    High Precision Code Plates and Geophones 有权
    高精度代码板和地震检波器

    公开(公告)号:US20080297807A1

    公开(公告)日:2008-12-04

    申请号:US12097835

    申请日:2006-12-20

    IPC分类号: G01B11/14

    摘要: An apparatus and method are disclosed for imaging a diffraction grating with a very high depth of focus, using a highly accurate code plate position measurement system. Positions may be measured to an accuracy of 1 nm or even smaller. The system may be used in fields such as manufacturing integrated circuits, and low- and very-low-frequency geophones, and other low- and very-low-frequency acoustic detectors.

    摘要翻译: 公开了一种使用高度准确的代码板位置测量系统对具有非常高的焦点深度的衍射光栅进行成像的装置和方法。 位置可以测量到1nm或甚至更小的精度。 该系统可用于诸如制造集成电路,低频和非常低频地震检波器以及其它低频和非常低频率声波检测器的领域。

    Forward-Looking Optical Coherence Tomography Endoscope
    6.
    发明申请
    Forward-Looking Optical Coherence Tomography Endoscope 有权
    前瞻性光学相干断层扫描内窥镜

    公开(公告)号:US20100049002A1

    公开(公告)日:2010-02-25

    申请号:US12444703

    申请日:2007-10-09

    摘要: A forward-looking, optical coherence tomography, endoscopic probe is disclosed capable of high resolution with a small diameter. Light is focused and scanned during three passes through a lens. A light source supplies light to the proximal side of the lens. The light makes a first pass through the lens, and is reflected from a fixed mirror on the distal side. The reflected light makes a second pass from the distal side to the proximal side, and exits the lens at the proximal side, and is reflected by a scanning mirror. The light makes a third pass through the lens from the proximal side to the distal side to a sample to be imaged. The light is focused during each of the three passes through the lens. Light reflected from the sample passes back through and is focused by the same system.

    摘要翻译: 公开了一种前瞻性的光学相干断层扫描,能够具有小直径的高分辨率的内窥镜探针。 在通过镜头的三次通过期间,光被聚焦和扫描。 光源将光提供给透镜的近侧。 光线首先通过透镜,并从远侧的固定镜反射。 反射光从远侧到近侧进行第二遍,并且在近侧离开透镜,并被扫描镜反射。 光从近侧到远侧进行第三次穿透透镜到待成像的样品。 在通过透镜的三次通过中的每一次中,光聚焦。 来自样品的光反射回并通过相同的系统聚焦。

    Adaptive lithography membrane masks
    7.
    发明授权
    Adaptive lithography membrane masks 失效
    自适应光刻膜面膜

    公开(公告)号:US06404481B1

    公开(公告)日:2002-06-11

    申请号:US09578573

    申请日:2000-05-25

    IPC分类号: G03B2768

    摘要: Techniques are disclosed to compensate for distortions in lithography by locally heating the membrane in a lithographic mask. The techniques may be used both to shrink and to expand areas of the mask locally, in order to adjust for varying magnitudes and signs of distortion. In one embodiment the correction method comprises two steps: (1) A send-ahead wafer is exposed and measured by conventional means to determine the overlay errors at several points throughout the field. (2) During exposure of subsequent wafers, calibrated beams of light are focused on the mask. The heating from the absorbed light produces displacements that compensate for the overlay errors measured with the send-ahead wafer. Any source of distortion may be corrected—for example, distortion appearing on the mask initially, distortion that only develops on the mask over time, or distortion on the wafer. In another embodiment, a reference pattern is formed on the membrane as a means of measuring mask distortion, and the heat input distribution needed to correct distortion is determined by subsequent measurements of the reference pattern. In this alternative embodiment, any source of distortion in the mask may be corrected.

