公开(公告)号：US06862095B2

公开(公告)日：2005-03-01

申请号：US10235648

申请日：2002-09-06

申请人： Masahiro Horie

发明人： Masahiro Horie

IPC分类号： G01N21/27 ,  G01N21/21 ,  G01N21/33 ,  G01N21/35 ,  G01N21/3563 ,  G01N21/41 ,  G01N21/84 ,  H01L21/02 ,  H01L21/66 ,  G01N21/55

CPC分类号： G01N21/211 ,  G01N21/8422

摘要： In a dielectric constant measuring apparatus provided are a light source for irradiating a substrate with light in a visible or near-ultraviolet wavelength range, a spectroscope for receiving reflected light from the substrate, and a first optical characteristic acquiring unit for acquiring the spectral reflectance of the substrate. Further are provided therein a light source for irradiating the substrate with light in an infrared wavelength range, a spectroscope for receiving transmission light from the substrate, and a second optical characteristic acquiring unit for acquiring the spectral transmittance of the substrate. The dielectric constant of a dielectric film on the substrate is obtained by a first parameter set calculation unit, a second parameter set calculation unit and a dielectric constant calculation unit, using the spectral reflectance and spectral transmittance of the substrate. It is thereby possible to achieve a noncontact measurement of the dielectric constant of the dielectric film on the substrate.

摘要翻译： 所提供的介电常数测量装置是用于用可见光或近紫外线波长范围的光照射基板的光源，用于接收来自基板的反射光的分光镜，以及第一光学特性获取单元，用于获取 底物。 此外还设置有用于用红外线波长范围的光照射基板的光源，用于接收来自基板的透射光的分光器，以及用于获取基板的光谱透射率的第二光学特性获取单元。 通过使用基板的光谱反射率和光谱透射率的第一参数组计算单元，第二参数组计算单元和介电常数计算单元来获得基板上的电介质膜的介电常数。 由此，能够实现基板上的电介质膜的介电常数的非接触式的测量。

公开(公告)号：US20090119596A1

公开(公告)日：2009-05-07

申请号：US12092633

申请日：2006-11-10

申请人： Yuji Iwahara ,  Masahiro Horie

发明人： Yuji Iwahara ,  Masahiro Horie

IPC分类号： G06F3/048

CPC分类号： H04N9/8205 ,  G11B27/105 ,  G11B27/329 ,  G11B27/34 ,  H04N5/765 ,  H04N5/772 ,  H04N5/781 ,  H04N5/85 ,  H04N5/907 ,  H04N9/8047

摘要： A viewer apparatus displays, on a display screen, a slideshow of still image data recorded on a recording medium. The viewer apparatus includes a layout determination unit 3 for allocating a display area, on the display screen, to each display-level folder located directly under a target folder, the target folder being any of folders in a hierarchical tree on the recording medium, a slideshow list generation unit 5 for selecting, as a slideshow target, still image data that belongs to one of (i) the display-level folder and (ii) a subordinate folder located below the display-level folder and a slideshow control unit 8 for executing a plurality of slideshows for the selected still image data in the display areas allocated to each of the display-level folders located above each of the still image data.

摘要翻译： 观看器装置在显示屏幕上显示记录在记录介质上的静止图像数据的幻灯片。 观看者装置包括布局确定单元3，用于在显示屏幕上将显示区域分配给位于目标文件夹正下方的每个显示级文件夹，目标文件夹是记录介质上分层树中的文件夹中的任一个， 幻灯片列表生成单元5，用于选择属于（i）显示级文件夹和（ii）位于显示级文件夹下方的下级文件夹之一的静止图像数据作为幻灯片放映目标，以及幻灯片放映控制单元8，用于 在分配给位于每个静止图像数据上方的每个显示级文件夹的显示区域中执行用于所选择的静止图像数据的多个幻灯片。

公开(公告)号：US20090059228A1

公开(公告)日：2009-03-05

申请号：US12196463

申请日：2008-08-22

申请人： Masahiro Horie ,  Kumiko Fukue

发明人： Masahiro Horie ,  Kumiko Fukue

IPC分类号： G01J4/04

CPC分类号： G01J3/447 ,  G01J3/4412

摘要： In a spectroscopic ellipsometer, light emitted from a light source enters a measurement surface of a substrate through an optical system in a lighting part so as to incline to the measurement surface to be directed to a light receiving device, and ellipsometry is performed based on spectral intensity of reflected light reflected on the measurement surface, the spectral intensity being acquired by the light receiving device. In focusing of the spectroscopic ellipsometer, a focus position of the measurement surface is obtained based on a total light amount in a predetermined wavelength band of the reflected light, the total light amount being obtained by the light receiving device. In the spectroscopic ellipsometer, since the optical system for ellipsometry and the optical system for focusing are common, it is possible to eliminate influences of change of the optical systems by temperature change or the like and to achieve high accurate focusing.

