ORGANIC ELECTROLUMINESCENT DEVICE AND MANUFACTURING METHOD THEREFOR
    25.
    发明申请
    ORGANIC ELECTROLUMINESCENT DEVICE AND MANUFACTURING METHOD THEREFOR 有权
    有机电致发光器件及其制造方法

    公开(公告)号:US20160358980A1

    公开(公告)日:2016-12-08

    申请号:US15101528

    申请日:2014-11-26

    Abstract: An organic EL device includes a substrate and a plurality of organic EL elements disposed on the substrate. Each of the plurality of organic EL elements includes a light-emitting layer containing a light-emitting material. One of the plurality of organic EL elements includes a first film containing the same light-emitting material as the light-emitting layer of another one of the plurality of organic EL elements, the first film being in contact with an upper surface of the light-emitting layer of the one of the plurality of organic EL elements. The one of the plurality of organic EL elements does not include a second film containing the same light-emitting material as the light-emitting layer of another one of the plurality of organic EL elements, the second film being in contact with a lower surface of the light-emitting layer of the one of the plurality of organic EL elements.

    Abstract translation: 有机EL器件包括衬底和设置在衬底上的多个有机EL元件。 多个有机EL元件中的每一个包括含有发光材料的发光层。 多个有机EL元件中的一个包括含有与多个有机EL元件中的另一个的发光层相同的发光材料的第一膜,第一膜与发光层的上表面接触, 所述多个有机EL元件中的一个的发光层。 多个有机EL元件中的一个不包括包含与多个有机EL元件中的另一个的发光层相同的发光材料的第二膜,第二膜与下部表面接触 所述多个有机EL元件中的一个的发光层。

    VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENT ELEMENT
    26.
    发明申请
    VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENT ELEMENT 有权
    蒸气沉积装置,蒸气沉积方法和生产有机电致发光元件的方法

    公开(公告)号:US20160155944A1

    公开(公告)日:2016-06-02

    申请号:US14903603

    申请日:2014-03-04

    Abstract: The vapor deposition apparatus employs scanning vapor deposition, and includes a limiting component including a first plate portion; a second plate portion provided with a space from the first plate portion; and a joint portion combining the first plate portion with the second plate portion, the first plate portion being provided with an first opening, the second plate portion being provided with an second opening that faces the first opening, the vapor deposition apparatus including a first space between the first opening and the second opening, the vapor deposition apparatus including a second space between the first plate portion and the second plate portion, the first space being connected to the second space, the vapor deposition apparatus including a third space that is in the outside of the limiting component, the second space being connected to the third space.

    Abstract translation: 气相沉积装置采用扫描气相沉积,并包括限制部件,其包括第一板部分; 第二板部,其从所述第一板部设置有空间; 以及将所述第一板部与所述第二板部组合的接合部,所述第一板部设置有第一开口,所述第二板部设置有与所述第一开口对置的第二开口,所述蒸镀装置具有第一空间 在第一开口和第二开口之间,气相沉积装置包括在第一板部分和第二板部分之间的第二空间,第一空间连接到第二空间,气相沉积装置包括位于第一开口和第二开口之间的第三空间, 在限制部件外部,第二空间连接到第三空间。

    RESTRICTING PLATE UNIT, VAPOR DEPOSITION UNIT, AND VAPOR DEPOSITION DEVICE
    27.
    发明申请
    RESTRICTING PLATE UNIT, VAPOR DEPOSITION UNIT, AND VAPOR DEPOSITION DEVICE 审中-公开
    限制板单元,蒸气沉积单元和蒸发沉积装置

    公开(公告)号:US20160122861A1

    公开(公告)日:2016-05-05

    申请号:US14897182

    申请日:2014-03-30

    Abstract: A vapor deposition unit (1) includes a vapor deposition mask (50), a vapor deposition source (10), and a limiting plate unit (20). The limiting plate unit (20) includes (i) a plurality of first limiting plates (32) separated from each other in an X axis direction and (ii) a plurality of second limiting plates (42) disposed directly above the first limiting plates (32) in a plan view and separated from each other in the X axis direction. At least two second limiting plates (42) are arranged in the X axis direction for each first limiting plate (32).

    Abstract translation: 气相沉积单元(1)包括气相沉积掩模(50),气相沉积源(10)和限制板单元(20)。 限制板单元(20)包括(i)在X轴方向上彼此分离的多个第一限制板(32)和(ii)多个第二限位板(42),其设置在第一限位板 32),并且在X轴方向上彼此分离。 对于每个第一限位板(32),沿X轴方向布置至少两个第二限制板(42)。

    VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD
    28.
    发明申请
    VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD 有权
    蒸气沉积装置和蒸气沉积方法

    公开(公告)号:US20150361546A1

    公开(公告)日:2015-12-17

    申请号:US14765557

    申请日:2014-01-28

    CPC classification number: C23C16/042 C23C14/04 C23C14/12 H01L51/001 H01L51/50

    Abstract: The vapor deposition device includes a plurality of vapor deposition masks whose lengths in Y axis and X axis directions are shorter than those of a film formation target substrate. Vapor deposition masks adjacent to each other in the Y axis direction is positionally displaced in the X axis direction. In an overlapping area in which mask opening group areas adjacent to each other in the Y axis direction overlap with each other in the X axis direction, opening lengths in the Y axis direction become shorter toward the outer side of each of the mask opening group areas in the plan view.

    Abstract translation: 气相沉积装置包括多个蒸镀掩模,其长度在Y轴和X轴方向上短于成膜靶基板的长度。 在Y轴方向上彼此相邻的蒸镀掩模在X轴方向上位移。 在Y轴方向上彼此相邻的掩模开口组区域在X轴方向上重叠的重叠区域中,Y轴方向的开口长度朝向每个掩模开口组区域的外侧变短 在平面图中。

    VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE
    29.
    发明申请
    VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE 有权
    蒸气沉积装置,蒸发沉积方法和制造有机电致发光显示装置的方法

    公开(公告)号:US20140345527A1

    公开(公告)日:2014-11-27

    申请号:US14452470

    申请日:2014-08-05

    Abstract: A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), the vapor deposition device including a vapor deposition source (80) that has an injection hole (81) from which vapor deposition particles are injected, a vapor deposition particle crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80), and a rotation motor (86) for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source (80).

    Abstract translation: 根据本发明的蒸镀装置(50)是在成膜基板(60)上形成膜的蒸镀装置,其特征在于,所述蒸镀装置具有:蒸镀源(80),具有喷射孔 ),用于将气相沉积粒子供给到气相沉积源(80)的气相沉积粒子坩埚(82)和用于改变蒸汽喷射量分布的旋转马达(86) 通过旋转气相沉积源(80)来沉积颗粒。

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