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    Deposition Apparatus and Methods
    22.
    发明申请
    Deposition Apparatus and Methods 审中-公开
    沉积设备和方法

    公开(公告)号：US20160060748A1

    公开(公告)日：2016-03-03

    申请号：US14774489

    申请日：2014-03-14

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

    IPC: C23C14/30 ,  C23C14/24

    CPC classification number: C23C14/30 ,  C23C14/228 ,  C23C14/243 ,  C23C14/246 ,  C23C14/505

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    Abstract translation: 一种沉积设备（20），包括：腔室（22）; 耦合到所述室的处理气体源（62）; 耦合到所述室的真空泵（52）; 至少两个电子枪（26）; 耦合到电子枪的一个或多个电源（30）; 多个坩埚（32,33,34），其定位或定位在至少一个所述电子枪的视野内的操作位置; 以及具有至少一个操作位置的部件保持器（170），用于将间隔在坩埚上方的部件保持在间隔高度H上。间隔高度H在包括至少22英寸的范围内是可调节的。

    THERMAL BARRIER COATING
    25.
    发明申请
    THERMAL BARRIER COATING 审中-公开

    公开(公告)号：US20200318229A1

    公开(公告)日：2020-10-08

    申请号：US16834244

    申请日：2020-03-30

    Applicant: United Technologies Corporation

    Inventor： Brian T. Hazel ,  David A. Litton ,  Kaylan M. Wessels

    IPC: C23C14/28 ,  C23C14/24 ,  C23C14/50

    Abstract: An electron beam vapor deposition process for depositing coatings comprises placing a source coating material in a crucible of a vapor deposition apparatus having a coating chamber; pressurizing said coating chamber from about 0.5 microbar to about 40 microbar; heating a work piece surface to a temperature of from 1800 degrees Fahrenheit to 2000 degrees Fahrenheit; energizing said source coating with an electron beam that delivers a power density to the material in the crucible forming a vapor cloud from said source coating material; and depositing said source coating material onto a surface of a work piece.

    CMAS-RESISTANT THERMAL BARRIER COATING AND METHOD OF MAKING A COATING THEREOF
    28.
    发明申请
    CMAS-RESISTANT THERMAL BARRIER COATING AND METHOD OF MAKING A COATING THEREOF 审中-公开

    公开(公告)号：US20190078215A1

    公开(公告)日：2019-03-14

    申请号：US15699260

    申请日：2017-09-08

    Applicant: United Technologies Corporation

    Inventor： Kaylan M. Wessels ,  Brian T. Hazel ,  Xuan Liu ,  R. Wesley Jackson ,  Elisa M. Zaleski

    IPC: C23C28/00 ,  C23C28/04 ,  C23C4/134 ,  C04B35/50

    Abstract: In one aspect, a calcium-magnesium alumino-silicate (CMAS)-resistant coating includes an outer coating having a plurality of columnar structures formed during material deposition due to preferential material accumulation and a plurality of generally vertically-oriented gaps separating adjacent columnar structures. The columnar structures include a plurality of randomly-oriented particle splats and a CMAS-reactive material and have a total porosity of less than five percent. The plurality of generally vertically-oriented gaps extend from an outermost surface of the outer coating to a first depth of the outer coating equal to or less than a total thickness of the outer coating. The vertically-oriented gaps have a median gap width of less than five micrometers.

    METHODS FOR VAPOR DEPOSITION
    30.
    发明申请
    METHODS FOR VAPOR DEPOSITION 审中-公开

    公开(公告)号：US20180318866A1

    公开(公告)日：2018-11-08

    申请号：US16032803

    申请日：2018-07-11

    Applicant: United Technologies Corporation

    Inventor： James W. Neal ,  Kevin W. Schlichting ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik ,  Michael J. Maloney

    IPC: B05B15/62 ,  C23C14/24 ,  C23C14/50

    CPC classification number: B05B15/62 ,  C23C14/24 ,  C23C14/243 ,  C23C14/505

    Abstract: An embodiment of a method includes retaining a first workpiece and a second workpiece selectively on a workpiece fixture disposed within a deposition chamber. The workpiece fixture includes tooling including a first workpiece holder, a second workpiece holder, and a first hollow wall. The first workpiece is separated from the second workpiece using the first hollow wall. Energy is selectively applied and directed within the deposition chamber, from an energy source toward a first crucible, the first crucible including a plurality of walls defining an upper recess contiguous with, and disposed directly above a first lower recess, at least the upper recess open to an interior of the deposition chamber. During the step of selectively applying and directing energy, a gas valve is controlled to maintain a partial vacuum in the deposition chamber of greater than 2 Pa to control a size and overlap of at least one coating zone formed around each of the at least one workpiece.

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