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    1-4-Dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements
    22.
    发明申请
    1-4-Dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements 有权

    公开(公告)号：US20060154172A1

    公开(公告)日：2006-07-13

    申请号：US10559230

    申请日：2004-06-08

    申请人： Hans-Joachim Timpe ,  Jianbing Huang

    发明人： Hans-Joachim Timpe ,  Jianbing Huang

    IPC分类号： G03C1/76

    CPC分类号： B41M5/465 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  Y10S430/117 ,  Y10S430/121

    摘要： Initiator system comprising: (a) at least one substance capable of absorbing IR radiation, (b) at least one compound capable of forming free radicals, and (c) at least one 1,4-dihydropyridine derivative of the formula (I) wherein R1 is selected from a hydrogen atom, —C(O)OR7, an optionally substituted alkyl group, an optionally substituted aryl group and an optionally substituted aralkyl group, R2 and R3 are independently selected from optionally substituted alkyl groups, optionally substituted aryl groups, CN and a hydrogen atom, R4 and R5 are independently selected from —C(O)OR7, —C(O)R7, —C(O)NR8R9 and CN, or R2 and R4 together form an optionally substituted phenyl ring or a 5- to 7-membered carbocyclic or heterocyclic ring, wherein the unit is present in the carbocyclic or heterocyclic ring adjacent to position 5 of the dihydropyridine ring and wherein the carbocyclic or heterocyclic ring optionally comprises additional substituents, or both R2 and R4 as well as R3 and R5 form either optionally substituted phenyl rings or 5- to 7-membered carbocyclic or heterocyclic rings, wherein the unit is present in the carbocyclic or heterocyclic rings adjacent to positions 3 and 5 of the dihydropyridine ring and wherein the carbocyclic or heterocyclic rings optionally comprise additional substituents, or one of the pairs R2/R4 and R3/R5 forms a 5- to 7-membered carbocyclic or heterocyclic ring, wherein the unit is present in the carbocyclic or heterocyclic ring adjacent to position 5 or 3 of the dihydropyridine ring and wherein the carbocyclic or heterocyclic ring optionally comprises additional substituents and the other pair forms an optionally substituted phenyl ring, or R2 and R4 or R3 and R1 form a 5- to 7-membered heterocyclic ring which can optionally comprise one or more substituents and which, in addition to the nitrogen atom it shares with the 1,4-dihydropyridine ring, optionally comprises additional nitrogen atoms, —NR13 groups, —S— or —O—, R6 is selected from an alkyl group optionally substituted with a halogen atom or a —C(O) group, an optionally substituted aryl group, an optionally substituted aralkyl group, an optionally substituted heterocyclic group and the group Y is an alkylene group or an arylene group, R7 is a hydrogen atom, aryl group, aralkyl group or alkyl group, wherein the alkyl group and the alkyl unit of the aralkyl group optionally comprise one or more C—C double and/or C—C triple bonds, and R8 and R9 are independently selected from a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group and an optionally substituted aralkyl group.

    Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon
    23.
    发明申请
    Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon 审中-公开
    包含1,4-二氢吡啶敏化剂的辐射敏感组合物和基于其的可成像元件

    公开(公告)号：US20060154169A1

    公开(公告)日：2006-07-13

    申请号：US10559231

    申请日：2004-06-08

    申请人： Hans-Joachim Timpe

    发明人： Hans-Joachim Timpe

    IPC分类号： G03C5/18

    CPC分类号： G03F7/031

    摘要： Radiation-sensitive composition comprising: (a) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from hexaarylbiimidazoles; and (d) optionally one or more components selected from alkali-soluble binders, dyes, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors, characterized in that the at least one sensitizer is a 1,4-dihydropyridine derivative of the formula (I) which does not contain any nitro groups bonded to an aromatic ring.

    摘要翻译： 辐射敏感性组合物，其包含：（a）一种或多种类型的单体和/或低聚物和/或聚合物，每种包含至少一种能够进行自由基聚合的烯属不饱和基团，（b）至少一种敏化剂，（c ）至少一种能够与敏化剂（b）一起形成自由基并选自六芳基联咪唑的共引发剂; 染料，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂中的任一种或多种组分，其特征在于，所述至少一种敏化剂是1， 式（I）的4-二氢吡啶衍生物，其不包含与芳环键合的任何硝基。

    Thermal initiator system using leuco dyes and polyhalogene compounds
    24.
    发明授权
    Thermal initiator system using leuco dyes and polyhalogene compounds 失效
    使用无色染料和多卤素化合物的热引发剂体系

    公开(公告)号：US06864040B2

    公开(公告)日：2005-03-08

    申请号：US09832989

    申请日：2001-04-11

    申请人： Ursula Müller ,  Tobias Wittig ,  Hans-Joachim Timpe

    发明人： Ursula Müller ,  Tobias Wittig ,  Hans-Joachim Timpe

    IPC分类号： G03F7/004 ,  B41C1/10 ,  B41M5/40 ,  B41M5/46 ,  B41N1/14 ,  C08F2/48 ,  C08F4/00 ,  G03F7/00 ,  G03F7/029 ,  G03F7/038 ,  G03F7/11 ,  G03F7/031

