公开(公告)号：US20180012756A1

公开(公告)日：2018-01-11

申请号：US15639682

申请日：2017-06-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naoki WATANABE ,  Tatsuo HATANO ,  Shinji FURUKAWA ,  Naoyuki SUZUKI

IPC: H01L21/02 ,  H01L21/28

CPC classification number: H01L21/02225 ,  C23C14/3464 ,  C23C14/505 ,  H01L21/28061 ,  H01L21/28202 ,  H01L43/12

Abstract: There is provided a method of forming an insulating film which includes providing a workpiece having a base portion and a protuberance portion formed to protrude from the base portion; and forming an insulating film on the workpiece by sputtering. The forming an insulating film includes forming the insulating film while changing an angle defined between the workpiece and a target.

公开(公告)号：US20170330787A1

公开(公告)日：2017-11-16

申请号：US15594699

申请日：2017-05-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tadashi MITSUNAGA ,  Tetsuya MIYASHITA ,  Tatsuo HATANO ,  Naoki WATANABE

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458

CPC classification number: H01L21/68714 ,  C23C14/35 ,  C23C14/505 ,  C23C14/541 ,  C23C16/4584 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67248

Abstract: There is provided a mounting table system which includes: a mounting table rotatably installed so as to mount a substrate thereon; a plurality of heating parts installed in the mounting table, and configured to heat the mounting table; a single power source configured to supply an electric power to the plurality of heating parts; and a power switching part configured to switch from a first heating part among the plurality of heating parts to which the electric power is supplied from the single power source, to a second heating part among the plurality of heating parts, depending on a rotational angle of the mounting table.

公开(公告)号：US20150075971A1

公开(公告)日：2015-03-19

申请号：US14490410

申请日：2014-09-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shinji FURUKAWA ,  Naoki WATANABE ,  Hiroshi MIKI ,  Tooru KITADA ,  Yasuhiko KOJIMA

IPC: H01J37/34 ,  C23C14/34

CPC classification number: C23C14/3464 ,  C23C14/08 ,  C23C14/3485 ,  H01J37/3417 ,  H01J37/3444 ,  H01J37/3464 ,  H01J37/347

Abstract: System and method of insulating film deposition. A sputter deposition chamber comprises a pair of targets made of the same insulating material. Each target is applied with a high frequency power signal concurrently. A phase adjusting unit is used to adjust the phase difference between the high frequency power signals supplied to the pair of targets to a predetermined value, thereby improving the in-plane thickness distribution of a resultant film. The predetermined value is target material specific.

Abstract translation: 绝缘膜沉积的系统和方法。 溅射沉积室包括由相同绝缘材料制成的一对靶。 每个目标同时施加高频功率信号。 相位调整单元用于将提供给该对目标的高频功率信号之间的相位差调整为规定值，从而提高所得到的膜的面内厚度分布。 预定值是目标材料特定的。