Horizontally layered MOMOM notch tunnel device
    21.
    发明授权
    Horizontally layered MOMOM notch tunnel device 失效
    水平分层MOMOM陷波器件

    公开(公告)号:US4633278A

    公开(公告)日:1986-12-30

    申请号:US683728

    申请日:1984-12-19

    CPC分类号: H01L45/00

    摘要: MOMOM structural geometry and fabrication techniques are disclosed. A first oxidizable metal strip (3) and a second coplanar nonoxidizable metal strip (6) are deposited on an insulating substrate (2). An insulating layer (12) is deposited on the metal strips, followed by deposition of a third nonoxidizable metal layer. A generally vertical notch (14) is cut through the layers to the substrate providing left and right sections (15, 16) of the third metal layer, left and right sections (19, 20) of the insulating layer, and the first and second metal layers with facing edges (23, 24) spaced by the notch therebetween. An oxidized tip (25) is formed at the facing edge of the first metal layer. A fourth metal layer (26) is ballistically deposited over the oxidized tip and the left section of the third metal layer, using the notch edge of the right section of the third metal layer as a shadow mask, followed by oxidization of the fourth metal layer. A fifth horizontal metal layer (30) is ballistically deposited by a vertically columnated beam along the substrate across the bottom (28) of the notch between the oxidation layer on the fourth metal layer and the facing edge (24) of the second metal layer. The M-O-M-O-M structure is provided by the first metal layer (3)-the oxidized tip (25)-the fourth metal layer (26) at a generally vertical portion (39)-the oxidation layer (29) on the fourth metal layer at a generally vertical portion (41)-the fifth metal layer (30) and the second metal layer (6).

    摘要翻译: 公开了MOMOM结构几何形状和制造技术。 第一可氧化金属带(3)和第二共面不可氧化金属条(6)沉积在绝缘基板(2)上。 绝缘层(12)沉积在金属条上,随后沉积第三个不可氧化的金属层。 大致垂直的切口(14)穿过层向基板切割,提供第三金属层的左和右部分(15,16),绝缘层的左部分和右部分(19,20)以及第一和第二 具有由它们之间的切口间隔开的相对边缘(23,24)的金属层。 在第一金属层的相对边缘处形成氧化的尖端(25)。 使用第三金属层的右部分的切口边缘作为荫罩,将第四金属层(26)弹性地沉积在第三金属层的氧化的末端和左侧部分上,然后氧化第四金属层 。 第五水平金属层(30)通过垂直的柱状光束沿着衬底穿过第四金属层上的氧化层和第二金属层的相对边缘(24)之间的凹口的底部(28)而弹道沉积。 MOMOM结构由第一金属层(3)提供 - 氧化末端(25) - 第四金属层(26)处于大致垂直的部分(39),第四金属层上的氧化层(29) 大致垂直部分(41) - 第五金属层(30)和第二金属层(6)。

    Lateral bidirectional power FET with notched multi-channel stacking and
with dual gate reference terminal means
    22.
    发明授权
    Lateral bidirectional power FET with notched multi-channel stacking and with dual gate reference terminal means 失效
    具有切口多通道堆叠和双栅极参考端子装置的横向双向功率FET

    公开(公告)号:US4622569A

    公开(公告)日:1986-11-11

    申请号:US618537

    申请日:1984-06-08

    摘要: A lateral bidirectional power FET (2) has a common drift region (6) between first and second stacks (8, 10) of alternating conductivity type layers (12-17 and 18-23). A notch (38) extends vertically downwardly into the drift region and laterally separates the stacks above the drift region. The stacks include a plurality of channel-containing regions (12-14 and 18-20) interleaved with a plurality of source regions (15-17 and 21-23). In the ON state, bidirectional current flows serially through the source regions and channels of each stack and through the drift region. In the OFF state, voltage is dropped across the plurality of junctions in series in the stacks, and the respective junctions with the drift region.

    摘要翻译: 横向双向功率FET(2)在交替导电类型层(12-17和18-23)的第一和第二堆叠(8,10)之间具有公共漂移区域(6)。 凹口(38)垂直向下延伸到漂移区域中并横向分离漂移区域上方的叠层。 堆叠包括与多个源区域(15-17和21-23)交错的多个通道容纳区域(12-14和18-20)。 在ON状态下,双向电流串联流过每个堆叠的源极区域和沟道以及穿过漂移区域。 在OFF状态下,堆叠中的多个结点之间的电压下降,并且与漂移区域相关联的各个接合点。

    Lateral bidirectional shielded notch FET
    24.
    发明授权
    Lateral bidirectional shielded notch FET 失效
    横向双向屏蔽陷波FET

    公开(公告)号:US4571512A

    公开(公告)日:1986-02-18

    申请号:US390479

    申请日:1982-06-21

    IPC分类号: H01L29/78

    CPC分类号: H01L29/7831 H01L29/7809

    摘要: Lateral FET structure is disclosed for bidirectional power switching, including AC application. Voltage blocking capability is substantially increased by a shielding electrode insulated between first and second gate electrodes in a notch between laterally spaced source regions and channel regions joined by a common drift region around the bottom of the notch. The shielding electrode prevents the electric field gradient toward the gate electrode on one side of the notch from inducing depletion in the drift region along the opposite side of the notch. This prevents unwanted inducement of conduction channels in the drift region during the OFF state of the FET. High density, high voltage, plural FET structure is disclosed.

