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公开(公告)号：US07078854B2
公开(公告)日：2006-07-18
申请号：US10627716
申请日：2003-07-28
CPC分类号： H01J31/127 , H01J29/864 , H01J2211/36 , H01J2329/8625 , H01J2329/8665
摘要： An image display apparatus includes a first substrate, a second substrate and a spacer provided therebetween and providing an atmospheric pressure resistant structure of a vacuum container formed between the first and second substrates. First and second support members are provided outside an image display area, with the first and second support members being joined together. An electrode is formed on either one of the first and second substrates, bearing the second support member, and is electrically joined to the second support member by a spring contact portion.
摘要翻译： 图像显示装置包括第一基板，第二基板和设置在其间的间隔件，并且提供形成在第一和第二基板之间的真空容器的耐大气压结构。 第一和第二支撑构件设置在图像显示区域的外部，第一和第二支撑构件连接在一起。 电极形成在第一和第二基板中的任一个上，承载第二支撑构件，并且通过弹簧接触部分电连接到第二支撑构件。
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公开(公告)号：US07008520B2
公开(公告)日：2006-03-07
申请号：US10648330
申请日：2003-08-27
申请人： Nobuyuki Takahashi
发明人： Nobuyuki Takahashi
IPC分类号： C23C14/35
CPC分类号： C23C14/225 , C23C14/35 , C23C14/352 , H01J37/34
摘要： An object of the invention is to provide a sputtering device which can provide increased distribution of film formation and coverage distribution better than prior sputtering devices. Thus, this invention is that, in the sputtering device constituted of a substrate holder for holding a substrate, at least one target for forming a thin film on the substrate, at least one sputtering cathode which has the target and magnets arranged behind the substrate, an axis of the target is inclined to an axis of the sputtering cathode, and the sputtering cathode is rotated on its axis to make the target swing relative to the substrate.
摘要翻译： 本发明的目的是提供一种溅射装置，其可以比现有的溅射装置更好地提供成膜分布和覆盖分布的增加。 因此，本发明是在由用于保持基板的基板保持器构成的溅射装置中，在基板上形成至少一个用于形成薄膜的靶，至少一个具有靶的溅射阴极和布置在基板后面的磁体， 靶的轴线相对于溅射阴极的轴线倾斜，并且溅射阴极在其轴线上旋转以使靶相对于基板摆动。
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23.发明授权Thick grain-oriented electrical steel sheet exhibiting excellent magnetic properties 失效表现出优异的磁特性的厚晶粒取向电工钢板公开(公告)号：US06858095B2
公开(公告)日：2005-02-22
申请号：US09783408
申请日：2001-02-14
CPC分类号： H01F1/14775 , C21D8/1244 , C21D8/1255 , C21D8/1261 , C21D8/1272
摘要： A grain-oriented electrical steel sheet comprising 2.5-4.5% Si by weight and measuring 0.36-1.00 mm in thickness is imparted with a good core loss value for its thickness by controlling its C content, flux density, grain boundary configuration, and deviation degree of crystal orientation in the grains.
摘要翻译： 通过控制其C含量，通量密度，晶界构型和偏差度，将2.5-4.5重量％的Si和厚度为0.36-1.00毫米的晶粒取向电工钢片的厚度赋予其较好的铁损值 晶粒取向晶体。
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公开(公告)号：US06850227B2
公开(公告)日：2005-02-01
申请号：US10278789
申请日：2002-10-24
CPC分类号： G06F3/0202 , G06F3/0231 , H01H2207/048 , H01H2239/01
摘要： In a wireless keyboard including an antenna wire for radiating a keyboard output signal from a transmitting section into the air and an electrode sheet secured in a keyboard casing and having an electrically conductive pattern coated thereon, the conductive pattern constituting a part of a switch which is turned on by depressing a key, the antenna wire is formed such that an electrically conductive pattern is coated on the electrode sheet in a manner similar to the electrically conductive pattern constituting a part of the switch. The antenna wire is formed at the same time as the electrically conductive pattern constituting a part of the switch and integrally with the electrode sheet.
摘要翻译： 在包括用于将发送部分的键盘输出信号发射到空气中的天线布线的无线键盘和固定在键盘壳体中并具有导电图案的电极板的导电图案构成开关的一部分 通过按下键来开启天线，使得导电图案以类似于构成开关的一部分的导电图案的方式涂覆在电极片上。 天线线与构成开关的一部分的导电图案同时形成，与电极片一体形成。
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公开(公告)号：US06746239B2
公开(公告)日：2004-06-08
申请号：US10252392
申请日：2002-09-24
申请人： Nobuyuki Takahashi
发明人： Nobuyuki Takahashi
IPC分类号： F27D300
CPC分类号： H01L21/67742 , H01L21/67745 , Y10S414/135
摘要： A substrate feed chamber that is equipped in a substrate processing apparatus is provided. The substrate feed chamber has a storage tray capable of storing simultaneously three or more substrate holding trays that hold substrates in a vertical or substantially vertical condition and a horizontal movement mechanism that moves horizontally the storage tray with respect to the substrate feed position in order to effect feeding-in or feeding-out movement of the substrate holding tray between any of the chambers of a group consisting of processing chambers and load lock chambers and, in addition, if required, has a rotary movement device that rotates the storage tray. Improvement in throughput in a substrate processing apparatus can thereby be achieved and increase in the ground-contacting area of the device as a whole can be prevented.
