公开(公告)号：US07166233B2

公开(公告)日：2007-01-23

申请号：US10076099

申请日：2002-02-15

申请人： Wayne L. Johnson ,  Eric J. Strang

发明人： Wayne L. Johnson ,  Eric J. Strang

IPC分类号： C23C16/00 ,  H01L21/306

CPC分类号： H01J37/3244 ,  H01J37/32082 ,  H01J37/32137 ,  H01L21/31116

摘要： In a method for performing a plasma-assisted treatment on a substrate in a reactor chamber by: introducing at least one process gas into the reactor chamber; and creating a plasma within the reactor chamber by establishing an RF electromagnetic field within the chamber and allowing the field to interact with the process gas, the electromagnetic field is controlled to have an energy level which varies cyclically between at least two values each sufficient to maintain the plasma, such that each energy level value is associated with performance of a respectively different treatment process on the substrate.

摘要翻译： 在用于通过以下方式对反应器室中的衬底进行等离子体辅助处理的方法：将至少一种工艺气体引入反应器室; 以及通过在所述室内建立RF电磁场并且允许所述场与所述工艺气体相互作用来在所述反应器室内产生等离子体，所述电磁场被控制为具有能够在至少两个值之间周期性变化的能级，所述至少两个值足以维持 等离子体，使得每个能级值与在衬底上分别不同的处理过程的性能相关联。

公开(公告)号：US07075031B2

公开(公告)日：2006-07-11

申请号：US10399981

申请日：2001-10-24

申请人： Eric J. Strang ,  Andrej Mitrovic ,  Jim Fordemwalt ,  Wayne L. Johnson

发明人： Eric J. Strang ,  Andrej Mitrovic ,  Jim Fordemwalt ,  Wayne L. Johnson

IPC分类号： B23K9/00

CPC分类号： H01L21/67248 ,  H01J37/32724 ,  H01L21/67069 ,  H01L21/67109

摘要： A method of and a structure for controlling the temperature of an electrode (4). The electrode is heated prior to etching the first wafer and both a (temporally) stationary and a (spatially) homogeneous temperature of the silicon electrode are maintained. Resistive heater elements (1) are either embedded within the housing of the electrode (3) or formed as part of the electrode. The resistive heater elements form a heater of a multi-zone type in order to minimize the temperature non-uniformity. The resistive heater elements are divided into a plurality of zones, wherein the power to each zone can be adjusted individually, allowing the desirable temperature uniformity of the electrode to be achieved. Preheating the electrode to the appropriate operating temperature eliminates both the “first wafer effect” and non-uniform etching of a semiconductor wafer.

摘要翻译： 一种用于控制电极（4）的温度的方法和结构。 在蚀刻第一晶片之前对电极进行加热，并保持硅电极的（时间上）固定和（空间上）均匀的温度。 电阻式加热器元件（1）嵌入电极（3）的外壳内或形成电极的一部分。 电阻加热器元件形成多区类型的加热器，以使温度不均匀化最小化。 电阻加热器元件被分成多个区域，其中可以单独地调节每个区域的功率，从而实现电极所需的温度均匀性。 将电极预热到适当的工作温度，消除半导体晶片的“第一晶片效应”和非均匀蚀刻。

公开(公告)号：US06891124B2

公开(公告)日：2005-05-10

申请号：US10168544

申请日：2001-01-05

申请人： Medona B. Denton ,  Wayne L. Johnson ,  Murray D. Sirkis

发明人： Medona B. Denton ,  Wayne L. Johnson ,  Murray D. Sirkis

IPC分类号： G01J5/02 ,  G01J5/00 ,  G01K11/12 ,  H01L21/00 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/66 ,  B23K10/00

CPC分类号： G01K11/12 ,  H01L21/67248 ,  H01L22/12 ,  H01L22/26

摘要： A method and system for using transmission spectroscopy to measure a temperature of a substrate (135). By passing light through a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the wafer. This in-situ method and system can be used as a feedback control in combination with a variable temperature substrate holder (182) to more accurately control the processing conditions of the substrate. By utilizing a multiplicity of measurement sites the variation of the temperature across the substrate (135) can also be measured.

