公开(公告)号：US20070242248A1

公开(公告)日：2007-10-18

申请号：US11808349

申请日：2007-06-08

申请人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

发明人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/168 ,  G03F7/2041

摘要： A device manufacturing method includes applying, in a lithographic apparatus, a prewetting liquid on top of a layer of radiation sensitive material of a substrate, on a substrate table, or on both; providing an immersion liquid for use in projecting a patterned beam of radiation on the prewet substrate and/or substrate table; and projecting a patterned beam of radiation, through the immersion liquid, onto the substrate and/or the substrate table.

摘要翻译： 一种器件制造方法包括在光刻设备中将预润湿液体涂覆在衬底的辐射敏感材料层上，衬底台上或两者上; 提供用于将图案化的辐射束投影在预润湿衬底和/或衬底台上的浸没液体; 并且将经过浸没液体的图案化的辐射束投射到衬底和/或衬底台上。

公开(公告)号：US20070188732A1

公开(公告)日：2007-08-16

申请号：US11659280

申请日：2005-08-02

申请人： Yuichi Shibazaki ,  Masahiko Okumura ,  Yasuhiro Hidaka

发明人： Yuichi Shibazaki ,  Masahiko Okumura ,  Yasuhiro Hidaka

IPC分类号： G03B27/58

CPC分类号： G03F7/70775

摘要： The position of a movable stage is detected without increasing cost or the size of apparatus. An apparatus comprises movable stages (WST, MST) that move along a plane of motion (12a); and a position-detection apparatus that detects the positions of the movable stages (WST, MST) with beams (B1 to B3). The apparatus further comprises driving apparatuses (82, 84) that drives the movable stages (WST, MST); follow-up optical members (30 to 33) which are provided on the driving apparatuses (81, 84) and cause the beams (B1 to B3) to follow the movable stages (WST, MST) as the movable stages (WST, MST) move; and first optical members (34 to 39) which are provided on the movable stages (WST, MST) and are optically coupled with the follow-up optical members (30 to 33).

摘要翻译： 检测可移动台的位置，而不增加装置的成本或尺寸。 一种装置包括沿着运动平面（12a）移动的可动台（WST，MST）; 以及利用光束（B 1〜B 3）检测可动台（WST，MST）的位置的位置检测装置。 该装置还包括驱动可移动级（WST，MST）的驱动装置（82,84）。 设置在驱动装置（81,84）上的随动光学构件（30〜33），并使梁（B 1〜B 3）作为可动台（WST， MST）移动; 和第一光学构件（34至39），其设置在可移动台（WST，MST）上并且与后续光学构件（30至33）光学耦合。

公开(公告)号：US6122036A

公开(公告)日：2000-09-19

申请号：US206238

申请日：1998-12-07

申请人： Shigeru Yamasaki ,  Masahiko Okumura

发明人： Shigeru Yamasaki ,  Masahiko Okumura

IPC分类号： G03B27/42 ,  G03F7/20 ,  G03F9/00 ,  G03B27/54

CPC分类号： G03F7/70691 ,  G03B27/42 ,  G03F7/70358 ,  G03F9/7034

摘要： In a projection exposure apparatus and method in which a substrate is exposed with a projected image of a mask through a projection optical system, a table which is movable in a direction of an optical axis of the projection optical system in arranged at an image side of the projection optical system to hold the substrate. A tilt amount of the table is monitored, and position information of a mark on the table is detected, which changes in accordance with the tilt of the table. Information on the relationship between a displacement amount of the substrate and a plane perpendicular to the optical axis and the tilt angle of the substrate is obtained, based on the monitored tilt amount and the position information of the mark.

