Thin film optical measurement system and method with calibrating ellipsometer

    公开(公告)号:US06411385B1

    公开(公告)日:2002-06-25

    申请号:US09886514

    申请日:2001-06-21

    Abstract: An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

    In-situ monitoring of electrical properties by ellipsometry
    24.
    发明授权
    In-situ monitoring of electrical properties by ellipsometry 失效
    通过椭偏仪原位监测电气性能

    公开(公告)号:US06362881B1

    公开(公告)日:2002-03-26

    申请号:US09297819

    申请日:1999-05-10

    CPC classification number: G01N21/211

    Abstract: A method of monitoring material parameters of a sample (4) (for example electrical properties of a semiconductor) during processing (for example during manufacture) which uses ellipsometric techniques to study the changes induced in the ellipsometric spectra of the material, by modulation of the internal electric field of the material, and determining from these changes the material parameters of interest The means of modulation can be a source of electromagnetic radiation, for example a laser (8). The ellipsometer used may include an array of photodetectors. The process allows the real time monitoring of the process under examination.

    Abstract translation: 在处理(例如在制造期间)监测样品(4)的材料参数(例如半导体的电学性质)的方法,其使用椭圆技术来研究材料的椭偏光谱中诱发的变化,通过调制 材料的内部电场,并且从这些变化确定感兴趣的材料参数调制装置可以是电磁辐射源,例如激光器(8)。 所使用的椭偏仪可以包括一组光电检测器。 该过程允许对正在检查的过程进行实时监控。

    Thin film optical measurement system and method with calibrating ellipsometer

    公开(公告)号:US06304326B1

    公开(公告)日:2001-10-16

    申请号:US09247121

    申请日:1999-02-08

    CPC classification number: G01B11/0641 G01J4/00 G01N21/211

    Abstract: An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

    Ellipsometer and ellipsometry method
    27.
    发明授权
    Ellipsometer and ellipsometry method 有权
    椭偏仪和椭圆偏光法

    公开(公告)号:US06256097B1

    公开(公告)日:2001-07-03

    申请号:US09478795

    申请日:2000-01-07

    Applicant: Jeff A. Wagner

    Inventor: Jeff A. Wagner

    CPC classification number: G01J4/00 G01N21/211

    Abstract: An improved ellipsometry method and a self-correcting simultaneous multiple angle/multiple wavelength return path ellipsometer are disclosed which allow for simultaneous measurement at multiple angles of incidence in a manner which permits separation of instrument error from the measured properties. In the method polarized light from a single beam of light is simultaneously directed to interact with an optical system under study at different angles of incidence and the change of polarization state is measured for at least one and preferably each of a plurality of the angles of incidence. Non-sample optical system ellipsometric effects of the ellipsometer are measured and the measured changes in polarization state are corrected to eliminate errors introduced thereby. The disclosed embodiment is self-correcting by way of a convex reflector which can be inserted into and removed from the optical path of the beam of polarized light between a focusing optic and the sample optical system under study. The convex reflector when inserted into the optical path causes the light rays of the beam of polarized light in each of the plurality of angles of incidence to retrace its path through the focusing optic for detection by a detector array without undergoing reflection and re-reflection as during a sample measurement configuration of the ellipsometer where the convex reflector is removed from the optical path.

    Abstract translation: 公开了一种改进的椭圆偏振方法和自校正同时多角度/多波长返回路径椭偏仪,其允许以允许将仪器误差与所测量的属性分离的方式以多个入射角同时进行测量。 在方法中,来自单个光束的偏振光同时指向与在不同入射角下研究的光学系统相互作用,并且测量多个入射角中的至少一个,优选地每个入射角 。 测量椭圆光度计的非样本光学系统椭圆效应,并校正测量的极化状态变化,以消除由此引入的误差。 所公开的实施例通过凸面反射器进行自校正,所述凸形反射器可以在聚焦光学元件和被研究的样品光学系统之间插入和偏离偏振光束的光路。 当凸入的反射器插入到光路中时,多个入射角中的每一个入射光中的偏振光束的光线回扫其通过聚焦光学器件的路径,以便被检测器阵列检测,而不会经历反射和再反射 在椭圆偏振器的样品测量结构中,其中凸反射器从光路中移除。

