公开(公告)号：US20070141859A1

公开(公告)日：2007-06-21

申请号：US11705793

申请日：2007-02-14

Applicant: Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

Inventor： Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

IPC: H01L21/00

CPC classification number: H01L21/02686 ,  B23K26/04 ,  H01L21/02532 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/8221 ,  H01L21/84 ,  H01L27/1285 ,  Y10S117/904 ,  Y10S148/09

Abstract: A laser processing process which comprises laser annealing a silicon film 2 μm or less in thickness by irradiating a laser beam 400 nm or less in wavelength and being operated in pulsed mode with a pulse width of 50 nsec or more, and preferably, 100 nsec or more. A laser processing apparatus which comprises a laser generation device and a stage for mounting thereon a sample provided separately from said devices to thereby prevent transfer of vibration attributed to the movement of the stage to the laser generation device and the optical system. A stable laser beam can be obtained to thereby improve productivity.

Abstract translation: 一种激光加工方法，其特征在于，通过照射波长400nm以下的激光束，以脉冲宽度为50ns以上，优选为100nsec的脉冲模式，激光退火2μm以下的硅膜， 更多。 一种激光加工装置，包括激光产生装置和用于在其上安装与所述装置分开设置的样品的台，从而防止归因于舞台的运动的振动传递到激光产生装置和光学系统。 可以获得稳定的激光束，从而提高生产率。

公开(公告)号：US06638800B1

公开(公告)日：2003-10-28

申请号：US09409899

申请日：1999-10-01

Applicant: Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

Inventor： Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

IPC: H01L2100

CPC classification number: H01L21/02686 ,  B23K26/04 ,  H01L21/02532 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/8221 ,  H01L21/84 ,  H01L27/1285 ,  Y10S117/904 ,  Y10S148/09

Abstract: A laser processing process which comprises laser annealing a silicon film 2 &mgr;m or less in thickness by irradiating at laser beam 400 nm or less in wavelength and being operated in pulsed mode with a pulse width of 50 nsec or more, and preferably, 100 nsec or more. A laser processing apparatus which comprises a laser generation device and a stage for mounting thereon a sample provided separately from said devices to thereby prevent transfer of vibration attributed to the movement of the stage to the laser generation device and the optical system. A stable laser beam can be obtained to thereby improve productivity.

Abstract translation: 一种激光加工工艺，其包括通过在波​​长400nm或更小的激光束照射波长激光退火2μm或更小的硅膜，并以脉冲宽度为50nsec以上，优选为100nsec的脉冲模式操作， 一种激光加工装置，包括激光产生装置和用于在其上安装与所述装置分开设置的样品的载台，从而防止归因于载物台移动的振动传递到激光产生装置和光学系统。 可以获得稳定的激光束，从而提高生产率。

公开(公告)号：US5899708A

公开(公告)日：1999-05-04

申请号：US872781

申请日：1997-06-10

Applicant: Nobuhiro Tanaka ,  Takeshi Fukunaga

Inventor： Nobuhiro Tanaka ,  Takeshi Fukunaga

IPC: H01L21/205 ,  H01L21/265 ,  H01L21/336 ,  H01L23/60 ,  H01L29/786 ,  H01L21/00

CPC classification number: H01L29/66757 ,  H01L23/60 ,  H01L29/78603 ,  H01L2924/0002 ,  Y10S438/928

Abstract: In manufacturing a semiconductor device on a glass substrate, a conductive thin-film (for instance, a conductivity-imparted silicon film) is formed on the bottom surface side of the glass substrate at the initial stage of a manufacturing process. Since the conductive thin film serves as an electrostatic shield, the glass substrate is prevented from being electrified directly, whereby electrostatic breakdown of device elements as would otherwise be caused by electrification of the glass substrate can be avoided.

Abstract translation: 在制造玻璃基板上的半导体装置时，在制造工序的初始阶段，在玻璃基板的底面侧形成有导电性薄膜（例如导电性赋予硅膜）。 由于导电薄膜用作静电屏蔽，因此可以防止玻璃基板直接通电，从而可以避免玻璃基板带电导致器件元件的静电击穿。

公开(公告)号：US5891764A

公开(公告)日：1999-04-06

申请号：US739192

申请日：1996-10-30

Applicant: Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

Inventor： Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

IPC: B23K26/04 ,  H01L21/20 ,  H01L21/77 ,  H01L21/822 ,  H01L21/84 ,  H01L21/00

CPC classification number: B23K26/04 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/8221 ,  H01L21/84 ,  H01L27/1285 ,  Y10S117/904 ,  Y10S148/09

Abstract: A laser processing process which comprises laser annealing a silicon film 2 .mu.m or less in thickness by irradiating a laser beam 400 nm or less in wavelength and being operated in pulsed mode with a pulse width of 50 nsec or more, and preferably, 100 nsec or more.A laser processing apparatus which comprises a laser generation device and a stage for mounting thereon a sample provided separately from said device, to thereby prevent transfer of vibration attributed to the movement of the stage to the laser generation device and the optical system. A stable laser beam can be obtained to thereby improve productivity.

