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108 条记录 (耗时 0.029 秒)

    Electronic flash device
    21.
    发明授权
    Electronic flash device 失效
    电子闪光装置

    公开(公告)号：US4465353A

    公开(公告)日：1984-08-14

    申请号：US448744

    申请日：1982-12-10

    申请人： Masaaki Yoshida ,  Hiroyuki Kataoka

    发明人： Masaaki Yoshida ,  Hiroyuki Kataoka

    IPC分类号： G03B7/16 ,  G03B15/05

    CPC分类号： G03B15/05 ,  G03B7/16 ,  G03B2215/0528 ,  G03B2215/0553

    摘要： An electronic flash device including a main light part, a pre-emission light part, an illumination direction changing mechanism for changing the illumination directions of the main light part and the pre-emission light at the same time in the case of bounced light photography, and a control mechanism for deciding the aperture value of the photographing lens in accordance with the light measuring level of the reflected pre-emission light and controlling the main light part with the light adjusting level corresponding to the aperture value.

    摘要翻译： 一种电子闪光装置，其包括主光部分，预发光部分，用于在反射光摄影的情况下同时改变主光部分的照明方向和预发光的照明方向改变机构， 以及控制机构，用于根据反射的预发射光的光测量水平来决定拍摄镜头的光圈值，并且以与光圈值对应的调光电平来控制主光部分。

    Charge control apparatus, movable body, and charge control method
    22.
    发明授权
    Charge control apparatus, movable body, and charge control method 有权

    公开(公告)号：US10046652B2

    公开(公告)日：2018-08-14

    申请号：US15135721

    申请日：2016-04-22

    申请人： Masaaki Yoshida ,  Hideo Yanagita

    发明人： Masaaki Yoshida ,  Hideo Yanagita

    IPC分类号： H02J7/00 ,  B60L11/18 ,  B60W20/13 ,  B60W50/08

    摘要： A charge control apparatus includes a battery having a first maximum value, a minimum value, and a second maximum value of an output density, in an output characteristic indicating a relationship between a remaining capacity and the output density of the battery, the minimum value being on a lower remaining capacity side than the first maximum value and the second maximum value being on a lower remaining capacity side than the minimum value; and a charge control unit configured to stop charging the battery when a voltage of the battery reaches a charge termination voltage set in a predetermined setting range. The predetermined setting range is from a voltage corresponding to a remaining capacity associated with the first maximum value to a full charge voltage.

    Apparatus with image reading units arranged in zigzag manner for obtaining digital data to generate one-line image data
    23.
    发明授权
    Apparatus with image reading units arranged in zigzag manner for obtaining digital data to generate one-line image data 有权
    具有以锯齿形排列的图像读取单元以获得数字数据以产生单行图像数据的装置

    公开(公告)号：US08243350B2

    公开(公告)日：2012-08-14

    申请号：US12291093

    申请日：2008-11-06

    申请人： Masaaki Yoshida

    发明人： Masaaki Yoshida

    IPC分类号： H04N1/46

    CPC分类号： H04N1/1912 ,  H04N1/1917 ,  H04N1/484

    摘要： In a color reading apparatus for successively reading respective red, green, and blue colors in each line while a document is continuously conveyed to a plurality of line sensor units arranged in a zigzag manner, the line sensor units are arranged with a distance equal to or shorter than a unit of line to prevent a color shift. When read data of the plurality of line sensor units in a conveying direction are to be combined, image data shifted by the number of lines corresponding to distances between the line sensor units in the conveying direction are set as first combination candidates. A color code and a line code are added to each of the data. Image data having the same color code and the same line code are combined. According to the image reading apparatus structured as described above, it is possible to obtain data capable of reproducing read data for each color on the same line without errors.

    摘要翻译： 在将文件连续传送到以Z字形排列的多个线传感器单元的情况下，连续读取各行的红色，绿色，蓝色的彩色读取装置中，线传感器单元的距离等于或等于 短于单位线以防止颜色偏移。 当组合传送方向上的多个行传感器单元的读取数据时，将与传送方向上的行传感器单元之间的距离相对应的行数移位的图像数据设置为第一组合候选。 每个数据都添加一个颜色代码和一行代码。 具有相同颜色代码和相同行代码的图像数据被组合。 根据如上所述构造的图像读取装置，可以获得能够在同一行上再现用于每个颜色的读取数据的数据而无误差的数据。

    Photoresist composition and resist pattern formation method by the use thereof
    26.
    发明授权
    Photoresist composition and resist pattern formation method by the use thereof 失效
    光刻胶组合物和抗蚀剂图案形成方法