    Method and apparatus for measuring PMD of a dispersion compensation grating
    28.
    发明授权
    Method and apparatus for measuring PMD of a dispersion compensation grating 有权
    用于测量色散补偿光栅的PMD的方法和装置

    公开(公告)号:US06229606B1

    公开(公告)日:2001-05-08

    申请号:US09415348

    申请日:1999-10-08

    CPC classification number: H04B10/2569 G01M11/336

    Abstract: A method, a system and a computer program product configured to determine a differential group delay of two sequential optical beams based on a frequency dependence of a length of an optical path traveled by the two sequential optical beams in a dispersion compensation grating. The determined differential group delay provides a measure of polarization mode dispersion in the dispersion compensation grating.

    Abstract translation: 一种方法,系统和计算机程序产品,其被配置为基于在色散补偿光栅中由两个顺序光束行进的光路的长度的频率依赖性来确定两个顺序光束的差分组延迟。 确定的差分群延迟提供了色散补偿光栅中偏振模色散的测量。

    Optical component for polarization modulation, a mueller polarimeter and ellipsometer containing such an optical component, a process for the calibration of this ellipsometer, and an ellipsometric measurement process
    29.
    发明授权
    Optical component for polarization modulation, a mueller polarimeter and ellipsometer containing such an optical component, a process for the calibration of this ellipsometer, and an ellipsometric measurement process 失效
    用于偏振调制的光学部件,包含这种光学部件的微调偏振计和椭偏仪,用于校准该椭偏仪的方法以及椭圆测量过程

    公开(公告)号:US06175412B1

    公开(公告)日:2001-01-16

    申请号:US09091400

    申请日:1998-10-06

    CPC classification number: G01N21/211 G01J4/00 G02F1/0327

    Abstract: An optical component for modulation of polarization, a Mueller polarimeter and ellipsometer containing such an optical component. The optical component modulates a linearly polarized incident beam and returns a modulated beam. It includes a coupled phase modulator which modulates the incident beam twice in succession, the two modulations having the same frequency of &ohgr;/2&pgr;, and a coupling system modifying the polarization state of the light between the two modulations. The ellipsometer includes the means for detection of a measurement beam returned by a sample, which receives the modulated beam, in addition to a processing unit. The means of detection include a polarimeter producing n measured quantities representing the polarization states of the beam, and the processing unit produces m values for each of these quantities by Fourier transform, with n×m≧16 and m≧4, providing simultaneous access to the sixteen components of the Mueller matrix of the sample.

    Abstract translation: 用于调制偏振的光学部件,包含这种光学部件的Mueller偏振计和椭偏仪。 光学部件调制线性偏振的入射光束并返回调制光束。 它包括耦合相位调制器,其连续两次调制入射光束,两个调制具有相同的ω/ 2pi频率,以及修改两个调制之间的光的偏振状态的耦合系统。 该椭偏仪包括除了处理单元之外还用于检测由样品返回的测量光束的装置,其接收调制光束。 检测装置包括产生表示光束偏振态的n个测量量的偏振计,并且处理单元通过傅里叶变换产生每个这些量的m个值,其中nxm> = 16且m≥4,提供同时访问 样品的Mueller矩阵的十六个成分。

    Broadband spectroscopic rotating compensator ellipsometer

    公开(公告)号:US06831743B2

    公开(公告)日:2004-12-14

    申请号:US10653306

    申请日:2003-09-02

    Abstract: An ellipsometer, and a method of ellipsometry, for analyzing a sample using a broad range of wavelengths, includes a light source for generating a beam of polychromatic light having a range of wavelengths of light for interacting with the sample. A polarizer polarizes the light beam before the light beam interacts with the sample. A rotating compensator induces phase retardations of a polarization state of the light beam wherein the range of wavelengths and the compensator are selected such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 135° to 225°, and at least a second phase retardation value is induced that is outside of the primary range. An analyzer interacts with the light beam after the light beam interacts with the sample. A detector measures the intensity of light after interacting with the analyzer as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor determines the polarization state of the beam as it impinges the analyzer from the light intensities measured by the detector.

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