公开(公告)号：US20130284213A1

公开(公告)日：2013-10-31

申请号：US13858248

申请日：2013-04-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yosuke Hachiya ,  Norihiro Ito ,  Hisashi Kawano ,  Jun Nonaka ,  Jun Nogami

IPC: H01L21/02

CPC classification number: H01L21/02076 ,  G03F7/423 ,  H01L21/31133 ,  H01L21/6708

Abstract: The present disclosure provides a substrate processing method and a substrate processing apparatus. The substrate processing method includes: generating an SPM liquid of a first temperature that contains Caro's acid having a separation effect of a resist film formed on the surface of a substrate by mixing heated sulfuric acid with hydrogen peroxide; cooling the SPM liquid to a second temperature at which a reduction effect of film loss occurs; and applying the SPM liquid of the second temperature to the resist film thereby separating the resist film.

Abstract translation: 本公开提供了一种基板处理方法和基板处理装置。 基板处理方法包括：通过将加热的硫酸与过氧化氢混合，生成含有形成在基板表面上的抗蚀剂膜的分离效果的含有Caro酸的第一温度的SPM液体; 将SPM液体冷却至发生膜损失的还原效果的第二温度; 并将第二温度的SPM液体施加到抗蚀剂膜上，从而分离抗蚀剂膜。

公开(公告)号：US11322373B2

公开(公告)日：2022-05-03

申请号：US15881984

申请日：2018-01-29

Applicant: TOKYO ELECTRON LIMITED

Inventor： Terufumi Wakiyama ,  Norihiro Ito

IPC: H01L21/67 ,  H01L21/687

Abstract: A liquid processing apparatus according to an embodiment includes a holding unit, a driving unit, a shaft, and a nozzle. The driving unit rotates the substrate and the holding unit that horizontally holds the substrate. The shaft is extended along an axial direction of a rotation axis. The nozzle includes a base that is attached to an upper end of the shaft, and a liquid supply unit that is extended from the base to a radial-direction outer side of the substrate and includes discharge ports formed to discharge the liquid toward a lower surface of the substrate. The shaft and the base are configured to include a discharge passage that is formed along the axial direction to discharge the liquid discharged toward the lower surface of the substrate. The base includes a concave portion that is concave downward to cause the liquid to flow toward the discharge passage.

公开(公告)号：US10460962B2

公开(公告)日：2019-10-29

申请号：US15805311

申请日：2017-11-07

Applicant: Tokyo Electron Limited

Inventor： Terufumi Wakiyama ,  Norihiro Ito

IPC: B08B3/08 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards. When a lift pin 22 and a liquid supply pipe 40 are moved from a neighboring position where they are adjacent to a holding plate 30 to a distanced position, an elevating device 60 raises only the lift pin 22 for a time during which the first lifting member 61 is moved up to a preset position while being connected to the lift pin 22. The elevating device 60 raises the lift pin 22 and the liquid supply pipe 40 for a time during which the first lifting member 61 is raised from the preset position to the distanced position.

公开(公告)号：US20170361364A1

公开(公告)日：2017-12-21

申请号：US15624822

申请日：2017-06-16

Applicant: Tokyo Electron Limited

Inventor： Nobuhiro Ogata ,  Norihiro Ito ,  Jiro Higashijima ,  Yusuke Hashimoto ,  Kazuhiro Aiura

IPC: B08B13/00 ,  B08B3/04 ,  B08B3/08 ,  H01L21/67

CPC classification number: B08B13/00 ,  B08B3/041 ,  B08B3/08 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67173

Abstract: According to the present disclosure, both first and second cup bodies are brought into a state of being close to each other by lifting one of the first and second cup bodies. A first gap between a gap forming portion formed on the lower surface of a first protruding portion and the upper surface of a second protruding portion is narrower than a second gap between a portion of the first protruding portion where the gap forming portion is absent, and the upper surface of the second protruding portion. In this state, a cleaning liquid is supplied to the second gap. Since movement of the cleaning liquid that tends to flow radially outward is restricted by the first narrow gap, the entire area between the first and second protruding portions may be filled with the cleaning liquid so that the surface to be cleaned may be evenly cleaned.