Abstract translation: 一种激光加工方法，其特征在于，激光退火厚度在2μm以下的硅膜，通过照射波长400nm以下的激光束，脉冲宽度为50nsec以上，优选为100nsec 或者更多。 一种激光加工装置，包括激光产生装置和用于在其上安装与所述装置分开设置的样品的载台，从而防止归因于载物台移动的振动传递到激光产生装置和光学系统。 可以获得稳定的激光束，从而提高生产率。

公开(公告)号：US5643801A

公开(公告)日：1997-07-01

申请号：US511466

申请日：1995-08-04

Applicant: Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

Inventor： Hiroaki Ishihara ,  Kazuhisa Nakashita ,  Hideto Ohnuma ,  Nobuhiro Tanaka ,  Hiroki Adachi

IPC: B23K26/04 ,  H01L21/20 ,  H01L21/77 ,  H01L21/822 ,  H01L21/84 ,  B23K26/02 ,  H01L21/268

CPC classification number: B23K26/04 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/8221 ,  H01L21/84 ,  H01L27/1285 ,  Y10S117/904 ,  Y10S148/09

Abstract: A laser processing process which includes laser annealing a silicon film 2 .mu.m or less in thickness by irradiating a laser beam 400 nm or less in wavelength and being operated in pulsed mode with a pulse width of 50 nsec or more and preferably, 100 nsec or more. The invention further relates to a laser processing apparatus which includes a laser generation device and a stage for mounting thereon a sample provide separately from said device, to thereby prevent transfer of vibration attributed to the movement of the stage to the laser generation device and the optical system. A stable laser beam can be obtained to thereby improve productivity.

Abstract translation: 一种激光加工方法，其包括通过照射波长为400nm以下的激光束并以脉冲宽度为50ns以上，优选为100nsec的脉冲模式来激光退火2μm以下的硅膜， 更多。 本发明还涉及一种激光加工装置，其包括激光产生装置和用于在其上安装样品的载物台，与所述装置分开提供，从而防止归因于载物台移动的振动传递到激光产生装置和光学 系统。 可以获得稳定的激光束，从而提高生产率。

公开(公告)号：US5623456A

公开(公告)日：1997-04-22

申请号：US549092

申请日：1995-10-27

Applicant: Shinichi Miyamoto ,  Nobuhiro Tanaka

Inventor： Shinichi Miyamoto ,  Nobuhiro Tanaka

IPC: G01D13/28 ,  G04B19/30 ,  G04G9/00 ,  G12B11/04 ,  H05B33/00 ,  H05B33/02 ,  H05B33/10 ,  H05B33/12 ,  G04B19/32 ,  G04B19/04

CPC classification number: H05B33/00 ,  G04B19/305 ,  G12B11/04 ,  H05B33/02 ,  H05B33/10 ,  H05B33/12

Abstract: An improved electroluminescent indicator hand which is capable of emitting light from its entire surface area consists of an annular support member mounted on the hand shaft of a timepiece, an electroluminescent indicator hand secured on the support member, and a metal contact for supplying a drive signal to the electroluminescent indicator hand. The electroluminescent indicator hand is formed by sequentially laminating a transparent electrode layer, a luminescent layer, an insulating layer and a rear electrode layer on the rear surface of a light transmissive substrate, which has sufficient rigidity, and has at one end an annular section overlapping the support member. The metal contact has plural conductors resiliently contacting the transparent electrode layer and the rear electrode layer of the electroluminescent hand, and is welded to the support member so as to secure the electroluminescent member therebetween. Since a hand frame is not necessary, the cost of individual components and the assembly thereof is substantially reduced. In addition, it is possible to make the hand thinner than a conventional indicator hand. A desirable three-dimensional visual effect can be also achieved.

Abstract translation: 能够从其整个表面积发射光的改进的电致发光指示手由安装在钟表的手轴上的环形支撑构件，固定在支撑构件上的电致发光指示手以及用于提供驱动信号的金属触点 到电致发光指示器手。 电致发光指示手是通过在具有足够的刚性的透光基板的后表面上顺序地层叠透明电极层，发光层，绝缘层和后电极层而形成的，并且在一端具有重叠的环形部分 支撑构件。 金属接触件具有与电致发光手的透明电极层和后电极层弹性接触的多个导体，并且被焊接到支撑构件上以便将电致发光构件固定在其间。 由于不需要手持架，所以单个部件的成本和组装的成本显着降低。 此外，可以使手比常规指示器手更薄。 还可以实现所需的三维视觉效果。

