摘要:
An inkjet printing fluid composition including water and a water dispersible polyurethane additive of the general formula of (I) wherein Z is the central portion of a monomer unit that is the polymerization product of a diisocyanate; X1—Y1—X1 represents one or more soft segments wherein Y1 represents the central portion of a unit that is the polymerization product of a diamine or diol prepolymer having a molecular weight of greater than 300 Daltons; W is the central portion of one or more units containing an acid group; X2—Y2—X2 represents one or more hard segments wherein Y2 represents the central portion of a unit that is the polymerization product of a C2-C8 diol or diamine having a molecular weight of less than 250 Daltons; and X1, V and X2 can be the same or different and are an —O— or —N— atom; and further wherein the polyurethane additive has a weight average molecular weight of at least 6,000 Daltons and a sufficient number of acid groups to provide an acid number greater than 35, and the one or more X2—Y2—X2 hard segments are present at from 1 wt % to less than 13 wt % of the polyurethane additive. Also disclosed is a method for printing an inkjet image including I) providing an inkjet printing fluid according to the invention; and II) jetting the inkjet printing fluid in the form of ink drops onto a recording element to form a printed image.
摘要:
In a method and system for processing a photographic image having lightness values, L*, representing one of the colorimetric values of an original scene, the photographic image is transformed. The transformed image has a gamma as a function of CIE 1976 L*, which includes a dark region having a rising slope, a light region having a falling slope, and a plateau region having a slope constantly within 5 percent of a maximum value in said plateau region. The rising slope is at least twice as large as the absolute value of the falling slope. The plateau region is between 10 L* and 30 L* wide. Gamma is a derivative of visually perceived reproduced CIE 1976 L* versus scene CIE 1976 L*. Gamma has a maximum slope between 1.5 and 2.0.
摘要翻译:在用于处理具有亮度值的摄影图像的方法和系统中,表示原始场景的色度值之一的L *,变换摄影图像。 经变换的图像具有作为CIE 1976 L *的函数的伽马,其包括具有上升斜率的暗区域,具有下降斜率的光区域,以及具有在所述多个区域中的最大值的5%以内的斜率的平稳区域 高原地区。 上升斜率至少是下降斜率绝对值的两倍。 平台区域在10 L *和30 L *之间。 伽玛是视觉感知再现CIE 1976 L *与场景CIE 1976 L *的衍生物。 伽玛的最大斜率在1.5到2.0之间。
摘要:
A high bromide {111} tabular grain emulsion is disclosed in which most of the tabular grains exhibit silver salt epitaxy at a single site. Most of the silver halide epitaxy sites contact an edge region of the tabular grains. These emulsions exhibit chemical sensitization by the epitaxy and surprising lower levels of desensitization by spectral sensitizing dyes.
摘要:
A photographic element is disclosed that relies upon high bromide silver halide grains that are sulfur and/or gold sensitized for latent image formation. Coated to receive exposing radiation directly from a layer containing the latent image forming grains is a non-imaging layer containing (a) tabular silver halide grains (i) comprised of greater than 50 mole percent bromide, based on silver, (ii) having a thickness in the range of from 0.03 to 0.20 .mu.m, and (iii) having an average aspect ratio of greater than 20, and (b) silver halide epitaxy selectively positioned adjacent edges of said tabular grains in said non-imaging layer, said silver halide epitaxy (i) containing greater than 50 mole percent chloride, based on silver, and (ii) accounting for from 0.1 to 50 percent of the total silver in the composite grains.
摘要:
A method of processing an exposed originating silver halide color photographic element comprising developing the photographic element in a color devoloper containing a p-phenylenediamine color developing agent in the presence of a 1-phenyl pyrazolidin-3-one compoundwherein the originating silver halide photographic element comprises a radiation sensitive emulsion in reactive association with a development inhibitor releasing compound and containing a silver halide grain population comprised of grains comprising at least 50 mole percent silver chloride, based on total silver forming the grain population projected area, wherein at least 50 percent of total grain projected area is accounted for by intrinsically stable silver halide tabular grains(1) bounded by {100} major faces having adjacent edge ratios of less than 10 and(2) each having an average aspect ratio of at least 2, and wherein the silver halide content of the photographic element comprises at least 50 mole % silver chloride and no more than 2 mole % silver iodide.
摘要:
A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer.
摘要:
An electrically-conductive pattern is prepared using a reactive composition having: (1) a reactive polymer; (2) a compound that provides a cleaving acid upon exposure to radiation; and (3) a crosslinking agent that reacts in the presence of the cleaving acid, to provide crosslinking in the reactive polymer. A polymeric layer of the reactive composition is patternwise exposed to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising sulfonic acid or sulfonate groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, which pattern is reduced to provide a pattern of corresponding electroless seed metal particles. Electrolessly plating is then carried out in the exposed regions. The unique reactive comprises (a) recurring units represented Structure (A) as described in the disclosure, and can also include other recurring units that are crosslinkable or provide other properties.
摘要:
A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer.
摘要:
A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises pendant thiosulfate groups as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要:
A conductive pattern can be formed using a polymeric layer that contains a reactive composition having a reactive polymer. This reactive polymer comprises (i) a backbone, and (ii) pendant photosensitive non-aromatic unsaturated heterocyclic groups comprising an amide group that is conjugated with a carbon-carbon double bond. The non-aromatic unsaturated heterocyclic groups are linked to the backbone at an amide nitrogen atom. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced, followed by electrolessly plating with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.