METHOD FOR DETECTING OVERLAY ERROR AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
    1.
    发明申请
    METHOD FOR DETECTING OVERLAY ERROR AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME 有权
    用于检测覆盖误差的方法及使用其制造半导体器件的方法

    公开(公告)号:US20160300767A1

    公开(公告)日:2016-10-13

    申请号:US14978916

    申请日:2015-12-22

    IPC分类号: H01L21/66 G01B11/14 G01B11/27

    摘要: A method for detecting an overlay error includes: forming a first overlay key including a plurality of spaced apart first target patterns having a first pitch on a first layer of a substrate; forming a second overlay key including a plurality of spaced apart second target patterns having a second pitch different than the first pitch on a second layer of the substrate below the first layer; irradiating the first layer and the second layer with incident light having a first wavelength; obtaining a phase pattern of light reflected from the first layer and the second layer; calculating a position of a peak point or a valley point of the phase pattern of the reflected light; and detecting an overlay error of the first layer and the second layer using the position of the peak point or the valley point of the phase pattern.

    摘要翻译: 一种用于检测覆盖误差的方法包括:形成第一覆盖键,该第一覆盖键包括在衬底的第一层上具有第一间距的多个间隔开的第一目标图案; 形成第二覆盖键,其包括在所述第一层下方的所述基板的第二层上具有不同于所述第一间距的第二间距的多个间隔开的第二目标图案; 用具有第一波长的入射光照射第一层和第二层; 获得从第一层和第二层反射的光的相位图案; 计算反射光的相位图案的峰值点或谷点的位置; 以及使用相位图案的峰值点或谷点的位置来检测第一层和第二层的覆盖误差。

    Spectroscopic ellipsometer, film thickness measuring apparatus, and method of focusing in spectroscopic ellipsometer
    2.
    发明授权
    Spectroscopic ellipsometer, film thickness measuring apparatus, and method of focusing in spectroscopic ellipsometer 有权
    光谱椭偏仪,膜厚测量仪,聚焦椭圆偏振光谱仪

    公开(公告)号:US07929139B2

    公开(公告)日:2011-04-19

    申请号:US12196463

    申请日:2008-08-22

    IPC分类号: G01J4/00

    CPC分类号: G01J3/447 G01J3/4412

    摘要: In a spectroscopic ellipsometer, light emitted from a light source enters a measurement surface of a substrate through an optical system in a lighting part so as to incline to the measurement surface to be directed to a light receiving device, and ellipsometry is performed based on spectral intensity of reflected light reflected on the measurement surface, the spectral intensity being acquired by the light receiving device. In focusing of the spectroscopic ellipsometer, a focus position of the measurement surface is obtained based on a total light amount in a predetermined wavelength band of the reflected light, the total light amount being obtained by the light receiving device. In the spectroscopic ellipsometer, since the optical system for ellipsometry and the optical system for focusing are common, it is possible to eliminate influences of change of the optical systems by temperature change or the like and to achieve high accurate focusing.

    摘要翻译: 在光谱椭偏仪中,从光源发出的光通过照明部中的光学系统进入基板的测量面,从而向测量面倾斜而被引导到光接收装置,并且基于光谱进行椭偏仪 在测量表面反射的反射光的强度,由光接收装置获取的光谱强度。 在分光椭偏仪的聚焦中,基于反射光的预定波长带中的总光量,由光接收装置获得的总光量,获得测量表面的聚焦位置。 在分光椭偏仪中,由于用于椭偏仪的光学系统和用于聚焦的光学系统是常见的,因此可以通过温度变化等来消除光学系统的变化的影响,并且实现高精度的聚焦。

    Measuring method and apparatus for measuring depth of trench pattern
    3.
    发明授权
    Measuring method and apparatus for measuring depth of trench pattern 有权
    用于测量沟槽图案深度的测量方法和装置

    公开(公告)号:US07710579B2

    公开(公告)日:2010-05-04

    申请号:US11889391

    申请日:2007-08-13

    IPC分类号: G01B11/02

    CPC分类号: G01B11/0625

    摘要: In a trench shape measuring apparatus, a substrate having a trench pattern extending in a predetermined trench direction on a measurement area is held by a holding part. A light emission part applies illumination light to the measurement area and reflected light of the illumination light from the measurement area is spectrally dispersed by a diffraction grating of a spectroscope, to acquire a measured spectral reflectance. Since the diffraction grating is arranged so that an angle formed between a direction on the substrate corresponding to a grating direction of the diffraction grating and the trench direction becomes 45 degrees, even if an oscillation direction of the reflected light from the substrate is limited by influence of the trench pattern, it is possible to accurately obtain a spectral reflectance of the measurement area without influence of polarization of the reflected light and obtain a depth of the trench pattern with accuracy.

