公开(公告)号：US10773425B2

公开(公告)日：2020-09-15

申请号：US15860044

申请日：2018-01-02

Applicant: SHIBAURA MECHATRONICS CORPORATION ,  TOSHIBA MEMORY CORPORATION

Inventor： Kensuke Demura ,  Satoshi Nakamura ,  Daisuke Matsushima ,  Masayuki Hatano ,  Hiroyuki Kashiwagi

IPC: B29C33/42 ,  B05C5/02 ,  B29C59/02 ,  G03F7/00 ,  B29C33/38 ,  B29C33/72 ,  B29C59/00 ,  B29L31/00

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.

公开(公告)号：US20180047559A1

公开(公告)日：2018-02-15

申请号：US15671529

申请日：2017-08-08

Applicant: Shibaura Mechatronics Corporation

Inventor： Masaya Kamiya ,  Kensuke Demura ,  Daisuke Matsushima ,  Haruka Nakano ,  Ivan Petrov Ganachev

IPC: H01L21/02 ,  H01L21/66 ,  H01L21/67 ,  H01L21/687 ,  B08B3/10 ,  B08B7/00

CPC classification number: H01L21/02052 ,  B08B3/10 ,  B08B7/0092 ,  G03F7/40 ,  G03F7/422 ,  H01L21/02057 ,  H01L21/67051 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/68764 ,  H01L22/12

Abstract: A substrate treatment device according to an embodiment includes a placement portion on which a substrate is placed and rotated, a liquid supply portion which supplies a liquid to a surface on an opposite side to the placement portion of the substrate, a cooling portion which supplies a cooling gas to a surface on a side of the placement portion of the substrate, and a control portion which controls at least one of a rotation speed of the substrate, a supply amount of the liquid, and a flow rate of the cooling gas. The control portion brings the liquid present on a surface of the substrate into a supercooled state and causes at least a part of the liquid brought into the supercooled state to freeze.

公开(公告)号：US20180015497A1

公开(公告)日：2018-01-18

申请号：US15717435

申请日：2017-09-27

Applicant: Shibaura Mechatronics Corporation ,  Toshiba Memory Corporation

Inventor： Satoshi Nakamura ,  Kensuke Demura ,  Daisuke Matsushima ,  Masayuki Hatano ,  Hiroyuki Kashiwagi

IPC: B05C5/02 ,  B29C33/38 ,  G03F7/00 ,  B29C59/02

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.

公开(公告)号：US20150380219A1

公开(公告)日：2015-12-31

申请号：US14845833

申请日：2015-09-04

Applicant: Shibaura Mechatronics Corporation

Inventor： Kensuke Demura

IPC: H01J37/32

CPC classification number: H01J37/32715 ,  G03F1/60 ,  G03F7/427 ,  H01J37/32229 ,  H01J37/32422 ,  H01J37/32486 ,  H01J37/32825 ,  H01L21/68757

Abstract: According to one embodiment, in a mounting stage for mounting a target substrate subjected to processing with reducing radicals, the mounting stage includes a mounting surface covered with the target substrate in plan view, a non-mounting surface adjacent to the mounting surface, and a mounting part configured to hold the target substrate. The mounting part is projected from the mounting surface and holds the target substrate so as to form a space between a back surface of the target substrate and the mounting surface during the processing, and surface of the mounting surface and the non-mounting surface are covered with a material suppressing deactivation of reducing radicals.

Abstract translation: 根据一个实施例，在用于安装经过还原自由基处理的目标基板的安装阶段中，安装台包括在平面图中被目标基板覆盖的安装表面，与安装表面相邻的非安装表面，以及 配置成保持目标基板的安装部件。 安装部从安装面突出并保持目标基板，以在加工过程中在目标基板的背面和安装面之间形成空间，并且安装面和非安装面的表面被覆盖 具有抑制还原自由基的失活的材料。