    摘要翻译: 公开了通过局部加热光刻掩模中的膜来补偿光刻中的变形的技术。 这些技术可以同时用于收缩和局部扩大掩模的区域,以便调整变化的幅度和失真的迹象。 在一个实施例中,校正方法包括两个步骤:(1)通过传统手段对发射晶片进行曝光和测量,以确定整个场中的几个点处的覆盖误差。 (2)在后续晶片曝光期间,校准光束聚焦在掩模上。 来自吸收光的加热产生位移,补偿由发射晶片测量的重叠误差。 可以校正任何失真源 - 例如,最初出现在掩模上的失真,仅在掩模上随时间发生的失真或晶片上的失真。 在另一个实施例中,作为测量掩模失真的手段在膜上形成参考图案,并且通过参考图案的后续测量来确定校正失真所需的热输入分布。 在该替代实施例中,可以校正掩模中的任何失真源。

    Charged-particle-beam lithography
    8.
    发明授权
    Charged-particle-beam lithography 失效
    带电粒子束光刻

    公开(公告)号:US4742234A

    公开(公告)日:1988-05-03

    申请号:US054146

    申请日:1987-05-12

    摘要: An elongated source of charged particles is utilized in a lithographic system to form multiple focused electron (or ion) beams arranged in a linear array. The basis for an extremely high-throughput lithographic system especially suited for direct writing applications is thereby provided.

    摘要翻译: 在光刻系统中使用细长的带电粒子源以形成以线性阵列布置的多个聚焦电子(或离子)束。 因此,提供了特别适用于直接写入应用的极高通量光刻系统的基础。

    Wafer chuck comprising a curved reference surface
    9.
    发明授权
    Wafer chuck comprising a curved reference surface 失效
    晶片卡盘包括弯曲的参考表面

    公开(公告)号:US4724222A

    公开(公告)日:1988-02-09

    申请号:US856175

    申请日:1986-04-28

    申请人: Martin Feldman

    发明人: Martin Feldman

    摘要: A chuck for holding a workpiece (e.g., a semiconductor wafer) in a vacuum comprises a curved reference surface. By clamping the edges of the workpiece and maintaining its backside against the curved surface (or against pins mounted on the surface), the frontside of the workpiece can be thereby established in a precise equidistant relationship with respect to the reference surface. Such a chuck is advantageous for holding wafers to be lithographically patterned in a high-resolution way by electron-beam, ion-beam and X-ray-beam techniques.

    摘要翻译: 用于在真空中保持工件(例如,半导体晶片)的卡盘包括弯曲的参考表面。 通过夹紧工件的边缘并将其背面保持抵靠弯曲表面(或安装在表面上的销钉),从而可以以相对于参考表面精确的等距关系建立工件的前端。 这种卡盘对于通过电子束,离子束和X射线束技术以高分辨率的方式将晶片保持光刻图案是有利的。

    Two-dimensional imaging with line arrays
    10.
    发明授权
    Two-dimensional imaging with line arrays 失效
    线阵列二维成像

    公开(公告)号:US4636080A

    公开(公告)日:1987-01-13

    申请号:US607956

    申请日:1984-05-07

    申请人: Martin Feldman

    发明人: Martin Feldman

    IPC分类号: G01B11/03 G03F9/00 G01B11/00

    CPC分类号: G03F9/7076

    摘要: One or two linear arrays of photodetectors are combined with optical elements to form an arrangement capable of determining the X-Y location of a focused laser beam or other light spot. The resulting arrangement is characterized by low cost and by excellent resolution, stability and linearity. Moreover, the arrangement provides output data that can be easily and quickly processed. The combination is adapted, for example, for use with zone plates in aligning masks and wafers in semiconductor fabrication.

    摘要翻译: 光电检测器的一个或两个线性阵列与光学元件组合以形成能够确定聚焦激光束或其他光斑的X-Y位置的布置。 所得到的布置的特征在于低成本和优异的分辨率,稳定性和线性。 此外,该布置提供可以容易且快速地处理的输出数据。 该组合适用于例如在半导体制造中对准掩模和晶片的区域板中使用。