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    SUB-DIFFRACTION-LIMITED PATTERNING AND IMAGING
    24.
    发明申请
    SUB-DIFFRACTION-LIMITED PATTERNING AND IMAGING 有权
    亚差错有限的绘图和成像

    公开(公告)号：US20160109811A1

    公开(公告)日：2016-04-21

    申请号：US14885657

    申请日：2015-10-16

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon

    IPC: G03F7/20

    CPC classification number: G03F7/70425 ,  G03F7/70325 ,  G03F7/70466

    Abstract: A method for sub-diffraction-limited patterning using a photoswitchable layer is disclosed. A sample of the photoswitchable layer can be selectively exposed to a first wavelength of illumination that includes a super-oscillatory peak. The sample can be selectively exposed to a second wavelength of illumination that does not include the super-oscillatory peak. A region in the sample that corresponds to the super-oscillatory peak and is associated with the second transition state can optionally be converted into a third transition state. The region in the sample at the third transition state can constitute a pattern of an isolated feature with a size that is substantially smaller than a far-field diffraction limit.

    Abstract translation: 公开了一种使用光可切换层进行亚衍射限制图案化的方法。 光可切换层的样本可以选择性地暴露于包括超振荡峰的第一波长的照明。 样品可以选择性地暴露于不包括超振荡峰的第二波长的照明。 对应于超振荡峰并且与第二过渡状态相关联的样本中的区域可以可选地被转换成第三过渡状态。 在第三过渡状态的样品中的区域可以构成具有远小于远场衍射极限的尺寸的隔离特征的图案。

    DISPLAY BACKLIGHT
    26.
    发明申请
    DISPLAY BACKLIGHT 有权
    显示背光

    公开(公告)号：US20150077644A1

    公开(公告)日：2015-03-19

    申请号：US14487218

    申请日：2014-09-16

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon ,  Arkady Rudnitsky ,  Zeev Zalevsky

    IPC: G02F1/1335

    CPC classification number: G02B6/0096 ,  G02B6/0008 ,  G02B6/0045 ,  G02B6/0046

    Abstract: A display backlight can include a light source and a parabolic waveguide. The parabolic waveguide can have a light inlet to receive the light from the light source, a parabolic reflective surface adapted to change a direction of the light emitted from the light source by a predetermined angle, and a light outlet configured to emit the light at the predetermined angle.

    Abstract translation: 显示器背光源可以包括光源和抛物面波导。 抛物线波导可以具有用于接收来自光源的光的光入口，抛物面反射表面，其适于将从光源发射的光的方向改变预定角度;以及光出口，其被配置为在光源处发射光 预定角度。

    Nanophotonic scattering structure
    27.
    发明授权
    Nanophotonic scattering structure 有权
    纳米光子散射结构

    公开(公告)号：US08953239B2

    公开(公告)日：2015-02-10

    申请号：US14019099

    申请日：2013-09-05

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon ,  Peng Wang

    IPC: G02B26/00 ,  G06F17/50 ,  G02B26/08 ,  B82Y20/00

    CPC classification number: G06F17/50 ,  B82Y20/00 ,  G02B26/08 ,  G06F17/5068

    Abstract: A method of designing a nanophotonic scattering structure can include establishing an initial design having an array of discrete pixels variable between at least two pixel height levels. A performance metric for the structure can be a function of the heights of the pixels. The height of a pixel can be varied, and then the performance metric can be calculated. The steps of varying the pixel height and calculating the performance metric can be repeated to increase the performance metric. The above steps can be repeated for each pixel within the array and then the method can be iterated until the performance metric reaches an optimized value. Nanophotonic scattering structures can be produced from designs obtained through this process.

    Abstract translation: 设计纳米光子散射结构的方法可以包括建立具有在至少两个像素高度之间可变的离散像素阵列的初始设计。 结构的性能指标可以是像素高度的函数。 可以改变像素的高度，然后可以计算出性能指标。 可以重复改变像素高度和计算性能度量的步骤来增加性能度量。 可以对阵列内的每个像素重复上述步骤，然后可以重复该方法，直到性能度量达到优化值。 纳米光子散射结构可以通过该方法获得的设计来制造。

    SUB-DIFFRACTION-LIMITED PATTERNING AND IMAGING VIA MULTI-STEP PHOTOSWITCHING
    28.
    发明申请
    SUB-DIFFRACTION-LIMITED PATTERNING AND IMAGING VIA MULTI-STEP PHOTOSWITCHING 有权
    通过多步光刻技术进行子衍射 - 有限的绘图和成像

    公开(公告)号：US20140199636A1

    公开(公告)日：2014-07-17

    申请号：US14152720

    申请日：2014-01-10

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon

    IPC: G03F7/20

    CPC classification number: G03F7/7045 ,  G03F7/0035 ,  G03F7/0045 ,  G03F7/0395

    Abstract: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength band of illumination. An optical device can selectively expose the photoresist to a standing wave with a second wavelength in the second wavelength band to convert a section of the photoresist into a second transition state. The optical device or a substrate carrier securing the substrate can modify the standing wave relative to the substrate to further expose additional regions of the photoresist into the second transition state in a specified pattern. The method can further convert one of the first and second transition states of the photoresist into an irreversible transition state, while the other of the first and second transition states remains in a reversible transition state. The photoresist can be developed to remove the regions of the photoresist in the irreversible transition state.

    Abstract translation: 公开了使用可光开关的记录材料进行亚衍射限制图案化。 衬底可以设置有处于第一过渡状态的光致抗蚀剂。 光致抗蚀剂可以被配置用于基于照明的第一波长带和第二波长带照明的至少两个过渡状态之间的光谱选择性可逆转换。 光学装置可以选择性地将光致抗蚀剂暴露于第二波长带中的第二波长的驻波，以将光致抗蚀剂的一部分转化为第二过渡状态。 固定衬底的光学器件或衬底载体可以改变相对于衬底的驻波，以进一步将光致抗蚀剂的附加区域以特定的图案曝光到第二过渡状态。 该方法可以将光致抗蚀剂的第一和第二过渡态之一进一步转换成不可逆的过渡态，而第一和第二过渡态中的另一个保持在可逆转变状态。 可以显影光致抗蚀剂以去除处于不可逆过渡状态的光致抗蚀剂的区域。

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