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/465 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/118 ,  Y10S430/119 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/126 ,  Y10S430/127 ,  Y10S430/145 ,  Y10S430/146

    摘要： The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, —COOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, —CH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of —CH2COOH, —CH2OH and —(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, R6, R7 and R8 comprises a —COOH group or salts thereof, and (d) at least one leuco dye, wherein the following inequation is met: oxa

    摘要翻译： 本发明涉及含有引发剂体系的IR敏感组合物，其包含：（a）至少一种能够吸收选自三芳基胺染料，噻唑鎓染料，吲哚鎓染料，恶唑鎓染料，花青染料，聚苯胺染料，聚吡咯染料， 聚噻吩染料和酞菁颜料（b）至少一种能够产生选自多卤烷基取代的化合物的基团的化合物（c）至少一种由下式I表示的多元羧酸，其中Y选自O，S和NR R 4，R 5和R 6各自独立地选自氢，C 1 -C 4烷基，任选被取代的芳基，-COOH和NR 8 CH 2 COOH，R R 7选自氢，C 1 -C 6烷基，-CH 2 CH 2 OH和被-COOH取代的C 1 -C 5烷基，R 8选自-CH 2 COOH，-CH 2 OH和 - （CH 2 ）2N（CH 2 COOH）2，r为0,1,2或3，条件是 R 4，R 5，R 6，R 7和R 8中的至少一个包含-COOH基团或其盐，和（d）至少一种无色染料，其中以下不等式为 满足：oxa =组分（a）在eV中的氧化电位redb =组分（b）在eV中的还原电位。这些组合物特别适用于制造印刷版。

    On-press developable IR sensitive printing plates
    25.
    发明授权
    On-press developable IR sensitive printing plates 失效
    印刷机可印刷的IR感光印版

    公开(公告)号：US06846614B2

    公开(公告)日：2005-01-25

    申请号：US10066874

    申请日：2002-02-04

    申请人： Hans-Joachim Timpe ,  Friederike Von Gyldenfeldt

    发明人： Hans-Joachim Timpe ,  Friederike Von Gyldenfeldt

    IPC分类号： G03F7/004 ,  B41C1/10 ,  B41M5/36 ,  B41N1/14 ,  G03F7/00 ,  G03F7/029 ,  G03F7/032 ,  G03F7/11 ,  G03F7/038

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

    摘要： The present invention relates to IR-sensitive compositions suitable for the manufacture of printing plates developable on-press. The IR-sensitive compositions comprise a first polymeric binder which does not comprise acidic groups having a pKa value≦8; a second polymeric binder comprising polyether groups; an initiator system; and a free radical polymerizable system comprising at least one member selected from unsaturated free radical polymerizable monomers, free radical polymerizable oligomers and polymers containing C═C bonds in the back bone and/or in the side chain groups. The initiator system includes (i) at least one compound capable of absorbing IR radiation; (ii) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds; and (iii) at least one polycarboxylic acid of formula R4—(CR5R6)r—Y—CH2COOH, wherein oxi

    摘要翻译： 本发明涉及适于制造可印刷印刷机的印版的IR敏感组合物。 IR敏感组合物包含不包含pKa值<= 8的酸性基团的第一聚合物粘合剂; 包含聚醚基团的第二聚合物粘合剂; 发起者系统; 和包含选自不饱和自由基可聚合单体，可自由基聚合的低聚物和在后骨和/或侧链基团中含有C = C键的聚合物中的至少一种的自由基可聚合体系。 引发剂体系包括（i）至少一种能够吸收IR辐射的化合物; （ii）至少一种能够产生选自多卤烷基取代的化合物的基团的化合物; 和（iii）至少一种式R 4 - （CR 5 R 6）r Y-CH 2 COOH的多元羧酸，其中oxi

    Method of processing lithographic printing plate precursors
    26.
    发明授权
    Method of processing lithographic printing plate precursors 失效
    平版印刷版前体的处理方法

    公开(公告)号：US06649319B2

    公开(公告)日：2003-11-18

    申请号：US09878457

    申请日：2001-06-11

    申请人： Ulrich Fiebag ,  Hans-Joachim Timpe ,  Uwe Todock ,  Anfreas Vihs

    发明人： Ulrich Fiebag ,  Hans-Joachim Timpe ,  Uwe Todock ,  Anfreas Vihs

    IPC分类号： G03F7021

    CPC分类号： G03F7/322 ,  B41N3/08

    摘要： A method of processing imageable elements useful as alkaline-developable lithographic printing plate precursors that does not require either a rinsing step or a further gumming step is disclosed. The method comprises simultaneously developing and gumming the imaged element with an aqueous alkaline developing-gumming solution comprising one or more water-soluble polyhydroxy compounds of the following structure: R1(CHOH)nR2 in which n is 4 to 7; and either (i) R1 is hydrogen, aryl, or CH2OH; and R2 is hydrogen, alkyl group having 1 to 4 carbon atoms, CH2OR3 in which R3 is hydrogen or an alkyl group having 1 to 4 carbon atoms, CH2N(R4R5) in which R4 and R5 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, or CO2H, or (ii) R1 and R2 together form a carbon—carbon single bond.