    摘要翻译: 在沟槽形状测量装置中,具有在测量区域上以预定沟槽方向延伸的沟槽图案的衬底由保持部分保持。 发光部将照明光施加到测量区域,并且通过分光镜的衍射光栅使来自测量区域的照明光的反射光被光谱地分散,以获得测量的光谱反射率。 由于衍射光栅被布置成使得对应于衍射光栅的光栅方向的基板上的方向与沟槽方向之间形成的角度成为45度,所以即使来自基板的反射光的振荡方向受到影响的限制 的沟槽图案,可以精确地获得测量区域的光谱反射率而不受反射光的偏振的影响,并且准确地获得沟槽图案的深度。

    Method of and apparatus for inspecting residue of metal film
    5.
    发明授权
    Method of and apparatus for inspecting residue of metal film 失效
    检查金属膜残留物的方法和装置

    公开(公告)号:US6020968A

    公开(公告)日:2000-02-01

    申请号:US304541

    申请日:1999-05-04

    申请人: Masahiro Horie

    发明人: Masahiro Horie

    CPC分类号: G01B11/0625

    摘要: A maximum value of a spectral reflectance at each wavelength with changes in the thickness of a top layer of a multi-layer dielectric film is determined as a maximum reflectance represented by a curve (MLmax) in a graph. In the presence of a residual metal film on the multi-layer dielectric film, the spectral reflectance changes from a curve (A50) to a curve (A5) in the graph with the decrease in the thickness of the residual metal film. In the absence of the residual metal film, the spectral reflectance is represented by a curve (A0) in the graph. Based on the foregoing, a peak wavelength at which the spectral reflectance of a multi-layer film to be judged reaches a peak is determined in a specified wavelength range. When the reflectance of the multi-layer film to be inspected at the peak wavelength is greater than the maximum reflectance, it is concluded that the multi-layer film to be inspected has the residual metal film. When the reflectance of the multi-layer film to be inspected at the peak wavelength is equal to or less than the maximum reflectance, it is concluded that the residual metal film is absent. The presence or absence of the residual metal film on the multi-layer dielectric film is inspected using simple calculation without the need for optical constants of metal.

    摘要翻译: 将多层电介质膜的顶层的厚度变化的各波长处的光谱反射率的最大值确定为由曲线图中的曲线(MLmax)表示的最大反射率。 在多层电介质膜上存在残留金属膜的情况下,随着残留金属膜厚度的减小,光谱反射率从图中的曲线(A50)变化到曲线(A5)。 在不存在残留金属膜的情况下,光谱反射率由曲线(A0)表示。 基于上述,在规定的波长范围内确定待判断的多层膜的光谱反射率达到峰值的峰值波长。 当在峰值波长处检查的多层膜的反射率大于最大反射率时,得出结论,待检查的多层膜具有残留的金属膜。 当在峰值波长下检查的多层膜的反射率等于或小于最大反射率时,得出残留金属膜不存在的结论。 使用简单的计算来检查多层电介质膜上残留金属膜的存在或不存在,而不需要金属的光学常数。

    Three-dimensional detecting method and three-dimensional detecting
apparatus
    6.
    发明授权
    Three-dimensional detecting method and three-dimensional detecting apparatus 失效
    三维检测方法和三维检测装置

    公开(公告)号:US5841894A

    公开(公告)日:1998-11-24

    申请号:US730230

    申请日:1996-10-15

    申请人: Masahiro Horie

    发明人: Masahiro Horie

    CPC分类号: G01B11/24

    摘要: With three-dimensional detecting method and a three-dimensional detecting apparatus, it is possible to accurately detect a surface shape of a sample. While moving a sample, confocal images Fj (where j=1, 2, . . . , n) are taken at a plurality of heights which are different from each other in the direction of height. Based on the confocal images Fj, surface height data H(x, y) with which the quantity of light becomes maximum in the height direction are calculated on each pixel (x, y), and further, a maximum light quantity I(x, y) with the surface height data H(x, y) are calculated. For each pixel, the surface height data H(x, y) of a pixel under noise processing (x, y) are corrected based on surface height data H(a, b) and a maximum light quantity I(a, b) at peripheral pixels which surround the pixel under noise processing (x, y).

    摘要翻译: 利用三维检测方法和三维检测装置,可以准确地检测样品的表面形状。 在移动样本的同时,在高度方向上彼此不同的多个高度拍摄共焦图像Fj(其中j = 1,2,...,n)。 基于共焦图像Fj,对每个像素(x,y)计算出光量在高度方向上变得最大的表面高度数据H(x,y),此外,最大光量I(x, y)与表面高度数据H(x,y)的关系。 对于每个像素,根据表面高度数据H(a,b)和最大光量I(a,b),校正噪声处理(x,y)下的像素的表面高度数据H(x,y) 在噪声处理(x,y)周围围绕像素的外围像素。

    Recording/reproduction device and method
    8.
    发明授权
    Recording/reproduction device and method 失效
    记录/再现设备和方法

    公开(公告)号:US07711249B2

    公开(公告)日:2010-05-04

    申请号:US10533585

    申请日:2003-11-10

    IPC分类号: H04N5/91

    摘要: When a digital broadcast is decoded and then re-encoded and digitally recorded, detailed program information contained in the original digital broadcast and information such as age-based viewer control information or parental control information may be lost. This problem is solved by providing a digital tuner to demodulate the digital broadcast signal and output the MPEG-TS, a demultiplexer to demultiplex the MPEG-TS into the component packet streams, an AV decoder to decode the demultiplexed AV data packets, and an AV encoder to re-encode the demultiplexed AV data packets into AV data packets for recording. A control microprocessor reads, reconstructs, and sends the PSI or SI packets demultiplexed by the demultiplexer to save the viewer control information to the system multiplexer. The system multiplexer multiplexes the PSI or SI packets with the re-encoded AV data packets, and the multiplexed stream is then written to the recording medium.