摘要翻译： 在光谱椭偏仪中，从光源发出的光通过照明部中的光学系统进入基板的测量面，从而向测量面倾斜而被引导到光接收装置，并且基于光谱进行椭偏仪 在测量表面反射的反射光的强度，由光接收装置获取的光谱强度。 在分光椭偏仪的聚焦中，基于反射光的预定波长带中的总光量，由光接收装置获得的总光量，获得测量表面的聚焦位置。 在分光椭偏仪中，由于用于椭偏仪的光学系统和用于聚焦的光学系统是常见的，因此可以通过温度变化等来消除光学系统的变化的影响，并且实现高精度的聚焦。

公开(公告)号：US20080243412A1

公开(公告)日：2008-10-02

申请号：US12076886

申请日：2008-03-25

申请人： Masahiro Horie ,  Yoshiharu Itano

发明人： Masahiro Horie ,  Yoshiharu Itano

IPC分类号： G06F19/00

CPC分类号： G01N21/9501

摘要： In a defect inspection apparatus, a first lighting part applies polarized light to an inspection region on a substrate, reflected light reflected on the inspection region is received by a first spectrometer in a first light receiving part, and a phase difference spectrum representing a reflection property of the reflected light is transmitted to an inspection part of a control part. In the control part, an inspection wavelength and a threshold value determined based on theoretical calculation according to a type of defects to be detected are stored in a memory in advance, and a group of defects in a plurality of recessed portions formed in the inspection region are detected based on the threshold value and a phase difference in an inspection wavelength obtained from the phase difference spectrum. Thus, it is possible to detect a defect in a small recessed portion on the substrate with high accuracy.

摘要翻译： 在缺陷检查装置中，第一照明部将偏振光施加到基板上的检查区域，检查区域反射的反射光被第一受光部中的第一光谱仪接收，表示反射特性的相位差光谱 的反射光被传送到控制部的检查部。 在控制部中，将检测波长和基于要检测的缺陷的类型的理论计算确定的阈值预先存储在存储器中，并且形成在检查区域中的多个凹部中的一组缺陷 基于从相位差光谱获得的检查波长的阈值和相位差来检测。 因此，可以高精度地检测基板上的小凹部的缺陷。

公开(公告)号：US07095498B2

公开(公告)日：2006-08-22

申请号：US10791780

申请日：2004-03-04

申请人： Masahiro Horie

发明人： Masahiro Horie

IPC分类号： G01J4/00

CPC分类号： G01N21/211 ,  G01N2021/213

摘要： In a spectroscopic ellipsometer (1), a lighting part (3) comprises a light source part for measurement (measurement light source) (31) and a polarizer (32), and the polarizer (32) obtains polarized light from light outputted from the measurement light source (31) and guides the polarized light to a substrate (9). A light receiving part (4) comprises an analyzer (41) on which reflected light which is the polarized light reflected on the substrate 9 is incident and a spectroscope (42), and the reflected light through the analyzer (41) enters the spectroscope (42), where a polarization state at each wavelength is acquired. The spectroscopic ellipsometer (1) has a construction in which mirrors are disposed only between the measurement light source (31) and the polarizer (32) and between the analyzer (41) and the spectroscope (42). In the spectroscopic ellipsometer (1), with this construction, the polarization state of the polarized light or its reflected light is not changed by mirrors and it is therefore possible to achieve measurements with high accuracy.

摘要翻译： 在分光椭偏仪（1）中，发光部（3）包括测量用光源部（测定光源）（31）和偏振片（32），偏光板（32） 测量光源（31）并将偏振光引导到衬底（9）。 光接收部分（4）包括分析器（41），反射在基板9上的偏振光入射的反射光和分光镜（42），并且通过分析器（41）的反射光进入分光器 42），其中获取每个波长的偏振状态。 光谱椭偏仪（1）具有仅在测量光源（31）和偏振器（32）之间以及分析器（41）和分光器（42）之间设置反射镜的结构。 在分光椭圆偏振仪（1）中，通过这种结构，偏振光或其反射光的偏振状态不会被反射镜改变，因此可以以高精度实现测量。