公开(公告)号：US5615536A

公开(公告)日：1997-04-01

申请号：US599154

申请日：1996-02-09

Applicant: Nobuhiro Tanaka

Inventor： Nobuhiro Tanaka

IPC: B65G57/00 ,  B65B5/06 ,  B65B5/10 ,  B65B35/50 ,  B65G57/03 ,  B65G57/24 ,  B65G61/00

CPC classification number: B65B5/106 ,  B65B35/50 ,  B65B5/06

Abstract: A goods accommodation method and apparatus in which a container is set such that its opening is directed horizontally, and box-shaped goods are stacked on a slide such that their surfaces facing the opening of the container are aligned with each other. The goods are transferred into the container while they are held in the stacked state by inserting the slide together with the goods stacked thereon into the container and then quickly pulling the slide out of the container at a speed higher than the speed of insertion such that the stacked goods remain in the container. The container is then turned up such that its opening is directed upward.

Abstract translation: 一种容器被设置为使得其开口被水平地定向的货物收纳方法和装置，并且将箱形货物堆叠在滑动件上，使得其面向容器的开口的表面彼此对准。 通过将滑块与堆叠在其上的货物一起插入容器中，将货物保持在堆叠状态，将货物转移到容器中，然后以高于插入速度的速度快速地将滑块从容器中拉出，使得 堆放货物留在容器中。 然后将容器翻转成使其开口朝上。

公开(公告)号：US5567102A

公开(公告)日：1996-10-22

申请号：US178285

申请日：1994-01-10

Applicant: Nobuhiro Tanaka

Inventor： Nobuhiro Tanaka

IPC: B65G1/00 ,  B65G1/04 ,  B65G1/137 ,  B65G57/00 ,  B65G61/00 ,  B65G59/00

CPC classification number: B65G61/00 ,  B65G1/00 ,  B65G1/0485 ,  B65G1/1373 ,  B65G57/00 ,  Y10S414/12

Abstract: A method and apparatus for correcting the appearance of each of a plurality of vertically stacked load stages each stage having a load placed on a pallet. Each of the vertically stacked load stages is separated independently of the other, and each separated load stage is corrected.

Abstract translation: PCT No.PCT / JP93 / 00570 Sec。 371日期1994年1月10日 102（e）日期1994年1月10日PCT提交1993年4月28日PCT公布。 公开号WO93 / 23318 PCT 日期：1993年11月25日一种用于校正多个垂直堆叠的载荷台中的每一个的外观的方法和装置，每个载荷台具有放置在托盘上的载荷。 每个垂直堆叠的负载级彼此独立地分离，并且每个分离的负载级被校正。

公开(公告)号：US5454212A

公开(公告)日：1995-10-03

申请号：US208126

申请日：1994-03-08

Applicant: Nobuhiro Tanaka

Inventor： Nobuhiro Tanaka

IPC: B65G1/04 ,  B65B5/10 ,  B65G47/10 ,  B65G47/96 ,  B65G57/08 ,  B65G57/28 ,  B65B1/04 ,  B65B35/00 ,  B65B35/50 ,  B65B59/00

CPC classification number: B65B5/10

Abstract: In a method of transferring goods into a container 83, the container 83 is tilted toward a goods loader 18, and a goods transferring member 90 with goods accommodated therein is inserted into an upper empty space in the tilted container 83. Thereafter, the goods transferring member 90 is tilted downward, and in this tilted state, it is withdrawn to the outside of the container 83, thus effecting the transfer of the goods in it into the container 83.

Abstract translation: 在将货物运送到容器83的方法中，容器83朝向货物装载机18倾斜，并且容纳有货物的货物搬运件90插入倾斜容器83的上部空间中。之后，货物转移 构件90向下倾斜，并且在该倾斜状态下，其被抽出到容器83的外部，从而将货物转移到容器83中。

公开(公告)号：US5403147A

公开(公告)日：1995-04-04

申请号：US904346

申请日：1992-06-25

Applicant: Nobuhiro Tanaka

Inventor： Nobuhiro Tanaka

IPC: B65G1/137 ,  B65G1/00

CPC classification number: B65G1/1371

Abstract: A method for storing articles in an automatic storage facility 10 comprises steps of checking whether a scheduled warehousing amount of articles is greater than an available storage capacity of an intended storage facility on the basis of the scheduled warehousing amount and the available storage capacity, and assigning partial amount of the scheduled warehousing articles to warehouse in an overflow area 26 when the scheduled warehousing amount is greater than the available storage capacity, and subsequently initiating warehousing operation for all of articles to be warehoused to the automatic storage facility 10 and the overflow area 26.

Abstract translation: 一种用于在自动存储设备10中存储物品的方法包括以下步骤：基于所计划的仓储量和可用存储容量来检查预定的仓储量的物品是否大于预期存储设施的可用存储容量，以及分配 当预定的仓储量大于可用的存储容量时，预定仓储物品的部分量的仓库在溢出区域26中，并且随后对于要存储到自动存储设施10和溢出区域26的所有物品进行仓储操作 。