Abstract:
An ultra-high vacuum (UHV) system includes a UHV cell and an ion pump to maintain the UHV in the UHV cell. The ion pump has a GCC (glass, ceramic, or crystalline) housing. An interior wall of the ion-pump housing serves as an anode or bears a coating that serves as an anode. At least one cathode is disposed with respect to the housing so that it can cooperate with the anode to form an electric field for establishing a Penning trap. The GCC housing defines a flow channel that extends radially through the anode so that a molecule can flow directly into the most ionizing region of a Penning trap.
Abstract:
A method and apparatus are provided for pumping gas. The method includes the steps of providing an orifice with an entry diameter that is substantially larger than an exit diameter, imposing a non-uniform electric field between the entry and exit of the orifice and pumping permanent and field induced molecular dipoles through the orifice using the non-uniform electric field wherein the dipoles drift towards a direction of higher field strength within the non-uniform, time-dependent and multi-phase electric field.
Abstract:
The present invention provides a micro vacuum pump capable of enhancing the performance of exhausting rare gases as well as active gases thereby to ensure quality, good repeatability and stable getter action of the micro vacuum pump over a long time. The invention also provides an apparatus assembling the micro vacuum pump. The micro vacuum pump capable of maintaining a high degree of vacuum includes a first conductive substrate having many protrusions and mounting a second conductive substrate disposed with a predetermined interval provided with respect to the first conductive substrate so that it faces the protrusions. A gate electrode is disposed in the vicinity of the apexes of the protrusions on the first conductive substrate via an insulator layer, and is positioned to face the second conductive substrate. Relative to the first conductive substrate, a negative potential is supplied to the second conductive substrate, and, a same negative potential difference is also applied to the gate electrode relative to the cones.
Abstract:
An ion pump permits the continuous evacuation of a small-envelope vacuum chamber while drawing a relatively small amount of power (micro watts). In a preferred embodiment, the present ion pump, due to its small size and integration within the vacuum chamber, enables the device in which the vacuum chamber is incorporated to be portable and to retain its original dimensions.
Abstract:
A fluidic device is disclosed, comprising an enclosed passage that is adapted to convey a circulating fluid. The enclosed passage comprises a flow unit having a first electrode and a second electrode offset from the first electrode in a downstream direction of a flow of the circulating fluid. The first electrode is formed as a grid structure and arranged to allow the circulating fluid to flow through the first electrode. The fluidic device may be used for controlling or regulating the flow of the fluid circulating in the enclosed passage, and thereby act as a valve opening, reducing or even closing the passage.
Abstract:
Within an ion pump, accelerated ions leave the center portion of an anode tube due to the anode tube symmetry and the generally symmetrical electric fields present. The apparent symmetry within the anode tube may be altered by making the anode tube longitudinally segmented and applying independent voltages to each segment. The voltages on two adjacent segments may be time varying at different rates to achieve a rasterizing process. In various embodiments, one or more wire internal to the anode structure and having a time-varying electric potential may alter the trajectory of the ions leaving the anode tube, as may the shape of the anode near the ends of the anode tube.
Abstract:
A sputter ion pump (1) has an improved magnet assembly comprising primary magnets (9a, 9b), disposed on opposite ends of the pump cells of an anode, and secondary magnets (11; 11′, 11″) disposed on one side only of the pump cells, whereby the assembly exhibits an asymmetrical configuration. The sputter ion pump with the improved magnet assembly allows for attaining high pumping speeds even at low pressures with reduced size, weight and manufacturing cost of the pump itself.
Abstract:
There is provided a sputter ion pump that it has a simple structure, a size and a weight can be reduced, the magnetic fields in the vicinity of a central axis can be nullified in the both of a radial and axial directions, and ultimate pressure of the pump can be increased. The sputter ion pump comprises a vacuum chamber that includes an inner wall having a cylindrical section where is formed to be rugged in a cross section. The rugged cylindrical section has outer recesses each of which is provided with a permanent magnets each having a same shape and a same characteristic so that a magnetic pole is directed to a same direction. The rugged cylindrical section has also inner recesses each of which is provided with a cylindrical anode electrode member spaced from the vacuum chamber wall. The rugged cylindrical section of the vacuum chamber wall is formed as a cathode electrode. A cylindrical shield member having a peripheral portion provided with evacuating bores is provided coaxially to the permanent magnets and anode electrodes. The permanent magnets and anode electrode members are arranged with equal spacing in a axis symmetrical configuraton.
Abstract:
An exhaust apparatus and a high vacuum pumping unit including such high vacuum device and an auxiliary vacuum pump are disclosed, wherein a high vacuum is achieved in a vacuum vessel such that the gas molecules within the vacuum vessel are ionized and accelerated to be exhausted and, further, in the high vacuum pumping unit, those gas molecules diffused back or desorbed from the vacuum pump are ionized and accelerated to be returned to the vacuum pump.