公开(公告)号：US06937333B2

公开(公告)日：2005-08-30

申请号：US10652071

申请日：2003-09-02

申请人： Masahiro Horie ,  Hideki Hayashi ,  Fujikazu Kitamura ,  Kumiko Akashika

发明人： Masahiro Horie ,  Hideki Hayashi ,  Fujikazu Kitamura ,  Kumiko Akashika

IPC分类号： G01B11/06 ,  G01B11/16 ,  G01N21/21 ,  G01N21/27 ,  G01N21/45 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01J4/00

CPC分类号： G01N21/211 ,  G01B11/168 ,  G01N21/9501

摘要： A film thickness measurement apparatus (1) comprises an ellipsometer (3) for acquiring a polarization state of a film on a substrate (9) and a light interference unit (4) for acquiring spectral intensity of the film on the substrate (9). In an optical system (45) of the light interference unit (4), a light shielding pattern (453a) is disposed in an aperture stop part (453), and an illumination light from a light source (41) is emitted to the substrate (9) through the optical system (45). A reflected light from the substrate (9) is guided to a light shielding pattern imaging part (43), where an image of the light shielding pattern (453a) is acquired. When the ellipsometer (3) performs a film thickness measurement, a tilt angle of the substrate (9) is obtained on the basis of the image of the light shielding pattern (453a) and a light receiving unit (32) acquires a polarization state of the reflected light. An calculation part (51) obtains a thickness of a film with high precision from the polarization state of the reflected light by using the obtained tilt angle.

摘要翻译： 膜厚测量装置（1）包括用于获取基板（9）上的胶片的偏振态的椭圆偏振仪（3）和用于获取基板（9）上的胶片的光谱强度的光干涉单元（4）。 在光干涉单元（4）的光学系统（45）中，在孔径光阑部（453）中设置有遮光图案（453a），将来自光源（41）的照明光发射到 基板（9）通过光学系统（45）。 来自基板（9）的反射光被引导到获取了遮光图案（453a）的图像的遮光图案成像部（43）。 当椭圆光度计（3）进行膜厚测量时，基于遮光图案（453a）的图像获得基板（9）的倾斜角，并且光接收单元（32）获取偏振状态 的反射光。 计算部件（51）通过使用所获得的倾斜角度从反射光的偏振状态获得高精度的胶片的厚度。

公开(公告)号：US20050178947A1

公开(公告)日：2005-08-18

申请号：US10512846

申请日：2004-05-10

申请人： Kouji Sasaki ,  Hidenori Tatsumi ,  Masahiro Horie ,  Masaaki Morioka

发明人： Kouji Sasaki ,  Hidenori Tatsumi ,  Masahiro Horie ,  Masaaki Morioka

IPC分类号： H04N1/00 ,  H04N1/21 ,  H04N1/32 ,  H01L27/00

CPC分类号： H04N1/00326 ,  H04N1/00127 ,  H04N1/00204 ,  H04N1/2112 ,  H04N1/32117 ,  H04N2201/0053 ,  H04N2201/0055 ,  H04N2201/3205 ,  H04N2201/3273 ,  H04N2201/3278

摘要： In an object identification system, phototransmitters 100 which are assigned to at least one object send out invisible light having rectilinearity. A control device 200, which is placed near an object, instructs the phototransmitter 100 that is assigned to an object selected by a user to transmit information for uniquely identifying an object or an imaging device. In response to this instruction, the phototransmitter 100 sends out invisible light having first information superposed thereon. An imaging device 300 to be carried around by the user includes, in order to take in an image: a storage section for storing second information for uniquely identifying the object selected by the user or the imaging device itself; a photoreceiving section for receiving invisible light which is sent out from the phototransmitter 100 and extracting first information superposed on the received light; a determination section for determining whether or not to take in an image based on the first information which is sent from the photoreceiving section and the second information which is stored in the storage section; and a photoreceiving device. The imaging device 300 further includes: an image input section for taking in an image representing the surroundings of an object to which a phototransmitter that is currently sending out invisible light is assigned if the determination section has determined to take in an image; and a displaying section for displaying the image representing the surroundings of the object which has been taken in by the image input section. The image input section incorporates a photoreceiving device which has a sensitive range including the wavelength of the invisible light, so that the displaying section can display the object and the light emission by the phototransmitter which is assigned to the object.

