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    Method of making liquid discharge head, liquid discharge head, liquid discharge apparatus having liquid discharge head, and manufacturing apparatus of liquid discharge head
    6.
    发明授权
    Method of making liquid discharge head, liquid discharge head, liquid discharge apparatus having liquid discharge head, and manufacturing apparatus of liquid discharge head 有权
    排液头，排液头，具有排液头的排液装置以及排液头的制造装置的制造方法

    公开(公告)号：US09202717B2

    公开(公告)日：2015-12-01

    申请号：US13727758

    申请日：2012-12-27

    申请人： Atsushi Takeuchi ,  Osamu Machida ,  Akira Shimofuku ,  Xianfeng Chen ,  Ryo Tashiro

    发明人： Atsushi Takeuchi ,  Osamu Machida ,  Akira Shimofuku ,  Xianfeng Chen ,  Ryo Tashiro

    IPC分类号： H01L21/00 ,  B05C11/00 ,  B05C13/00 ,  B05C13/02 ,  B05B7/00 ,  H01L21/62 ,  B41J2/01 ,  B41J2/16

    CPC分类号： H01L21/62 ,  B41J2/01 ,  B41J2/161 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1646

    摘要： A method of making a liquid discharge head which includes a nozzle to discharge liquid, a pressure chamber communicating with the nozzle, a pressure chamber substrate to form surfaces of the pressure chamber, and a piezoelectric actuator to apply pressure to liquid in the pressure chamber having a lower electrode, a ferroelectric film, and an upper electrode, includes a silicon wafer supplying process, a position adjustment process, a surface treatment process to reform a surface of the lower electrode, a liquid applying process to apply ferroelectric precursor on the lower electrode by an inkjet method, a heating process to heat the ferroelectric precursor film, and a cooling process. A series of processes from the position adjustment process to the cooling process is iterated to form a ferroelectric film having a predetermined thickness. The series of processes is performed with certain waiting times inserted between key processes.

    摘要翻译： 一种制造液体排出头的方法，该排液头包括用于排出液体的喷嘴，与喷嘴连通的压力室，压力室基板以形成压力室的表面;以及压电致动器，用于向压力室中的液体施加压力， 下电极，铁电体膜和上电极，包括硅晶片供给工序，位置调整工序，对下电极的表面进行改质的表面处理工序，在下电极上施加铁电前体的液体施加工序 通过喷墨法，加热铁电前体膜的加热工序和冷却工序。 迭代从位置调整处理到冷却处理的一系列处理，以形成具有预定厚度的铁电体膜。 一系列进程是在密钥进程之间插入某些等待时间的情况下执行的。

    THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, ELECTRO-MECHANICAL TRANSDUCER ELEMENT, LIQUID EJECTING HEAD, AND INKJET RECORDING APPARATUS
    7.
    发明申请
    THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, ELECTRO-MECHANICAL TRANSDUCER ELEMENT, LIQUID EJECTING HEAD, AND INKJET RECORDING APPARATUS 有权
    薄膜成型装置，薄膜​​成型方法，电子机械传感器元件，液体喷射头和喷墨记录装置

    公开(公告)号：US20130194350A1

    公开(公告)日：2013-08-01

    申请号：US13751206

    申请日：2013-01-28

    申请人： Yasuhiro Watanabe ,  Osamu Machida ,  Akira Shimofuku ,  Ryo Tashiro ,  Atsushi Takeuchi

    发明人： Yasuhiro Watanabe ,  Osamu Machida ,  Akira Shimofuku ,  Ryo Tashiro ,  Atsushi Takeuchi

    IPC分类号： H05K13/00 ,  B41J2/14 ,  H02N11/00

    CPC分类号： H05K13/00 ,  B05C9/10 ,  B41J2/14 ,  H01L21/00 ,  H01L21/67051 ,  H01L21/6715 ,  H02N11/006

    摘要： A thin film forming apparatus which automatically forms, on an electrode layer formed on a substrate, a functional thin film which is crystallized from a precursor layer is disclosed, including a water-repellant film forming unit which forms, on a region other than a region on which is to be formed the functional thin film on the electrode layer, a water-repellant film which includes a self-assembled monolayer; an inkjet coating unit which coats, on the region on which is to be formed the functional thin film on the electrode layer, the precursor layer by an inkjet method; and a controller which controls, to within a predetermined time, a time from forming the water-repellant film with the water-repellant film forming unit to coating the precursor layer with the inkjet coating unit.

    摘要翻译： 公开了一种薄膜形成装置，其在形成于基板上的电极层上自动形成从前体层析出的功能性薄膜，其特征在于，具有防水膜形成单元，其在区域以外的区域 在该电极层上形成功能性薄膜，包括自组装单层的防水膜; 喷墨涂布单元，其在要在电极层上形成功能性薄膜的区域上涂布前驱体层; 以及控制器，其在预定时间内控制从防水膜形成单元形成防水膜到使用喷墨涂布单元涂覆前体层的时间。