摘要翻译： 一种使用透射光谱测量基板（135）的温度的方法和系统。 通过使光通过基板，可以使用晶片的带边特性来确定基板的温度。 这种原位方法和系统可以用作与可变温度衬底保持器（182）组合的反馈控制，以更精确地控制衬底的处理条件。 通过利用多个测量点，也可以测量跨越衬底（135）的温度变化。

公开(公告)号：US06757673B2

公开(公告)日：2004-06-29

申请号：US09969170

申请日：2001-10-01

申请人： Eric J. Makus ,  Robert L. Usibelli ,  Sean M. Usibelli ,  Edwin Thorne, III ,  Wayne L. Johnson

发明人： Eric J. Makus ,  Robert L. Usibelli ,  Sean M. Usibelli ,  Edwin Thorne, III ,  Wayne L. Johnson

IPC分类号： G16F1730

CPC分类号： G06F17/30994 ,  G06F17/30991 ,  Y10S707/99933 ,  Y10S707/99934 ,  Y10S707/99943

摘要： A data viewer for displaying information selected from hierarchically organized data enables hierarchical searching by displaying hierarchical levels, or alternatively, by implementing an index search of selected data elements. If the index search is selected, an alphabetically ordered list of selected subjects, categories, and subcategories in the database is displayed for the hierarchically organized data. The selected subjects, categories, and subcategories are each associated with a database record and not with a lower hierarchical level that is a category or subcategory. Upon selecting an element from the index, the user is presented with a topical list. Any topic can be selected to display additional information. When an element is selected during an index search, the hierarchical relationship of the selected element to the hierarchical levels above it is also displayed, enabling the user to select a different hierarchical level that appears more relevant to the information desired.

摘要翻译： 用于显示从层次组织的数据中选择的信息的数据查看器通过显示分层级别来启用分级搜索，或者通过实现所选数据元素的索引搜索。 如果选择索引搜索，则显示数据库中所选主题，类别和子类别的按字母顺序排列的列表，用于分层组织的数据。 所选择的对象，类别和子类别都与数据库记录相关联，而不是具有作为类别或子类别的较低层级。 在从索引中选择一个元素后，向用户呈现一个主题列表。 可以选择任何主题来显示其他信息。 当在索引搜索期间选择元素时，还显示所选元素与其上方的分层级别的层次关系，使得用户能够选择与所需信息更相关的不同层级。

公开(公告)号：US06559601B1

公开(公告)日：2003-05-06

申请号：US09869766

申请日：2001-07-02

申请人： Wayne L. Johnson ,  Raphael A. Dandl ,  Gareth E. Guest

发明人： Wayne L. Johnson ,  Raphael A. Dandl ,  Gareth E. Guest

IPC分类号： F04B3702

CPC分类号： H01J37/32834 ,  H01J41/12 ,  H01J41/18 ,  H05H1/54

摘要： A plasma pump and method for pumping ions from a first to second region, the pump including a partition member having a through opening defining a plurality of conduits (30); a group of magnets (24) to provide magnetic forces that extend to the conduits; and a plurality of electric potential sources (14) for creating electrostatic fields which accelerate ions from the conduits to the second region.

摘要翻译： 一种用于从第一到第二区域泵送离子的等离子体泵和方法，所述泵包括具有限定多个导管（30）的通孔的分隔构件; 一组磁体（24），用于提供延伸到导管的磁力; 以及用于产生将离子从管道加速到第二区域的静电场的多个电位源（14）。

公开(公告)号：US06385977B1

公开(公告)日：2002-05-14

申请号：US09774183

申请日：2001-02-05

申请人： Wayne L. Johnson

发明人： Wayne L. Johnson

IPC分类号： F25D1702

CPC分类号： H01L21/67109 ,  H01J37/32082 ,  H01J37/32522

摘要： A method and system for cooling an electrostatically shielded radio frequency (ESRF) plasma source. The method and system utilize an electrostatic shield, having plural ribs, which vaporizes a coolant and sprays the vapor against a process tube or a bias shield. The vapor is either sprayed underneath the ribs or between adjacent ribs. This design avoids using baths of liquid coolants that can absorb gases which lead to arcing between induction coils.

摘要翻译： 一种用于冷却静电屏蔽射频（ESRF）等离子体源的方法和系统。 该方法和系统利用具有多个肋的静电屏蔽，其将汽化蒸发冷却剂并将蒸气喷射到处理管或偏置屏蔽上。 蒸汽喷涂在肋条下方或相邻肋条之间。 该设计避免使用可吸收导致感应线圈之间电弧的气体的液体冷却剂浴。

公开(公告)号：US5234529A

公开(公告)日：1993-08-10

申请号：US774557

申请日：1991-10-10

申请人： Wayne L. Johnson

发明人： Wayne L. Johnson

IPC分类号： H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32082 ,  H05H1/46 ,  H01J2237/0266

摘要： A plasma generating apparatus includes a plasma containing region and an R.F. coil for generating R.F. electric fields within the plasma region for creating a plasma from a gas flowed through the region. A capacitive shield is disposed between the coil and the plasma region for limiting the amount of capacitive coupling while not completely eliminating it, between the R.F. coil and the plasma region. The shield can include a means for varying the shielding effect thereof during processes employing the plasma.