    公开(公告)号：US07700257B2

    公开(公告)日：2010-04-20

    申请号：US10547427

    申请日：2004-03-24

    申请人： Toshiyuki Ogata ,  Kotaro Endo ,  Hiromitsu Tsuji ,  Masaaki Yoshida

    发明人： Toshiyuki Ogata ,  Kotaro Endo ,  Hiromitsu Tsuji ,  Masaaki Yoshida

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0046 ,  G03F7/0395 ,  Y10S430/108

    摘要： A photoresist composition containing a polymer (A) containing an alkali-soluble constituent unit (a1) containing an alicyclic group having both a fluorine atom or a fluorinated alkyl group (i) and an alcoholic hydroxyl group (ii), whose alkali-solubility is changeable by an action of an acid; an acid generator (B) which generates an acid by light irradiation; and a dissolution inhibitor (C) having a fluorine atom(s) and/or a nitrogen-containing compound (D) selected from a tertiary amine (d1) having a polar group, a tertiary alkylamine (d2) having 7 or more and 15 or less of carbon atoms or an ammonium salt (d3). The composition has a resist property capable of accomplishing line and space (1:1) of 90 nm or less in good shape as a pattern processing accuracy of a semiconductor integrated circuit by lithography.

    摘要翻译： 1.一种光致抗蚀剂组合物，其含有含有具有氟原子或氟代烷基（i）和醇羟基（ii）的脂环族基团的碱溶性结构单元（a1）的聚合物（A），其碱溶性为 可以通过酸的作用而变化; 通过光照射产生酸的酸产生剂（B）; 和具有氟原子的溶解抑制剂（C）和/或选自具有极性基团的叔胺（d1），具有7以上的叔烷基胺（d2）和15以上的含氮化合物（D） 或更少的碳原子或铵盐（d3）。 该组合物具有能够通过光刻作为半导体集成电路的图案处理精度而实现90nm或更小的线和空间（1：1）的良好形状的抗蚀剂性质。

    REFERENCE VOLTAGE GENERATING CIRCUIT AND POWER SUPPLY DEVICE USING THE SAME
    28.
    发明申请
    REFERENCE VOLTAGE GENERATING CIRCUIT AND POWER SUPPLY DEVICE USING THE SAME 有权
    参考电压发生电路和使用该电路的电源装置

    公开(公告)号：US20090146731A1

    公开(公告)日：2009-06-11

    申请号：US11915440

    申请日：2007-03-20

    申请人： Masaaki Yoshida ,  Hiroaki Nakanishi

    发明人： Masaaki Yoshida ,  Hiroaki Nakanishi

    IPC分类号： G05F1/56

    CPC分类号： H01L27/0883

    摘要： A disclosed reference voltage generating circuit for generating a reference voltage includes MOSFETs connected in series or in parallel. At least one of the MOSFETs includes a control gate and a floating gate that is made hole-rich or discharged by ultraviolet irradiation, and the reference voltage generating circuit is configured to output the difference between threshold voltages of a pair of the MOSFETs as the reference voltage.

    摘要翻译： 公开的用于产生参考电压的参考电压产生电路包括串联或并联连接的MOSFET。 MOSFET中的至少一个包括通过紫外线照射使空穴富集或放电的控制栅极和浮置栅极，并且参考电压产生电路被配置为输出一对MOSFET的阈值电压之间的差作为参考 电压。

    Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern
    30.
    发明授权
    Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern 有权
    用于在液浸光刻工艺中使用的用于形成抗蚀剂保护膜的材料，复合膜和形成抗蚀剂图案的方法

    公开(公告)号：US07371510B2

    公开(公告)日：2008-05-13

    申请号：US11702602

    申请日：2007-02-06

    申请人： Taku Hirayama ,  Ryoichi Takasu ,  Mitsuru Sato ,  Kazumasa Wakiya ,  Masaaki Yoshida ,  Koki Tamura

    发明人： Taku Hirayama ,  Ryoichi Takasu ,  Mitsuru Sato ,  Kazumasa Wakiya ,  Masaaki Yoshida ,  Koki Tamura

    IPC分类号： G03F7/11 ,  G03F7/20 ,  G03F7/207

    CPC分类号： G03F7/2041 ,  G03F7/11

    摘要： Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.

    摘要翻译： 提供一种用于形成抗蚀剂保护膜的材料，其用于液浸光刻工艺，并形成在抗蚀剂膜上，其中该材料具有以下特性：相对于曝光光是透明的; 基本上不与用于液浸光刻的液体相容; 并且不与抗蚀剂膜混合，包含由该材料形成的保护膜和抗蚀剂膜的复合膜以及使用它们形成抗蚀剂图案的方法。 这些可以防止在液浸光刻期间使用的抗蚀剂膜和液体的性质改变，使得可以使用液浸光刻法形成具有高分辨率的抗蚀剂图案。