公开(公告)号：US07163279B2

公开(公告)日：2007-01-16

申请号：US10874283

申请日：2004-06-24

Applicant: Kazuo Shimizu ,  Osamu Machida ,  Tomohiko Koda

Inventor： Kazuo Shimizu ,  Osamu Machida ,  Tomohiko Koda

IPC: B41J2/045

CPC classification number: B41J2/1629 ,  B41J2/14274 ,  B41J2/1612 ,  B41J2/1628 ,  B41J2202/11

Abstract: A piezoelectric element is attached to a diaphragm via a relay member. A length of the relay member is shorter than the length of the piezoelectric element and longer than an active section in the piezoelectric element with respect to a direction orthogonal to a direction in which a plurality of nozzles are aligned. Also, a surface of the relay member that attached to the diaphragm has a width that is shorter than the piezoelectric element with respect to the direction in which the nozzles are aligned.

Abstract translation: 压电元件经由继电器构件附接到隔膜。 继电器构件的长度比压电元件的长度短，并且比压电元件中与多个喷嘴对准的方向正交的方向的有效部分长。 此外，附接到隔膜的中继构件的表面相对于喷嘴对准的方向具有比压电元件短的宽度。

公开(公告)号：US20060139407A1

公开(公告)日：2006-06-29

申请号：US11314741

申请日：2005-12-22

Applicant: Takao Umeda ,  Osamu Machida ,  Jun Nagata

Inventor： Takao Umeda ,  Osamu Machida ,  Jun Nagata

IPC: B41J2/04

CPC classification number: B41J2/14274 ,  B41J2/1612 ,  B41J2/1623 ,  B41J2/1632 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1646 ,  B41J2002/14403 ,  B41J2202/20 ,  B41J2202/21 ,  Y10T29/42

Abstract: In a method of manufacturing an inkjet head, a silicon dioxide (SiO2) layer is produced on the surface of first silicon member formed from single-crystal silicon. Next, a glass layer formed of borosilicate glass or the like is sputtered onto the surface of the silicon dioxide (SiO2) layer. A silicon oxide (SiOx, x

Abstract translation: 在制造喷墨头的方法中，在由单晶硅形成的第一硅部件的表面上产生二氧化硅（SiO 2）层。 接下来，将由硼硅酸盐玻璃等形成的玻璃层溅射到二氧化硅（SiO 2）层的表面上。 然后在第二硅构件的表面上形成氧化硅（SiO x x，x <2）层。 第一和第二硅构件通过用加热器在大约450℃下加热来结合在一起，因为在电极端子之间施加直流电压。 结果，在玻璃层和氧化硅（SiO x x，x <2）层的界面处形成二氧化硅（SiO 2/2）层，阳极结合 两层。

公开(公告)号：US06719390B1

公开(公告)日：2004-04-13

申请号：US10403204

申请日：2003-03-31

Applicant: Stuart D. Howkins ,  Charles A. Willus ,  Osamu Machida

Inventor： Stuart D. Howkins ,  Charles A. Willus ,  Osamu Machida

IPC: B41J2938

CPC classification number: B41J2/04525 ,  B41J2/04543 ,  B41J2/04573 ,  B41J2/04581 ,  B41J2/04588

Abstract: An inkjet printing system includes an array of transducers to eject ink, the array including the transducers divided into interspersed sets. A controller controls a firing sequence of the array of transducers. One set of transducers is fired, and after a delay, another set of transducers is fired and then, after further delays, each set is fired in turn. The delays are selected based on known response characteristics of the array of transducers to minimize the average crosstalk for all of the sets.

Abstract translation: 喷墨打印系统包括用于喷射墨水的换能器阵列，该阵列包括被分成散置的组的换能器。 控制器控制换能器阵列的点火顺序。 一组换能器被点燃，经过一段延迟之后，另一组换能器被点燃，然后在进一步的延迟之后，每组都被依次点燃。 基于传感器阵列的已知响应特性选择延迟，以最小化所有组的平均串扰。

公开(公告)号：US06592196B2

公开(公告)日：2003-07-15

申请号：US09986734

申请日：2001-11-09

Applicant: Yoshitaka Akiyama ,  Nobuhiro Noto ,  Yutaka Shoji ,  Hiroshi Takahagi ,  Osamu Machida ,  Yoshinari Suzuki