    摘要翻译： 公开了一种可用作碱性显影平版印刷版前体的可成像元件的方法，该前体不需要漂洗步骤或进一步的上胶步骤。 该方法包括用包含一种或多种以下结构的水溶性多羟基化合物的含水碱性显影胶溶液同时显影和涂胶成像元件：其中n为4至7; 并且（i）R 1是氢，芳基或CH 2 OH; 和R 2是氢，具有1至4个碳原子的烷基，CH 2 OR 3，其中R 3是氢或具有1至4个碳原子的烷基，CH 2 N（R 4 R 5） R 4和R 5各自独立地为氢或具有1至4个碳原子的烷基或CO 2 H，或（ii）R 1和R 2一起形成碳 - 碳单键。

    Polyvinyl acetals having azido groups and use thereof in radiation-sensitive compositions
    27.
    发明授权
    Polyvinyl acetals having azido groups and use thereof in radiation-sensitive compositions 失效
    具有叠氮基的聚乙烯醇缩醛及其在辐射敏感组合物中的应用

    公开(公告)号：US06596460B2

    公开(公告)日：2003-07-22

    申请号：US09751183

    申请日：2000-12-29

    申请人： Hans-Joachim Timpe ,  Ursula Müller

    发明人： Hans-Joachim Timpe ,  Ursula Müller

    IPC分类号： G03C173

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/145

    摘要： A copolymer useful in radiation sensitive compositions for lithographic printing plates comprises the units A, B, C and D, wherein A is present in an amount of 0.5 to 30 wt.-% and is of the formula wherein R is hydrogen, C1-C4 alkyl, —CH═COOH or B is present in an amount of 5 to 35 wt.-% and is of the formula C is present in an amount of 10 to 55 wt. % and is of the formula wherein R1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halogen atoms, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group Z—NR2—CO—Y—COOH, wherein Z is an aliphatic, aromatic or araliphatic spacer group, R2 is hydrogen or an aliphatic, aromatic or an araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and unit C may have one or more occurrences in the copolymer with various moieties R1 independent of one another; and D is present in an amount of 10 to 40 wt.-% and is of the formula wherein X is C1-C6 alkylene, a 5 or 6 membered saturated carbocyclic moiety optionally substituted with one or more substituents selected from the group consisting of C1-C4 alkyl, C1-C4 alkoxy or halogen, a 5 or 6 membered saturated heterocyclic moiety which comprises in the nucleus one or more heteroatoms selected from oxygen, nitrogen and sulfur, or a group of the formula I wherein n is an integer from 0 to 4 and each R3 is independently selected from the group consisting of C1-C4 alkyl, halogen or C1-C4 alkoxy.

    摘要翻译： 可用于平版印刷版的辐射敏感组合物中的共聚物包括单元A，B，C和D，其中A以0.5至30重量％的量存在，并且其中R为氢，C 1 -C 4烷基 ，-CH = COOH或B以5〜35重量％的量存在，并且式C的存在量为10〜55重量％。 ％，并且是其中R 1是具有至多4个碳的烷基，其任选被酸基或与其连接的酸基的苯基取代，其中苯基任选地包含1至2个另外的取代基 或卤素原子，氨基，甲氧基，乙氧基，甲基和乙基，或为Z-NR2-CO-Y-COOH基团，其中Z为脂族，芳族或芳脂族间隔基，R2为氢或脂族，芳族或 芳脂族部分，Y是饱和或不饱和的链或环形间隔基，并且单元C可以在共聚物中具有一个或多个不同部分R1彼此独立地出现; 并且D以10至40重量％的量存在，并且其为X为C 1 -C 6亚烷基的5或6元饱和碳环部分，其任选被一个或多个选自以下的取代基取代：C 1 -C 4 烷基，C 1 -C 4烷氧基或卤素，5或6元饱和杂环部分，其在核中包含一个或多个选自氧，氮和硫的杂原子，或式I的基团，其中n为0至4的整数， 每个R 3独立地选自C 1 -C 4烷基，卤素或C 1 -C 4烷氧基。

    Process for Production of Lithographic Printing Plates
    29.
    发明申请
    Process for Production of Lithographic Printing Plates 审中-公开

    公开(公告)号：US20080145790A1

    公开(公告)日：2008-06-19

    申请号：US11815578

    申请日：2006-02-01

    申请人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    IPC分类号： G03F7/12

    CPC分类号： G03F7/322

    摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.

    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers
    30.
    发明申请
    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers 有权

    公开(公告)号：US20070148583A1

    公开(公告)日：2007-06-28

    申请号：US10586509

    申请日：2005-01-19

    申请人： Hans-Joachim Timpe ,  Ursula Muller

    发明人： Hans-Joachim Timpe ,  Ursula Muller

    IPC分类号： G03C1/00

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/122 ,  Y10S430/145

    摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.