公开(公告)号：US08614047B2

公开(公告)日：2013-12-24

申请号：US13219599

申请日：2011-08-26

申请人： Ramakrishnan Ayothi ,  William D. Hinsberg ,  Sally A. Swanson ,  Gregory M. Wallraff

发明人： Ramakrishnan Ayothi ,  William D. Hinsberg ,  Sally A. Swanson ,  Gregory M. Wallraff

IPC分类号： C07C55/02 ,  G03F7/004 ,  G03F7/26

CPC分类号： C07C55/08 ,  C07C55/12 ,  C07C55/14 ,  C07C55/32 ,  C07C59/21 ,  C07C59/245 ,  C07C59/295 ,  C07C59/315 ,  C07C59/347 ,  C07C229/24 ,  C07D241/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.

摘要翻译： 提供了具有显示增加的成像性能的具有二羧酸阴离子基团的新颖的对称和不对称双功能可光分解碱（PDB）。 还提供了使用双功能二羧酸化PDB制备的光致抗蚀剂组合物和使用本发明的光致抗蚀剂组合物的光刻方法。

公开(公告)号：US08273886B2

公开(公告)日：2012-09-25

申请号：US12199607

申请日：2008-08-27

申请人： Ali Afzali-Ardakani ,  Cherie R. Kagan ,  Laura L. Kosbar ,  Sally A. Swanson ,  Charan Srinivasan

发明人： Ali Afzali-Ardakani ,  Cherie R. Kagan ,  Laura L. Kosbar ,  Sally A. Swanson ,  Charan Srinivasan

IPC分类号： C07F7/02 ,  C07F9/06 ,  C07F9/02 ,  C07D213/22

CPC分类号： C23C22/02 ,  B82Y10/00 ,  G03F7/165 ,  G03F7/405

摘要： The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.

摘要翻译： 本发明涉及一种辐射敏感化合物，其包含接近化合物一端的表面结合基团，用于连接至底物，以及靠近化合物相对端的金属结合基团。 金属结合组不辐射敏感。 辐射敏感化合物还包括设置在表面结合基团和金属结合基团之间的主体部分和位于主体部分中或与金属结合基团相邻的辐射敏感组。 表面结合基团能够附着于选自金属，金属氧化物或半导体材料的基板。

公开(公告)号：US20110042862A1

公开(公告)日：2011-02-24

申请号：US12545161

申请日：2009-08-21

申请人： Frances A. Houle ,  Sally A. Swanson ,  Taiichi Furukawa

发明人： Frances A. Houle ,  Sally A. Swanson ,  Taiichi Furukawa

IPC分类号： B29C35/08 ,  B29C59/02 ,  G03F7/004

CPC分类号： G03F7/027 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.

摘要翻译： 适用于UV印迹光刻应用的涂料组合物包括至少一种具有至少两个乙烯基醚基团的乙烯基醚交联剂; 至少一种包含单官能乙烯基醚化合物的稀释剂; 所述至少一种光致酸产生剂可溶于所述至少一种单官能乙烯基醚化合物和所述至少一种具有所述至少两个乙烯基醚基团的乙烯基醚交联剂中选定的一种或两种; 和至少一种稳定剂，其包含在酯位或α位选择性地被取代基取代的酯化合物。 还公开了压印过程。