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    EFEM
    21.
    发明申请
    EFEM 有权

    公开(公告)号：US20150170945A1

    公开(公告)日：2015-06-18

    申请号：US14569293

    申请日：2014-12-12

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Mikio Segawa ,  Yasushi Taniyama ,  Mitsuo Natsume ,  Atsushi Suzuki ,  Toshihiro Kawai ,  Kunihiko Sato

    IPC: H01L21/673 ,  H01L21/677

    CPC classification number: H01L21/67017 ,  H01L21/67115 ,  H01L21/67766 ,  H01L21/67772 ,  H01L21/67778

    Abstract: An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31a provided on a wall 31, and connecting a processing apparatus 6; a wafer transport apparatus 2, and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4; a gas delivery port 11; a gas suction port 12; a gas feedback path 10; and a FFU 13 that includes a filter 13b that is provided in the gas delivery port 11, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.

    Abstract translation: EFEM包括壳体3，其构成通过将负载端口4连接到设置在壁31上的开口31a而基本上闭合的晶片运送室9，并且连接处理装置6; 晶片传送装置2，并且在处理装置6和安装在装载端口4上的FOUP 7之间传送晶片; 气体输送口11; 气体吸入口12; 气体反馈路径10; 以及FFU13，其包括设置在气体输送口11中的过滤器13b，并且消除了包含在输送气体中的颗粒，其中晶片输送室9中的气体通过在晶片输送室9中产生向下的气流而循环 并且通过气体反馈路径10反馈气体。

    CONVEYANCE SYSTEM
    24.
    发明申请
    CONVEYANCE SYSTEM 有权

    公开(公告)号：US20230033168A1

    公开(公告)日：2023-02-02

    申请号：US17788647

    申请日：2020-09-23

    Applicant: Sinfonia Technology Co., Ltd.

    Inventor： Hiroaki Nakamura ,  Toshihiro Kawai ,  Kosuke Sugiura ,  Gengoro Ogura ,  Yasushi Taniyama

    IPC: B65G47/90 ,  H01L21/687 ,  H01L21/67 ,  H01L21/677

    Abstract: A conveyance system discriminates the front and back of a frame wafer without human intervention. A frame is partially formed asymmetrically with respect to a predetermined center line when viewed in a direction orthogonal to a surface of a wafer. The conveyance system includes a hand configured to hold the frame so that the frame extends in a predetermined virtual plane, a first sensor configured to detect a portion of the frame held on the hand and located in a predetermined first region in the virtual plane, a second sensor configured to detect a portion of the frame held on the hand and located in a second region opposite to the first region across the center line, and a controller configured to determine the front and back of the frame wafer based on a detection result obtained by the first sensor and a detection result obtained by the second sensor.

    Gas supply device, method for controlling gas supply device, load port, and semiconductor manufacturing apparatus
    26.
    发明授权
    Gas supply device, method for controlling gas supply device, load port, and semiconductor manufacturing apparatus 有权

    公开(公告)号：US11139188B2

    公开(公告)日：2021-10-05

    申请号：US15961395

    申请日：2018-04-24

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Yasushi Taniyama ,  Toshimitsu Morihana

    IPC: H01L21/673 ,  H01L21/677

    Abstract: A purging nozzle unit of a gas supply device according to the present invention including: a housing that is capable of passing a predetermined gas so as to replace the internal atmosphere of a FOUP with the predetermined gas; a nozzle coming into intimate contact with the proximity of a port that is provided on one face of the FOUP, the nozzle being pressed to thereby open the port; an operation adjustment space configured to increase or decrease so as to operate the nozzle between a use posture in which the predetermined gas can be supplied into the target container via the port and a standby posture in which the predetermined gas cannot be supplied into the target container via the port; and a gas introducing part configured to export or import compression air relative to the operation adjustment space to thereby control an operation of the nozzle.

    Load port
    27.
    发明授权
    Load port 有权

    公开(公告)号：US10947063B2

    公开(公告)日：2021-03-16

    申请号：US16678661

    申请日：2019-11-08

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Atsushi Suzuki ,  Yasushi Taniyama

    IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  B65G49/00

    Abstract: A load port including: a base as part of a wall partitioning a transportation space from an external space; an opening provided to the base; a door configured to open and close the opening and securing a lid to, and releasing a lid from, a container containing contents; and a first seal member for sealing the space between the base and the container. At least some of the container-side end surface of the door is located nearer to the transportation space than the container-side end part of the first seal member. The load port can keep a surrounding space clean when a FOUP is connected to a casing.

    EXHAUST NOZZLE UNIT, LOAD PORT, AND EFEM
    29.
    发明申请
    EXHAUST NOZZLE UNIT, LOAD PORT, AND EFEM 审中-公开

    公开(公告)号：US20190326134A1

    公开(公告)日：2019-10-24

    申请号：US16387792

    申请日：2019-04-18

    Applicant: Sinfonia Technology Co., Ltd.

    Inventor： Atsushi Suzuki ,  Yasushi Taniyama ,  Tomoya Mizutani

    IPC: H01L21/67 ,  H01L21/677 ,  B05B1/00 ,  B05B1/30

    Abstract: There is provided an exhaust nozzle unit capable of discharging a gas atmosphere in a substrate storage container having a loading/unloading opening from the container to an outside of the container through a port formed on a bottom surface of the container. The exhausted nozzle includes a nozzle capable of switching the port from a closed state to an open state by pressing a valve of the port; and a housing configured to hold the nozzle so as to be movable up and down between a use posture in which the port is in the open state and a standby posture in which the port is in the closed state.

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