INSPECTION APPARATUS AND METHOD
    21.
    发明申请
    INSPECTION APPARATUS AND METHOD 审中-公开
    检查装置和方法

    公开(公告)号:US20120307043A1

    公开(公告)日:2012-12-06

    申请号:US13440080

    申请日:2012-04-05

    IPC分类号: H04N7/18

    摘要: An inspection apparatus and method comprising a unit for acquiring an optical image of an object to be inspected by irradiating the object with light, wherein the unit includes a line sensor comprising a plurality of sensors linearly arranged in a row, a generating unit for generating a reference image from design data of the object to be inspected, a comparing unit for comparing the optical image with the reference image, a unit for storing data of three lines acquired by the line sensor, and calculating differences between a gradation value of a pixel on a center line and each gradation value of the eight pixels adjacent to the pixel determining if the pixel is a defect if all of the eight differences of the adjacent pixels are more than a predetermined threshold.

    摘要翻译: 一种检查装置和方法,包括:用于通过用光照射所述物体来获取待检查物体的光学图像的单元,其中所述单元包括线阵列,所述线传感器包括以行直线排列的多个传感器;生成单元, 参考图像,用于将光学图像与参考图像进行比较,比较单元,用于存储由线传感器获取的三条线的数据,以及计算像素的灰度值之间的差异 中心线和与像素相邻的八个像素的每个灰度值,如果相邻像素的所有八个差都超过预定阈值,则确定像素是否是缺陷。

    Die-to-die photomask defect detection using region data to modify inspection thresholds
    22.
    发明授权
    Die-to-die photomask defect detection using region data to modify inspection thresholds 有权
    使用区域数据进行死模光掩模缺陷检测,以修改检查阈值

    公开(公告)号:US07630535B2

    公开(公告)日:2009-12-08

    申请号:US11276426

    申请日:2006-02-28

    申请人: Ikunao Isomura

    发明人: Ikunao Isomura

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001 G06T2207/30148

    摘要: A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.

    摘要翻译: 一种图案检查装置,其将与待检查的同一目标板的多个部分光学图像数据进行比较,所述目标板形成为图案,包括光学图像数据获取单元,其获取待检查的目标板的光学图像数据 以及比较多个部分光学图像数据的比较电路。 在比较电路中,输入基于表示预定区域的区域图案的信息生成的区域图像数据,并且当将多个部分光学图像数据彼此进行比较时,参照输入区域图像数据改变判定基准, 决定目标板上是否存在缺陷。

    ULTRAFINE LITHOGRAPHY PATTERN INSPECTION USING MULTI-STAGE TDI IMAGE SENSORS WITH FALSE IMAGE REMOVABILITY
    23.
    发明申请
    ULTRAFINE LITHOGRAPHY PATTERN INSPECTION USING MULTI-STAGE TDI IMAGE SENSORS WITH FALSE IMAGE REMOVABILITY 有权
    使用多级TDI图像传感器进行超声图像扫描模式检测,具有不正确的图像去除能力

    公开(公告)号:US20090238446A1

    公开(公告)日:2009-09-24

    申请号:US12395840

    申请日:2009-03-02

    IPC分类号: G06K9/62

    摘要: A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.

    摘要翻译: 工件检查装置包括测量图像发生器单元,被配置为测量工件的图案并产生测量图像; 以及比较器单元,被配置为将所测量的图像与基准图像进行比较,其中所述测量的图像生成器单元包括具有两个或更多个时间延迟积分(TDI)传感器的互连的光接收装置,每个传感器由两个或更多个线传感器 每个由两个或更多个像素排列,用于相对于工件的图案的位置产生除了每个TDI传感器的像素之外的异常像素值的像素值的平均值作为测量图像。

    Pattern inspection apparatus, pattern inspection method, and program-recorded readable recording medium
    24.
    发明申请
    Pattern inspection apparatus, pattern inspection method, and program-recorded readable recording medium 有权
    图案检查装置,图案检查方法和程序记录可读记录介质

    公开(公告)号:US20070047799A1

    公开(公告)日:2007-03-01

    申请号:US11284186

    申请日:2005-11-22

    申请人: Ikunao Isomura

    发明人: Ikunao Isomura

    IPC分类号: G06K9/00

    摘要: It is an object of the present invention to provide a method and apparatus for performing pattern inspection at an appropriate precision. A pattern inspection apparatus according to an embodiment of the present invention comprises an optical image acquiring unit which acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern, a design image data generating unit which generates design image data based on a design pattern serving as a base for pattern formation of the target plate, and a comparing unit which compares the optical image data with the design image data. In the comparing unit, region image data generated based on the information of the region pattern representing a predetermined region and formed in the same format as that of information of the design pattern is input, and a determination condition is changed based on the region image data when the optical image data is compared with the design image data.