摘要翻译： 提供了设置在基板处理装置中的基板供给室。 基板馈送室具有能够同时存储三个或更多个基板保持托盘的存储托盘，该基板保持托盘保持垂直或基本垂直的状态下的基板;以及水平移动机构，其相对于基板进给位置水平地移动存储托盘，以便实现 基板保持托盘在由处理室和装载锁定室组成的组的任何室之间的进入或送出运动，另外如果需要，还具有使存储托盘旋转的旋转运动装置。 从而可以实现基板处理装置的通过量的提高，并且可以防止装置的接地面积的增加。
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公开(公告)号：US06609807B2
公开(公告)日：2003-08-26
申请号：US09921753
申请日：2001-08-06
IPC分类号： F21V704
CPC分类号： G02B6/005 , G02B6/0053 , G02B6/0068 , G02B6/0086
摘要： A backlight 7 has light sources 2, a flat-plate-shaped light guide plate 3 for guiding the light emitted from the light sources 2 in a predetermined direction, a light shield louver 5, disposed so as to face the light guide plate 3, for shielding part of the light emerging from the light guide plate 3 according to angles of incidence, and a prism sheet 8 for converting the brightness distribution of the light incident on the light shield louver 5 into a predetermined brightness distribution. Owing to the prism sheet 8, the light incident on the light shield louver exhibits a brightness distribution such that brightness is at a minimum at an angle of incidence of 0°. Thus, the backlight 7, and a liquid crystal display device 1 employing it, permits light to emerge therefrom within a desired range of viewing angles while offering high brightness within that range, with reduced degradation of viewability.
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公开(公告)号：US06361667B1
公开(公告)日：2002-03-26
申请号：US09039482
申请日：1998-03-16
IPC分类号： C23C1435
CPC分类号： C23C14/345 , C23C14/35 , C23C14/351 , H01J37/3266 , H01J37/3405
摘要： This invention discloses ionization sputtering apparatuses which have a function for ionizing sputtered particles. Those apparatuses comprise an ionization means for ionizing sputtered particles from a target. The ionization means generates a plasma by applying radio frequency energy with plasma generation gas at an ionization space between the target and a holder holding a substrate. An disclosed apparatus comprises a magnetic device preventing the plasma from diffusing from the ionization space. Another disclosed apparatus comprises a magnetic device which orients the ionized sputtered particles toward the substrate.
摘要翻译： 本发明公开了具有电离溅射粒子功能的电离溅射装置。 这些装置包括用于从靶中电离溅射的颗粒的离子化装置。 电离装置通过在靶和保持基板的保持架之间的电离空间处施加等离子体产生气体的射频能量来产生等离子体。 公开的装置包括防止等离子体从电离空间扩散的磁性装置。 另一公开的装置包括将离子化的溅射颗粒定向到衬底的磁性装置。
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公开(公告)号：USD430066S
公开(公告)日：2000-08-29
申请号：US116146
申请日：1999-12-29
申请人： Shuji Koman , Nobuyuki Takahashi
设计人： Shuji Koman , Nobuyuki Takahashi
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29.发明授权Illumination device, method for driving the illumination device and display including the illumination device 失效照明装置，用于驱动照明装置的方法和包括照明装置的显示器
公开(公告)号：US6066920A
公开(公告)日：2000-05-23
申请号：US2673
申请日：1998-01-05
IPC分类号： G09G3/34 , H01J61/78 , H05B41/36 , H05B41/392 , H01J7/44
CPC分类号： H05B41/36 , G09G3/3406 , H01J61/78 , H05B41/3922 , G09G2320/041 , G09G2330/026
摘要： An illumination device includes a cold cathode fluorescent tube having a heat capacity of 0.035 Wsec/.degree. C. or less per unit length (1 cm) of a glass tube of a fluorescent section of the cold cathode fluorescent tube. The illumination device has a superior operation characteristic at a low temperature. The device is driven by a method and is implemented in a display device.
摘要翻译： 照明装置包括冷阴极荧光管的荧光部的玻璃管的单位长度（1cm）的热容量为0.035Wsec /℃以下的冷阴极荧光管。 照明装置在低温下具有优异的操作特性。 该装置由一种方法驱动并在显示装置中实现。
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公开(公告)号：US6059985A
公开(公告)日：2000-05-09
申请号：US826735
申请日：1997-04-04
IPC分类号： H01L21/28 , H01L21/00 , H01L21/20 , H01L21/205 , H01L21/285 , H01L21/302 , H01L21/3065 , H01L21/68
CPC分类号： H01L21/0209
摘要： A method of processing a substrate has the following processes. After depositing a thin film onto a substrate by a CVD method, the front surface of the substrate is brought close to a gas supply surface of a gas supply mechanism to have a desired interval without making contact between the front surface and the gas supply surface. Afterwards, an etching gas is supplied into a back space of the substrate to generate plasma there, and further a purge gas is also supplied into a space between the gas supply surface and the substrate so that the purge gas flows into the back space through a peripheral-edge region of the substrate. This purge gas prevents radicals included in the plasma from diffusing into the space between the gas supply surface and the substrate.
摘要翻译： 处理基板的方法具有以下处理。 在通过CVD法将薄膜沉积到基板上之后，使基板的前表面靠近气体供给机构的气体供给表面，使其具有期望的间隔而不会在前表面和气体供给表面之间接触。 然后，将蚀刻气体供给到基板的后部空间中以在其中产生等离子体，并且还将吹扫气体供应到气体供给表面和基板之间的空间中，使得净化气体通过 衬底的周边边缘区域。 这种净化气体防止包括在等离子体中的自由基扩散到气体供应表面和基底之间的空间中。
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