公开(公告)号：US09768039B2

公开(公告)日：2017-09-19

申请号：US14084839

申请日：2013-11-20

Applicant: Tokyo Electron Limited

Inventor： Kazuhiro Aiura ,  Norihiro Ito ,  Hidetoshi Nakao ,  Kazuyoshi Shinohara ,  Satoru Tanaka ,  Yuki Yoshida ,  Meitoku Aibara

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67051 ,  H01L21/68735

Abstract: A substrate processing apparatus includes a rotary cup that is provided at a substrate holding unit to surround a substrate held thereon and to be rotated along with the substrate holding unit, and configured to guide a processing liquid dispersed from the substrate; and an outer cup that is provided around the rotary cup with a gap therebetween and configured to collect the guided processing liquid by the rotary cup. Further, a height of an upper end of the rotary cup is higher than that of the outer cup. Furthermore, an outward protrusion protruded outwards in a radial direction thereof and extended along a circumference thereof is provided at an upper end portion of an outer surface of the rotary cup, and the outward protrusion blocks mist of the processing liquid dispersed from the gap between the rotary cup and the outer cup toward a space above the substrate.

公开(公告)号：US20150187613A1

公开(公告)日：2015-07-02

申请号：US14580557

申请日：2014-12-23

Applicant: Tokyo Electron Limited

Inventor： Terufumi Wakiyama ,  Norihiro Ito ,  Jiro Higashijima

IPC: H01L21/67

CPC classification number: H01L21/67051 ,  H01L21/6715 ,  H01L21/68728

Abstract: A substrate liquid processing apparatus of the present disclosure supplies a plurality of processing liquids from a processing liquid supplying unit in a switching manner to a substrate held on a substrate holding unit. An elevatable inner cup surrounds the substrate holding unit laterally and forms a first drain path that drains the first processing liquid. An outer cup surrounds the inner cup and forms a second drain path that drains the second processing liquid. A cover covers the outside of the outer cup, includes an eaves portion that extends inwardly from an upper side, and forms an exhaust path between the cover and the outer cup. The exhaust path is connected to the first drain path and the second drain path above inlets of the first drain path and the second drain path.

Abstract translation: 本公开的基板液体处理装置以切换的方式将多个处理液从处理液供给单元供给到保持在基板保持单元上的基板。 可升降的内杯横向地围绕衬底保持单元，并形成排出第一处理液体的第一排水路径。 外杯围绕内杯并形成排出第二处理液体的第二排水路径。 盖子覆盖外杯的外部，包括从上侧向内延伸的檐部，并且在盖和外杯之间形成排气路径。 排气路径连接到第一漏极路径和第二漏极路径的入口上方的第一漏极路径和第二漏极路径。

公开(公告)号：US20150090305A1

公开(公告)日：2015-04-02

申请号：US14483252

申请日：2014-09-11

Applicant: Tokyo Electron Limited

Inventor： Terufumi Wakiyama ,  Norihiro Ito ,  Jiro Higashijima

IPC: B08B3/02

CPC classification number: H01L21/67051 ,  B08B17/00 ,  H01L21/67017 ,  H01L21/6719

Abstract: A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.

Abstract translation: 液体处理装置通过提供处理液体对旋转基板进行液体处理。 环绕构件围绕包括围绕旋转基板的杯体的上部空间并在基板上方设置有开口的区域。 气流形成部从杯体的上侧形成下降的气流。 底面部分沿圆周方向在杯体和周围部件之间阻塞。 排气口设置在底表面部分的上方和杯体外部，以排出由周围构件和底面部分包围的区域中的气氛。