    摘要翻译: 公开了用于双向功率切换的横向FET结构,包括AC应用。 通过在横向间隔开的源极区域之间的凹口中的第一和第二栅电极之间绝缘的屏蔽电极和通过围绕凹口底部的公共漂移区域连接的沟道区域之间的屏蔽电极显着增加了电压阻断能力。 屏蔽电极防止在凹口一侧的栅电极的电场梯度导致沿着凹口的相对侧的漂移区域的耗尽。 这防止了在FET的OFF状态期间在漂移区域中导电通道的不期望的诱导。 公开了高密度,高电压,多FET结构。

    AC solar cell with alternately generated pn junctions
    25.
    发明授权
    AC solar cell with alternately generated pn junctions 失效
    交流太阳能电池交替产生pn结

    公开(公告)号:US4533783A

    公开(公告)日:1985-08-06

    申请号:US618440

    申请日:1984-06-08

    IPC分类号: H01L31/06 H01L31/068

    摘要: A solar cell (2) is provided for generating alternating current to drive an external load (18) in response to light radiation. A central region (4) of given conductivity type is disposed between said first and second regions (6) and (8) of intrinsic or invertable semiconductor material applied with AC gate drive (12). The light-generated hole-electron pairs alternately diffuse in opposite directions across the alternately induced pn junctions between the central region (4) and the first and second converted conductivity type intrinsic or invertable regions (6) and (8) to set up alternating potential gradients in opposite directions.

    摘要翻译: 提供太阳能电池(2),用于产生交流电流以响应于光辐射来驱动外部负载(18)。 具有给定导电类型的中心区域(4)设置在施加有AC栅极驱动器(12)的本征或可逆半导体材料的第一和第二区域(6)和(8)之间。 光产生的空穴 - 电子对在中心区域(4)和第一和第二转换导电类型固有或可逆区域(6)和(8)之间的交替诱导的pn结交替地相反地扩散,以建立交替电位 梯度相反。

    Method for making vertically layered MOMOM tunnel device
    26.
    发明授权
    Method for making vertically layered MOMOM tunnel device 失效
    垂直分层MOMOM隧道装置的制作方法

    公开(公告)号:US4675980A

    公开(公告)日:1987-06-30

    申请号:US863312

    申请日:1986-05-15

    摘要: MOMOM structural geometry and fabrication techniques are is disclosed. First and second metal layer strips (6 and 10) are supported on an insulating substrate (4) and have vertically overlapped portions sandwiched between insulating layers (8, 12). A generally vertical side (18) is defined through the layers to the substrate to expose vertical edges (20, 24) of the metal layers which are oxidized (32, 34) and covered by a third metal layer (44) extending therebetween. In the preferred embodiment, the middle insulating layer (8) is undercut (28), oxidized (36, 40), and filled with metallization (50), to provide a vertical rectilinear conduction path.

    摘要翻译: 公开了MOMOM结构几何形状和制造技术。 第一和第二金属层条(6和10)被支撑在绝缘基板(4)上并且具有夹在绝缘层(8,12)之间的垂直重叠部分。 大体上垂直的侧面(18)被限定穿过衬底到衬底,以暴露金属层的垂直边缘(20,24),这些金属层被氧化(32,34)并被在其间延伸的第三金属层(44)覆盖。 在优选实施例中,中间绝缘层(8)是底切(28),被氧化(36,40)并填充有金属化(50),以提供垂直的直线导电路径。

    Dual stack power JFET with buried field shaping depletion regions
    27.
    发明授权
    Dual stack power JFET with buried field shaping depletion regions 失效
    双堆叠功率JFET,具有掩埋场成形耗尽区

    公开(公告)号:US4633281A

    公开(公告)日:1986-12-30

    申请号:US618431

    申请日:1984-06-08

    摘要: A power JFET (2) has a common drift region (4) between a pair of spaced first and second stacks (6, 8) of alternating conductivity type layers (10-14 and 15-19) forming a plurality of channels (11, 13, 16 and 18). The JFET has an ON state conducting bidirectional current horizontally through the common drift region and the channels. The channels are stacked vertically, and the JFET has an OFF state blocking current flow through the channels due to vertical depletion pinch-off. Field shaping and high blocking voltage capability are provided. Particular main terminal and gate structure is disclosed.