Inventor： Yoshitaka Akiyama ,  Nobuhiro Noto ,  Yutaka Shoji ,  Hiroshi Takahagi ,  Osamu Machida ,  Yoshinari Suzuki

IPC: B41J2938

CPC classification number: B41J2/04581 ,  B41J2/04588

Abstract: An appropriate pulse width of a driving pulse for driving a piezoelectric element of ink jet head is determined by using the head difference. That is, the pulse width with which the least change in the ink speed occurs can be used as the pulse width of the driving signal for the piezoelectric actuator. As a result, a reliable ink jet printer head capable of stably ejecting ink droplets over a long period of time and having excellent frequency characteristics can be provided.

公开(公告)号：US5831648A

公开(公告)日：1998-11-03

申请号：US580273

申请日：1995-12-27

Applicant: Masao Mitani ,  Kenji Yamada ,  Katsunori Kawasumi ,  Kazuo Shimizu ,  Osamu Machida

Inventor： Masao Mitani ,  Kenji Yamada ,  Katsunori Kawasumi ,  Kazuo Shimizu ,  Osamu Machida

IPC: B41J2/005 ,  B41J2/14 ,  B41J2/16 ,  B41J2/05

CPC classification number: B41J2/14056 ,  B41J2/005 ,  B41J2/1412 ,  B41J2/14129 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/164 ,  B41J2202/11

Abstract: A plurality of heaters are provided on a silicon substrate in a plurality of individual ink channels. Each heater is constructed from a thin-film resistor and a thin-film conductor. The thin-film resistor is formed with an electrical insulation layer at its upper surface. The electrical insulation layer is formed through subjecting the thin-film resistor to a high-temperature thermal oxidation process. The thin-film resistor formed with the electrical insulation layer may be covered with an additional insulation layer of a thickness substantially equal to the thin-film resistor.

Abstract translation: 多个加热器设置在多个单独墨水通道中的硅基板上。 每个加热器由薄膜电阻器和薄膜导体构成。 薄膜电阻器在其上表面形成有电绝缘层。 通过对薄膜电阻进行高温热氧化处理来形成电绝缘层。 形成有电绝缘层的薄膜电阻器可以用厚度基本上等于薄膜电阻器的附加绝缘层覆盖。

公开(公告)号：US5790154A

公开(公告)日：1998-08-04

申请号：US761900

申请日：1996-12-09

Applicant: Masao Mitani ,  Kenji Yamada ,  Osamu Machida

Inventor： Masao Mitani ,  Kenji Yamada ,  Osamu Machida

IPC: B41J2/16 ,  B41J2/05 ,  H01C1/012 ,  H01L29/00

CPC classification number: B41J2/14129 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1646 ,  B41J2202/03 ,  B41J2202/13

Abstract: In an ink ejection recording head, a silicon dioxide layer is formed on the surface of a silicon substrate, a silicon nitride layer is formed on the silicon dioxide layer, and a plurality of heaters are formed on the silicon nitride layer. The heater is constituted by a thin film resistor made from a Ta--Si--O alloy and a thin film conductor made from nickel. Further, a gold layer is formed through plating on at least a portion of the thin film conductor to be connected to another conductor prior to thermally oxidizing the heaters.

Abstract translation: 在喷墨记录头中，在硅衬底的表面上形成二氧化硅层，在二氧化硅层上形成氮化硅层，在氮化硅层上形成多个加热器。 加热器由由Ta-Si-O合金制成的薄膜电阻器和由镍制成的薄膜导体构成。 此外，在热氧化加热器之前，在至少一部分薄膜导体上形成金层以连接到另一导体。

公开(公告)号：US5697144A

公开(公告)日：1997-12-16

申请号：US502179

申请日：1995-07-13

Applicant: Masao Mitani ,  Kenji Yamada ,  Katsunori Kawasumi ,  Kazuo Shimizu ,  Osamu Machida

Inventor： Masao Mitani ,  Kenji Yamada ,  Katsunori Kawasumi ,  Kazuo Shimizu ,  Osamu Machida

IPC: B41J2/05 ,  B41J2/16 ,  H05B3/00

CPC classification number: B41J2/14129 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1635 ,  B41J2/1643 ,  B41J2/1646 ,  Y10T29/49083

Abstract: To provide a method of fabricating, using thin-film processes only, a 1,600 dpi head with nozzles arranged two-dimensionally on a substrate, e.g., silicon wafer, a drive LSI, thin-film resistors and thin-film conductors are formed on the silicon wafer. Thereafter, ink channels and through-holes are formed by silicon anisotropic etching from both sides of the silicon wafer. After connecting the orifice plate to the silicon wafer, nozzles are formed in the orifice plate using photoetching.