摘要翻译： 在对象识别系统中，分配给至少一个对象的光发送器100发出具有直线性的不可见光。 放置在物体附近的控制装置200指示被分配给用户选择的对象的光发送器100发送用于唯一地识别对象或成像装置的信息。 响应于该指令，光发送器100发出其上叠加有第一信息的不可见光。 由用户携带的成像装置300包括为了拍摄图像：存储部分，用于存储用于唯一地识别用户选择的对象或成像装置本身的第二信息; 用于接收从光发射器100发出的不可见光的光接收部分，并且提取叠加在接收光上的第一信息; 确定部分，用于基于从光接收部分发送的第一信息和存储在存储部分中的第二信息来确定是否接收图像; 和光接收装置。 成像装置300还包括：图像输入部，用于拍摄表示当前发送不可见光的光发送器的对象的周围的图像，如果判定部已经确定拍摄图像，则分配图像; 以及显示部分，用于显示表示由图像输入部分拍摄的对象的周围的图像。 图像输入部分包括具有包括不可见光的波长的敏感范围的光接收装置，使得显示部分可以通过被分配给对象的光发送器显示对象和发光。

公开(公告)号：US20050006560A1

公开(公告)日：2005-01-13

申请号：US10884973

申请日：2004-07-07

申请人： Masahiro Horie ,  Hideki Hayashi ,  Fujikazu Kitamura ,  Kumiko Akashika

发明人： Masahiro Horie ,  Hideki Hayashi ,  Fujikazu Kitamura ,  Kumiko Akashika

IPC分类号： H01L21/31 ,  G01B11/06 ,  G01J1/32 ,  G02F1/01

CPC分类号： G01B11/0641

摘要： A film forming apparatus (1) comprises a stage (2) for supporting a substrate (9), a light emitting part (3) for guiding polarized light used for forming an oxide film on the substrate (9) by light energy to a predetermined irradiation region on the substrate (9), a light receiving part (4) for receiving the polarized light reflected on the irradiation region and a calculation part (61) for obtaining a thickness of the film in the irradiation region on the basis of an output from the light receiving part (4). In the film forming apparatus (1), the light emitting part (3) and the light receiving part (4) constitute part of an ellipsometer, and the light emitting part (3) emits a light beam to form a film in the irradiation region on the substrate (9) while the light receiving part (4) acquires the polarization state of the reflected light from the substrate (9) and the calculation part (61) analyzes it to measure the thickness of the film. It is thereby possible to improve the accuracy of film thickness.

摘要翻译： 一种成膜设备（1）包括用于支撑基板（9）的台（2），用于将用于在基板（9）上形成氧化膜的偏振光用光引导到预定的光源的发光部分（3） 基板（9）上的照射区域，用于接收在照射区域上反射的偏振光的光接收部分（4）和用于基于输出获得照射区域中的膜的厚度的计算部分（61） 从光接收部分（4）。 在成膜装置（1）中，发光部（3）和受光部（4）构成椭圆计的一部分，发光部（3）在照射区域发射光束而形成膜 在光接收部分（4）获得来自基板（9）的反射光的偏振态的同时，在基板（9）上，并且计算部分（61）对其进行分析以测量膜的厚度。 从而可以提高膜厚度的精度。

公开(公告)号：US5440141A

公开(公告)日：1995-08-08

申请号：US289320

申请日：1994-08-11

申请人： Masahiro Horie

发明人： Masahiro Horie

IPC分类号： G01B11/06 ,  G01N21/86 ,  G01V8/00

CPC分类号： G01B11/0625

摘要： Spectral reflection ratios with respect to a second wavelength range are obtained and Fourier transformed to derive frequency converted spectrum. A power spectrum is obtained from the frequency converted spectrum to identify a peak which expresses interference caused by a silicon film. An approximate value d2' of the film thickness of the silicon film is calculated based on the peak position. After filtered by low-pass filtering, the frequency converted spectrum is reverse Fourier transformed to obtain spectral reflectance. From the spectral reflectance, theoretical spectral reflection ratios which are theoretically derived on only one transparent film of the thickness d3 which is formed on a silicon layer are subtracted. An approximate value d1' of the thickness of a silicon oxide film is then calculated from the spectral reflectance which are obtained by subtraction.

摘要翻译： 获得相对于第二波长范围的光谱反射比，进行傅立叶变换以得到频率变换光谱。 从频率转换光谱获得功率谱，以识别表示由硅膜引起的干扰的峰。 基于峰值位置计算硅膜的膜厚的近似值d2'。 通过低通滤波滤波后，对频率转换频谱进行逆傅里叶变换，得到光谱反射率。 从光谱反射率，理论上衍射出仅在硅层上形成的厚度d3的一个透明膜上的理论光谱反射率被减去。 然后从通过减法获得的光谱反射率计算氧化硅膜的厚度的近似值d1'。