摘要翻译： 在通过投影光学系统以掩模的投影图像曝光基板的投影曝光装置和方法中，可以在投影光学系统的光轴的方向上移动的工作台，该工作台布置在投影光学系统的图像侧 投影光学系统保持基板。 监视表的倾斜量，并检测表上的标记的位置信息，其根据表的倾斜而改变。 基于所监视的倾斜量和标记的位置信息，获得关于基板的位移量和垂直于光轴的平面与基板的倾斜角之间的关系的信息。

公开(公告)号：US08136472B2

公开(公告)日：2012-03-20

申请号：US12770108

申请日：2010-04-29

申请人： Junji Yamauchi ,  Yasuhito Hanaki ,  Kuniharu Iwamoto ,  Toshiaki Matsuno ,  Masahiko Okumura ,  Henry J. Kelm

发明人： Junji Yamauchi ,  Yasuhito Hanaki ,  Kuniharu Iwamoto ,  Toshiaki Matsuno ,  Masahiko Okumura ,  Henry J. Kelm

IPC分类号： G01L19/12 ,  G01L7/16 ,  F17C13/02

CPC分类号： G01F22/02 ,  G01F23/161 ,  G01L19/08 ,  Y10S116/07

摘要： An indicator includes a case mountable in a gas filling passage of a pressure container; a valve element which is urged toward one side of the case connectable to the pressure container, the valve element being movable in the case to a position balanced with gas pressure in the pressure container; a seal member for ensuring gas tightness between the valve element and the case; and an indicating member slidable relative to the case between a position protruding outside the case and a position not protruding. The spring force and a gas pressure force may be equally balanced at first and second balanced positions of the valve element.

摘要翻译： 指示器包括可安装在压力容器的气体填充通道中的壳体; 阀元件，其被推向与壳体连接的壳体的一侧，阀元件可在壳体中移动到与压力容器中的气体压力平衡的位置; 用于确保阀元件和壳体之间的气密性的密封构件; 以及指示构件，其能够相对于所述壳体在突出到所述壳体外部的位置与未突出的位置之间滑动。 在阀元件的第一和第二平衡位置处，弹簧力和气体压力力可以相等地平衡。

公开(公告)号：US20110222037A1

公开(公告)日：2011-09-15

申请号：US11517397

申请日：2006-09-08

申请人： Tohru Kiuchi ,  Takeyuki Mizutani ,  Masahiro Nei ,  Masato Hamatani ,  Masahiko Okumura

发明人： Tohru Kiuchi ,  Takeyuki Mizutani ,  Masahiro Nei ,  Masato Hamatani ,  Masahiko Okumura

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70733

摘要： An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.

摘要翻译： 曝光装置包括液浸系统，第一推动器和规定构件。 曝光装置经由光学部件和液体露出基板。 液浸系统进行液体的供给和回收。 第一移动器可以在第一区域中移动，并且可以在其与光学构件之间保持液体。 当第一移动器从与光学构件相对的位置退出时，规定构件从第一移动体移除，并且能够将液体保持在其与光学构件之间。

公开(公告)号：US20080291464A1

公开(公告)日：2008-11-27

申请号：US12042253

申请日：2008-03-04

申请人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G01B11/14

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

摘要： Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

摘要翻译： 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US06400445B2

公开(公告)日：2002-06-04

申请号：US09801792

申请日：2001-03-09

申请人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

发明人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G03F9/7011 ,  G03F9/7046

摘要： A method and apparatus for positioning a wafer with respect to a reticle in a projection exposure apparatus for a photolithographic process capable of high speed search alignment of a wafer without any limitation imposed on the arrangement of the search marks on the wafer. For the first wafer in one lit, a first alignment sensor system is used to detect the positions of first and second search marks, and define a coordinate system with reference to the positions of the search marks based on the detection results. Then, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by a second alignment sensor system and stored. For any of the second and later wafers in the lot, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by the second alignment sensor system, and the offsets between the detected position and the stored position are used to define a coordinate system which refers to the search marks.