Abstract translation: 为了提供仅使用薄膜工艺的方法，在基板上例如硅晶片，驱动LSI，薄膜电阻器和薄膜导体上形成具有二维排列的喷嘴的1,600dpi的头部 硅晶片。 此后，通过硅晶片的两侧的硅各向异性蚀刻形成油墨通道和通孔。 在将孔板连接到硅晶片之后，使用光刻在孔板中形成喷嘴。

公开(公告)号：US5265118A

公开(公告)日：1993-11-23

申请号：US853189

申请日：1992-03-18

Applicant: Takashi Takenaka ,  Shigeto Mori ,  Osamu Machida

Inventor： Takashi Takenaka ,  Shigeto Mori ,  Osamu Machida

IPC: C30B29/62 ,  C30B25/00 ,  H05B3/62

CPC classification number: C30B25/005 ,  C30B29/36

Abstract: A silicon carbide whisker production apparatus manufactured by placing a plurality of lidded reaction vessels in the longitudinal direction of an Acheson furnace at intervals, packing graphite grains in the gaps between the adjacent reaction vessels and around the reaction vessels along the longitudinal direction of the furnace starting with the furnace-side ends of terminal electrodes to form a surrounding heating zone, and packing a heat insulating packing around the surrounding heating zone.

Abstract translation: 一种碳化硅晶须生产装置，其通过在Acheson炉的纵向方向间隔放置多个带盖的反应容器而制造，将石墨颗粒沿着炉的纵向方向在相邻反应容器之间的间隙和反应容器周围包装， 端子电极的炉端端形成周围的加热区，并在周围的加热区周围填充隔热填料。

公开(公告)号：US10786988B2

公开(公告)日：2020-09-29

申请号：US15668839

申请日：2017-08-04

Applicant: Atsushi Takeuchi ,  Osamu Machida ,  Akira Shimofuku ,  Shuya Abe ,  Masahiro Ishimori ,  Takuma Hirabayashi

Inventor： Atsushi Takeuchi ,  Osamu Machida ,  Akira Shimofuku ,  Shuya Abe ,  Masahiro Ishimori ,  Takuma Hirabayashi

IPC: H01L41/047 ,  H01L41/09 ,  B41J2/14 ,  B41J2/16 ,  H01L41/08 ,  H01L41/29 ,  H01L41/318

Abstract: An electromechanical transducer element includes a first electrode on a substrate, an electromechanical transducer film on the first electrode, and a second electrode on the electromechanical transducer film. The electromechanical transducer film includes a thin line pattern. The thin line pattern includes a plurality of thin lines that are spaced away from each other.

公开(公告)号：US10150293B2

公开(公告)日：2018-12-11

申请号：US15405714

申请日：2017-01-13

Applicant: Osamu Machida ,  Masahiro Ishimori ,  Atsushi Takeuchi ,  Shuya Abe

Inventor： Osamu Machida ,  Masahiro Ishimori ,  Atsushi Takeuchi ,  Shuya Abe

IPC: B41J2/14 ,  H01L41/08 ,  H01L41/09 ,  H01L41/29 ,  H01L41/331 ,  B41J2/16

Abstract: An electromechanical transducer element includes a first electrode; an electromechanical transducer film stacked on one surface of the first electrode; a second electrode stacked on the electromechanical transducer film; and wiring formed on the second electrode. In an at least one cross section, each of a boundary, on a second electrode side, of the electromechanical transducer film and a boundary, on a side opposite to the electromechanical transducer film, of the second electrode is a curved shape protruding away from the first electrode. In the at least one cross section, each of a film thickness of the electromechanical transducer film and a film thickness of the second electrode becomes thinner toward end portions from a maximum height portion.