    摘要翻译: 本发明的目的是提供一种以适当的精度进行图案检查的方法和装置。 根据本发明实施例的图案检查装置包括光学图像获取单元,其获取待检查的目标板的光学图像数据,目标板形成为图案;设计图像数据生成单元,其生成设计图像 基于用作目标板的图案形成的基础的设计图案的数据,以及将光学图像数据与设计图像数据进行比较的比较单元。 在比较单元中,输入基于表示与设计图案的信息相同格式形成的预定区域的区域图案的信息生成的区域图像数据,并且基于区域图像数据改变确定条件 当光学图像数据与设计图像数据进行比较时。

    Inspection apparatus and method for detecting false defects

    公开(公告)号:US10578560B2

    公开(公告)日:2020-03-03

    申请号:US13440080

    申请日:2012-04-05

    IPC分类号: H04N7/18 G01N21/956

    摘要: An inspection apparatus and method comprising a unit for acquiring an optical image of an object to be inspected by irradiating the object with light, wherein the unit includes a line sensor comprising a plurality of sensors linearly arranged in a row, a generating unit for generating a reference image from design data of the object to be inspected, a comparing unit for comparing the optical image with the reference image, a unit for storing data of three lines acquired by the line sensor, and calculating differences between a gradation value of a pixel on a center line and each gradation value of the eight pixels adjacent to the pixel determining if the pixel is a defect if all of the eight differences of the adjacent pixels are more than a predetermined threshold.

    Pattern inspection apparatus and pattern inspection method
    26.
    发明授权
    Pattern inspection apparatus and pattern inspection method 有权
    图案检验装置和图案检验方法

    公开(公告)号:US08442320B2

    公开(公告)日:2013-05-14

    申请号:US12815731

    申请日:2010-06-15

    IPC分类号: G06K9/00

    CPC分类号: G03F1/84 G01N21/95607

    摘要: A pattern inspection apparatus includes: an optical image acquiring unit configured to acquire optical image data of a target object on which each of a plurality of identical patterns is respectively formed at a respective corresponding position of a plurality of forming positions with distortion; a cut-out unit configured to cut out a plurality of partial optical image data from the optical image data; a correction unit configured to correct positions of the plurality of partial optical image data by using distortion information from which each amount of distortion of the plurality of identical patterns respectively formed at the respective corresponding position of the plurality of forming positions on the target object can be acquired; and a comparison unit configured to compare a plurality of corrected partial optical image data against each other on a pixel to pixel basis.

    摘要翻译: 图案检查装置包括:光学图像获取单元,其被配置为获取其中分别在多个具有失真的多个成形位置的相应对应位置处形成有多个相同图案中的每一个的目标对象的光学图像数据; 切出单元,被配置为从所述光学图像数据切出多个部分光学图像数据; 校正单元,被配置为通过使用失真信息来校正多个部分光学图像数据的位置,所述失真信息分别形成在目标对象上的多个成形位置的各个对应位置处的多个相同图案的每个失真量可以是 获得 以及比较单元,被配置为在像素的基础上比较多个经校正的部分光学图像数据彼此。

    Ultrafine lithography pattern inspection using multi-stage TDI image sensors with false image removability
    27.
    发明授权
    Ultrafine lithography pattern inspection using multi-stage TDI image sensors with false image removability 有权
    使用具有假图像去除性的多级TDI图像传感器进行超细光刻图案检查

    公开(公告)号:US08254663B2

    公开(公告)日:2012-08-28

    申请号:US12395840

    申请日:2009-03-02

    IPC分类号: G06K9/00

    摘要: A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.

