公开(公告)号：US10526285B2

公开(公告)日：2020-01-07

申请号：US16150070

申请日：2018-10-02

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Jean-Christophe Andrez ,  Philippe Bergeron ,  Paul Robert Bichler ,  Sultan Chowdhury ,  Christoph Martin Dehnhardt ,  Thilo Focken ,  Wei Gong ,  Michael Edward Grimwood ,  Abid Hasan ,  Ivan William Hemeon ,  Qi Jia ,  Brian Salvatore Safina ,  Shaoyi Sun ,  Michael Scott Wilson ,  Alla Yurevna Zenova

IPC: C07D207/16 ,  C07D403/12 ,  C07D413/14 ,  C07D221/22 ,  C07D401/12 ,  C07D413/12 ,  C07C235/52 ,  C07D205/04 ,  C07D277/06 ,  C07D209/02 ,  C07D305/08 ,  C07D401/14 ,  C07D231/06 ,  C07D403/04 ,  C07D403/14 ,  C07D409/06 ,  C07D417/12 ,  C07D451/02 ,  C07D263/04 ,  C07D263/26 ,  C07C235/42 ,  C07C235/54 ,  C07D265/30 ,  C07D207/08 ,  C07D207/10 ,  C07D207/22 ,  C07D209/52 ,  C07D209/54 ,  C07D211/20 ,  C07D211/38 ,  C07D211/60 ,  C07D213/69 ,  C07D401/10 ,  C07D405/10 ,  C07D471/08

Abstract: The invention provides compounds having the general Formula (I); and pharmaceutically acceptable salts thereof; wherein the variables RA, RAA, subscript n, subscript q, ring A, X2, L, subscript m, X1, R1, R2, R3, R4, R5, D and E have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US10457654B2

公开(公告)日：2019-10-29

申请号：US15799771

申请日：2017-10-31

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Daniel Sutherlin ,  Steven McKerrall ,  Michael Scott Wilson ,  Kwong Wah Lai ,  Philippe Bergeron ,  Birong Zhang ,  Ramsay Beveridge ,  Jean-Philippe Leclerc ,  Alexandre Lemire ,  Liang Zhao ,  Claudio Sturino

IPC: C07D285/08 ,  C07D277/52 ,  C07D239/69 ,  C07D213/76 ,  C07D261/16 ,  C07D401/12 ,  C07D403/12 ,  C07D417/12 ,  A61K31/427 ,  A61P19/02 ,  A61P29/00

Abstract: The invention provides a compound of formula I: or a pharmaceutically acceptable salt thereof, wherein the variables X, Y1—Y5, R1, R2, R3, R4, and Het have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20170002017A1

公开(公告)日：2017-01-05

申请号：US15017282

申请日：2016-02-05

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Jean-Christophe Andrez ,  Sultan Chowdhury ,  Shannon Marie Decker ,  Christoph Martin Dehnhardt ,  Thilo Focken ,  Michael Edward Grimwood ,  Ivan William Hemeon ,  Qi Jia ,  Jun Li ,  Daniel F. Ortwine ,  Brian Safina ,  Tao Sheng ,  Shaoyi Sun ,  Daniel P. Sutherlin ,  Michael Scott Wilson ,  Alla Yurevna Zenova

IPC: C07D491/107 ,  C07C311/51 ,  C07D307/12 ,  C07D213/82 ,  C07D205/04 ,  C07D207/48 ,  C07D295/26 ,  C07D257/04 ,  C07D311/58 ,  C07D209/52 ,  C07D307/18 ,  C07D211/22 ,  C07D233/84

CPC classification number: C07D491/107 ,  A61K31/18 ,  A61K31/397 ,  A61K31/40 ,  A61K31/41 ,  A61K31/4164 ,  A61K31/44 ,  A61K31/5375 ,  C07B2200/05 ,  C07C307/06 ,  C07C311/51 ,  C07C2601/02 ,  C07C2601/04 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/16 ,  C07C2601/18 ,  C07C2602/10 ,  C07C2602/18 ,  C07C2602/20 ,  C07C2602/42 ,  C07C2602/44 ,  C07C2602/50 ,  C07C2603/66 ,  C07C2603/68 ,  C07C2603/74 ,  C07D205/04 ,  C07D207/46 ,  C07D207/48 ,  C07D209/52 ,  C07D211/22 ,  C07D211/96 ,  C07D213/64 ,  C07D213/82 ,  C07D233/84 ,  C07D257/04 ,  C07D265/30 ,  C07D295/192 ,  C07D295/26 ,  C07D307/12 ,  C07D307/18 ,  C07D309/08 ,  C07D311/58 ,  C07D311/70 ,  C07D311/72 ,  C07D403/12 ,  C07D405/12 ,  C07D413/12 ,  C07D451/02 ,  C07D471/08

Abstract: The invention provides novel compounds having the general formula: and pharmaceutically acceptable salts thereof, wherein the variables RA, subscript n, ring A, X2, L, subscript m, X1, B, R1, R2, R3, R4, R5 and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

Abstract translation: 和其药学上可接受的盐，其中变量RA，下标n，环A，X2，L，下标m，X1，B，R1，R2，R3，R4，R5和RN具有本文所述的含义， 化合物和使用这些化合物和组合物的方法。