    摘要翻译: 功率JFET(2)在交替导电类型层(10-14和15-19)的一对隔开的第一和第二堆叠(6,8)之间具有共同的漂移区域(4),形成多个通道(11, 13,16和18)。 JFET具有通过公共漂移区域和通道水平地导通双向电流的导通状态。 通道垂直堆叠,并且由于垂直耗尽夹断,JFET具有截止通过通道的截止电流的截止状态。 提供了现场整形和高阻断电压能力。 公开了特定的主终端和门结构。

    Bidirectional power FET with field shaping
    28.
    发明授权
    Bidirectional power FET with field shaping 失效
    具有现场整形的双向功率FET

    公开(公告)号:US4553151A

    公开(公告)日:1985-11-12

    申请号:US421931

    申请日:1982-09-23

    摘要: Lateral FET structure is disclosed for bidirectional power switching, including AC application. Voltage blocking capability is enhanced by field shaping in the drift region. In the OFF state, depletion from a channel region junction and from a field shaping region junction spread toward each other through the drift region to straighten out field lines and prevent curvature crowding of field lines at edges of notch means extending into the drift region and separating a pair of source regions and a pair of channel regions.

    摘要翻译: 公开了用于双向功率切换的横向FET结构,包括AC应用。 通过漂移区域中的场整形来增强电压阻塞能力。 在OFF状态下,从沟道区域结和从场成形区域结的耗尽通过漂移区向彼此扩展,以使场线平直,并且防止在延伸到漂移区域的陷波装置的边缘处的场线的曲率拥挤,并且分离 一对源极区和一对沟道区。

    Bidirectional power FET with substrate-referenced shield
    29.
    发明授权
    Bidirectional power FET with substrate-referenced shield 失效
    具有基板参考屏蔽的双向功率FET

    公开(公告)号:US4541001A

    公开(公告)日:1985-09-10

    申请号:US421933

    申请日:1982-09-23

    摘要: Bidirectional power FET structure is disclosed with high OFF state voltage blocking capability. A shielding electrode is insulated between first and second gate electrodes in a notch between laterally spaced source regions and channel regions joined by a common drift region around the bottom of the notch. The shielding electrode is ohmically connected to the substrate containing the common drift region to be at the same potential level thereof and within a single junction drop of a respective main electrode across the junction between the respective channel containing region and drift region. The steering diode function for referencing the shielding electrode is performed by junctions already present in the integrated structure, eliminating the need for discrete dedicated steering diodes. The shielding electrode prevents the electric field gradient toward the gate electrode on one side of the notch from inducing depletion in the drift region along the opposite side of the notch. This prevents unwanted inducement of conduction channels in the drift region during the OFF state of the FET.

    摘要翻译: 公开了具有高OFF状态电压阻断能力的双向功率FET结构。 屏蔽电极在横向间隔开的源极区域之间的凹口中的第一和第二栅电极之间绝缘,并且通过围绕凹口底部的公共漂移区域连接的沟道区域之间被隔离。 屏蔽电极欧姆连接到包含公共漂移区的衬底处于相同的电位水平,并且在相应的主电极的跨越相应通道容纳区域和漂移区域之间的结点的单个结滴内。 用于参考屏蔽电极的转向二极管功能是通过已经存在于集成结构中的结来实现的,从而不再需要离散的专用转向二极管。 屏蔽电极防止在凹口一侧的栅电极的电场梯度导致沿着凹口的相对侧的漂移区域的耗尽。 这防止了在FET的OFF状态期间在漂移区域中导电通道的不期望的诱导。

    Apparatus for measuring depth of a fluid chamber
    30.
    发明授权
    Apparatus for measuring depth of a fluid chamber 失效
    用于测量流体室深度的装置

    公开(公告)号:US4949584A

    公开(公告)日:1990-08-21

    申请号:US350658

    申请日:1989-05-08

    IPC分类号: G01B17/00

    CPC分类号: G01B17/00

    摘要: The depth of a cavity or chamber (10') is measured by using the chamber as the resonator of an electronic oscillator (24) whose oscillations are coupled to fluid in the cavity by transducers (12, 13). Both the variable-depth main chamber (10') and a reference chamber (117) of fixed depth are measured. Variations in the data obtained from the chambers are caused by factors affecting the velocity of propagation of sound in the fluid. An accurate measurement of the depth of the main chamber is obtained by compensating direct data (at 42) obtained from the main chamber (10'), using, data (at 43) obtained from the fixed-depth reference chamber (117). In one embodiment an inertance orifice (121) is utilized between the two chambers. The fluid inertance of the orifice, together with the compliance of the fluid in the main chamber (10'), form a resonant system whose anti-resonant frequency is a measure of the dimensions of the main chamber. (Inertance is the acoustical equivalent of inductance.)

    摘要翻译: 通过使用室作为电子振荡器(24)的谐振器来测量空腔或室(10')的深度,该振荡器的振荡通过换能器(12,13)耦合到空腔中的流体。 测量可变深度主室(10')和固定深度的参考室(117)。 从室获得的数据的变化是由影响流体中声音传播速度的因素引起的。 通过使用从固定深度参考室(117)获得的数据(在43)补偿从主室(10')获得的直接数据(在42℃)来获得主室深度的精确测量。 在一个实施例中,在两个室之间使用惯性孔(121)。 孔口的流体惯性以及主腔室(10')中流体的顺应性形成谐振系统,其反谐振频率是主腔室尺寸的量度。 (惯性是电感的声学等效值。