摘要翻译： 一种用于在用于光刻工艺的投影曝光装置中相对于掩模版定位晶片的方法和装置，其能够对晶片进行高速搜索对准，而不会对晶片上的搜索标记的布置施加任何限制。 对于一个点亮的第一个晶片，使用第一对准传感器系统来检测第一和第二搜索标记的位置，并且基于检测结果来定义参考搜索标记的位置的坐标系。 然后，当第一对准传感器系统检测到第一搜索标记时，通过第二对准传感器系统检测街道的位置并存储。 对于批次中的任何第二和稍后的晶片，当第一对准传感器系统检测到第一搜索标记时，由第二对准传感器系统检测街道的位置，并且检测到的位置与 存储的位置用于定义参考搜索标记的坐标系。

公开(公告)号：US06225012B1

公开(公告)日：2001-05-01

申请号：US09500244

申请日：2000-02-08

申请人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

发明人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

IPC分类号： G03F900

CPC分类号： G03F7/70691 ,  G03F9/7011 ,  G03F9/7046

摘要： A method for positioning a wafer with respect to a reticle in a projection exposure apparatus for a photolithographic process capable of high speed search alignment of a wafer without any limitation imposed on the arrangement of the search marks on the wafer. For the first wafer in one lot, a first alignment sensor system is used to detect the positions of first and second search marks, and define a coordinate system with reference to the positions of the search marks based on the detection results. Then, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by a second alignment sensor system and stored. For any of the second and later wafers in the lot, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by the second alignment sensor system, and the offsets between the detected position and the stored position are used to define a coordinate system which refers to the search marks.

摘要翻译： 一种用于在用于光刻工艺的投影曝光装置中相对于掩模版定位晶片的方法，该方法能够对晶片进行高速搜索对准，而不会对晶片上的搜索标记的布置施加任何限制。 对于一批中的第一个晶片，使用第一对准传感器系统来检测第一和第二搜索标记的位置，并且基于检测结果来定义参考搜索标记的位置的坐标系。 然后，当第一对准传感器系统检测到第一搜索标记时，通过第二对准传感器系统检测街道的位置并存储。 对于批次中的任何第二和稍后的晶片，当第一对准传感器系统检测到第一搜索标记时，由第二对准传感器系统检测街道的位置，并且检测到的位置与 存储的位置用于定义参考搜索标记的坐标系。

公开(公告)号：US5654553A

公开(公告)日：1997-08-05

申请号：US630852

申请日：1996-04-11

申请人： Masaharu Kawakubo ,  Masahiko Okumura

发明人： Masaharu Kawakubo ,  Masahiko Okumura

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01N21/86 ,  G11B7/00 ,  G11B11/03 ,  G03B27/53

CPC分类号： G03F7/70066 ,  G03F7/70241 ,  G03F9/70

摘要： A projection exposure apparatus according to the present invention comprises a projection optical system for projecting a pattern of a mask onto each of exposure areas on a photosensitive substrate, and a mark detection system of off-axis type spaced apart from the projection optical system by a predetermined distance. According to one aspect of the present invention, the projection exposure apparatus includes a calculating means for determining an offset amount of an imaging position of the projection optical system and an offset amount of a best focus position of the mark detection system of off-axis type on the basis of the amount of change of an environmental condition to which the projection optical system and the mark detection system are subjected. The detection of a positioning mark on the substrate is performed after a surface of the substrate at a position of the mark detection system is aligned with the best focus position, in consideration of the offset amounts. According to another aspect of the present invention, the projection exposure apparatus includes an inclination amount measuring means for determining an inclination amount of the surface of the substrate. The detection of the positioning mark on the substrate is performed after the inclination is eliminated or after the surface of the substrate at the position of the mark detection system is aligned with the best focus position in consideration of the inclination amount.

摘要翻译： 根据本发明的投影曝光装置包括：投影光学系统，用于将光敏图案的图案投影到感光基板上的每个曝光区域;以及偏离轴类型的标记检测系统，其与投影光学系统间隔开 预定距离。 根据本发明的一个方面，投影曝光装置包括：计算装置，用于确定投影光学系统的成像位置的偏移量和离轴型的标记检测系统的最佳聚焦位置的偏移量 基于投影光学系统和标记检测系统所经受的环境条件的变化量。 考虑到偏移量，在标记检测系统的位置处的基板的表面与最佳聚焦位置对准之后，执行基板上的定位标记的检测。 根据本发明的另一方面，投影曝光装置包括用于确定基板的表面的倾斜量的倾斜量测量装置。 在消除了倾斜之后或在标记检测系统的位置处的基板的表面考虑到倾斜量与最佳聚焦位置对准之后，执行基板上的定位标记的检测。