    摘要翻译: 工件检查装置包括测量图像发生器单元,被配置为测量工件的图案并产生测量图像; 以及比较器单元,被配置为将所测量的图像与基准图像进行比较,其中所述测量的图像生成器单元包括具有两个或更多个时间延迟积分(TDI)传感器的互连的光接收装置,每个传感器由两个或更多个线传感器 每个由两个或更多个像素排列,用于相对于工件的图案的位置产生除了每个TDI传感器的像素之外的异常像素值的像素值的平均值作为测量图像。

    PATTERN INSPECTION APPARATUS
    28.
    发明申请
    PATTERN INSPECTION APPARATUS 审中-公开
    图案检查装置

    公开(公告)号:US20120081538A1

    公开(公告)日:2012-04-05

    申请号:US13242655

    申请日:2011-09-23

    IPC分类号: H04N7/18

    CPC分类号: G01N21/956

    摘要: This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

    摘要翻译: 该图案检查装置包括:检查区域信息存储单元,其存储在图案区域中指定的检查区域;图案表面高度检测单元,其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元,确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时,自动聚焦机构控制单元驱动自动聚焦机构,并且确定单元确定图案表面高度测量位置不位于检查区域内, 自动对焦机构控制单元停止自动对焦机构。

    Photomask inspection apparatus comparing optical proximity correction patterns to minimum and maximum limits
    29.
    发明授权
    Photomask inspection apparatus comparing optical proximity correction patterns to minimum and maximum limits 有权
    光掩模检查装置将光学邻近校正模式与最小和最大限度进行比较

    公开(公告)号:US07664308B2

    公开(公告)日:2010-02-16

    申请号:US11283755

    申请日:2005-11-22

    申请人: Ikunao Isomura

    发明人: Ikunao Isomura

    CPC分类号: G06T7/001

    摘要: A pattern inspection apparatus includes an optical image acquiring unit that acquires optical image data of a target plate formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates first design image data based on a first design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus additionally includes a comparing unit that compares the optical image data and the first design image data with each other. Further, information of a second design pattern is input in parallel with information of the first design pattern to the pattern inspection apparatus. In the comparing unit, second design image data generated based on the second design pattern is further input, and the optical image data is compared with the second design image data in place of the first design image data.

    摘要翻译: 图案检查装置包括光学图像获取单元,其获取形成为图案的目标板的光学图像数据。 图案检查装置还包括设计图像数据生成单元,其基于用作目标板的图案形成的基础的第一设计图案来生成第一设计图像数据。 图案检查装置还包括将光学图像数据和第一设计图像数据彼此进行比较的比较单元。 此外,将第二设计图案的信息与第一设计图案的信息并行地输入到图案检查装置。 在比较单元中,进一步输入基于第二设计图案生成的第二设计图像数据,并将光学图像数据与第二设计图像数据进行比较以代替第一设计图像数据。

    Pattern inspection apparatus, pattern inspection method, and program-recorded readable recording medium
    30.
    发明申请
    Pattern inspection apparatus, pattern inspection method, and program-recorded readable recording medium 有权
    图案检查装置,图案检查方法和程序记录可读记录介质

    公开(公告)号:US20070047798A1

    公开(公告)日:2007-03-01

    申请号:US11283755

    申请日:2005-11-22

    申请人: Ikunao Isomura

    发明人: Ikunao Isomura

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001

    摘要: It is an object of the present invention to provide a method and apparatus for performing pattern inspection which reduces the number of pseudo defects. A pattern inspection apparatus according to an embodiment of the present invention comprises an optical image acquiring unit which acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern, a design image data generating unit which generates first design image data based on a first design pattern serving as a base for pattern formation of the target plate, and a comparing unit which compares the optical image data with the first design image data. In the comparing unit, second design image data generated based on a second design pattern is further input, and the optical image data is compared with the second design image data in place of the first design image data.

    摘要翻译: 本发明的目的是提供一种用于执行模式检查的方法和装置,其减少伪缺陷的数量。 根据本发明实施例的图案检查装置包括光学图像获取单元,其获取待检查的目标板的光学图像数据,目标板形成为图案;设计图像数据生成单元,其生成第一设计 基于作为目标板的图案形成的基础的第一设计图案的图像数据,以及将光学图像数据与第一设计图像数据进行比较的比较单元。 在比较单元中,进一步输入基于第二设计图案生成的第二设计图像数据,并将光学图像数据与第二设计图像数据进行比较以代替第一设计图像数据。