    摘要翻译: 当数字广播被解码然后被重新编码和数字记录时,包含在原始数字广播中的详细节目信息和诸如基于年龄的观众控制信息或家长控制信息之类的信息可能会丢失。 通过提供数字调谐器来解调数字广播信号并输出​​MPEG-TS,解复用器将MPEG-TS解复用到分量分组流中,解码数字调谐器以解码解复用的AV数据分组的AV解码器和AV 编码器将解复用的AV数据分组重新编码为用于记录的AV数据分组。 控制微处理器读取,重建并发送由解复用器解复用的PSI或SI分组,以将观众控制信息保存到系统多路复用器。 系统复用器将PSI或SI分组与重新编码的AV数据分组复用,然后将多路复用流写入记录介质。

    Surface form measuring apparatus and stress measuring apparatus and surface form measuring method and stress measuring method
    9.
    发明申请
    Surface form measuring apparatus and stress measuring apparatus and surface form measuring method and stress measuring method 有权
    表面形状测量装置及应力测量装置及表面形状测量方法及应力测量方法

    公开(公告)号:US20080111987A1

    公开(公告)日:2008-05-15

    申请号:US11979116

    申请日:2007-10-31

    IPC分类号: G01B11/16 G01B11/25

    CPC分类号: G01B11/0625 G01L5/0047

    摘要: In a stress measuring apparatus, reflected light of light emitted to a substrate through an objective lens is received by a light shielding pattern imaging part, to acquire an image of a light shielding pattern positioned at an aperture stop part of an optical system. A control part obtains gradient vectors of the substrate in a plurality of gradient vector measurement areas and surface form of the substrate on the basis of outputs of the light shielding pattern imaging part, to obtain a stress in a film formed on the substrate. Since light directed through the objective lens becomes approximately parallel rays of light on the substrate, measurement can be performed without focusing on each gradient vector measurement area and the surface form of the substrate can be obtained easily and rapidly. Consequently, it is possible to obtain a stress in the film formed on the substrate easily and rapidly.

    摘要翻译: 在应力测量装置中,通过遮光图案成像部分接收通过物镜发射到基板的光的反射光,以获取位于光学系统的孔径光阑部分的遮光图案的图像。 控制部分基于遮光图案成像部的输出,在多个梯度矢量测量区域和基板的表面形式中获得衬底的梯度向量,以获得在衬底上形成的膜中的应力。 由于通过物镜引导的光在基板上变成大致平行的光线,因此可以在不关注各梯度矢量测量区域的情况下进行测量,并且可以容易且快速地获得基板的表面形状。 因此,可以容易且快速地获得在基板上形成的膜的应力。

    Measuring method and apparatus for measuring depth of trench pattern
    10.
    发明申请
    Measuring method and apparatus for measuring depth of trench pattern 有权
    用于测量沟槽图案深度的测量方法和装置

    公开(公告)号:US20080049222A1

    公开(公告)日:2008-02-28

    申请号:US11889391

    申请日:2007-08-13

    IPC分类号: G01J3/28 G01N21/55

    CPC分类号: G01B11/0625

    摘要: In a trench shape measuring apparatus, a substrate having a trench pattern extending in a predetermined trench direction on a measurement area is held by a holding part. A light emission part applies illumination light to the measurement area and reflected light of the illumination light from the measurement area is spectrally dispersed by a diffraction grating of a spectroscope, to acquire a measured spectral reflectance. Since the diffraction grating is arranged so that an angle formed between a direction on the substrate corresponding to a grating direction of the diffraction grating and the trench direction becomes 45 degrees, even if an oscillation direction of the reflected light from the substrate is limited by influence of the trench pattern, it is possible to accurately obtain a spectral reflectance of the measurement area without influence of polarization of the reflected light and obtain a depth of the trench pattern with accuracy.

    摘要翻译: 在沟槽形状测量装置中,具有在测量区域上以预定沟槽方向延伸的沟槽图案的衬底由保持部分保持。 发光部将照明光施加到测量区域,并且通过分光镜的衍射光栅使来自测量区域的照明光的反射光被光谱地分散,以获得测量的光谱反射率。 由于衍射光栅被布置成使得对应于衍射光栅的光栅方向的基板上的方向与沟槽方向之间形成的角度成为45度,所以即使来自基板的反射光的振荡方向受到影响的限制 的沟槽图案,可以精确地获得测量区域的光谱反射率而不受反射光的偏振的影响,并且准确地获得沟槽图案的深度。