摘要翻译： 等离子体发生装置包括等离子体包含区域和R.F. 用于生成R.F.的线圈 等离子体区域内的电场，用于从流过该区域的气体产生等离子体。 在线圈和等离子体区域之间设置电容屏蔽，用于限制电容耦合的量，而不是完全消除电容耦合。 线圈和等离子体区域。 屏蔽层可以包括用于在使用等离子体的工艺过程中改变其屏蔽效应的装置。

公开(公告)号：US4918031A

公开(公告)日：1990-04-17

申请号：US290740

申请日：1988-12-28

申请人： Daniel L. Flamm ,  Dale E. Ibbotson ,  Wayne L. Johnson

发明人： Daniel L. Flamm ,  Dale E. Ibbotson ,  Wayne L. Johnson

IPC分类号： H01L21/302 ,  H01J37/32 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/18 ,  H05H1/46

CPC分类号： H05H1/30 ,  H01J37/321 ,  H05H1/46 ,  H01J2237/3345 ,  Y10S438/949

摘要： Anisotropic plasma etching is accomplished utilizing a helical resonator operated at relatively low gas pressure. The use of this combination yields an extremely high flux of ionic species with resulting rapid anisotropic etching. A helical resonator in conjunction with suitable precursors is also quite useful for plasma induced deposition.

公开(公告)号：US4874464A

公开(公告)日：1989-10-17

申请号：US167347

申请日：1988-03-14

申请人： Dennis L. Goodwin ,  Mark R. Hawkins ,  Wayne L. Johnson ,  Aage Olsen ,  McDonald Robinson

发明人： Dennis L. Goodwin ,  Mark R. Hawkins ,  Wayne L. Johnson ,  Aage Olsen ,  McDonald Robinson

IPC分类号： C30B25/02 ,  C30B25/10 ,  C30B29/06 ,  H01L21/205

CPC分类号： C30B29/06 ,  C30B25/10 ,  Y10S438/905

摘要： The present invention relates to a high throughput single crystal epitaxial deposition process which achieves increased uniformity, both wafer to wafer and across the wafer surface. There is provided an epitaxial deposition process characterized by low-level cooling periods which minimize temperature changes between deposition cycles and inter-cycle cleaning so that each new wafer is presented with a substantially equivalent deposition environment.

摘要翻译： 本发明涉及一种高通量单晶外延沉积工艺，其实现了晶片与晶片和晶圆表面之间的均匀性的提高。 提供了一种外延沉积工艺，其特征在于低水平冷却时间，其使沉积循环和循环间清洁之间的温度变化最小化，使得每个新晶片呈现基本相同的沉积环境。

公开(公告)号：US4789771A

公开(公告)日：1988-12-06

申请号：US31519

申请日：1987-03-27

申请人： McDonald Robinson ,  Ronald D. Behee ,  Wiebe B. deBoer ,  Wayne L. Johnson

发明人： McDonald Robinson ,  Ronald D. Behee ,  Wiebe B. deBoer ,  Wayne L. Johnson

IPC分类号： C30B25/10 ,  F27B5/14 ,  F27D11/02

CPC分类号： C30B25/105

摘要： An apparatus and method for heating a substrate and associated rotatable susceptor in an epitaxial deposition reactor with an axially symmetric gas flow carrying deposition material include at least one chamber having a plurality of heat lamps. The chamber is generally symmetric with respect to an axis of the substrate. The chamber walls are coated to reflect light from the heat lamps. The outermost heat lamps can be energized to produce a higher temperature than the centrally located lamps to compensate for regions of the reactor which provide access to the substrate and, therefore, promote thermal losses. The spacing of the heat lamps may be varied to compensate for thermal non-uniformity of the heating cavity. The substrate may be rotated, on the rotatable susceptor, to average the thermal environment to which the substrate is exposed.

摘要翻译： 用于加热具有轴向对称气体流动沉积材料的外延沉积反应器中的衬底和相关联的可旋转感受器的装置和方法包括具有多个加热灯的至少一个腔室。 腔室通常相对于衬底的轴线对称。 室壁被涂覆以反射来自加热灯的光。 最外面的加热灯可以通电以产生比位于中心的灯更高的温度，以补偿反应器的提供对基板的通路并因此促进热损失的区域。 可以改变加热灯的间隔以补偿加热腔的热不均匀性。 衬底可以在可旋转的基座上旋转以平均衬底暴露于的热环境。